Accuracy Assessment of FDTD Method for the Analysis of Sub-Wavelength Photonic Structures

2016 ◽  
Vol E99.C (7) ◽  
pp. 780-787
Author(s):  
Yasuo OHTERA
Keyword(s):  
Accuracy Assessment ◽  
Fdtd Method ◽  
Photonic Structures ◽  
Sub Wavelength

scholarly journals A Thermopile Device with Sub-Wavelength Hole Arrays by CMOS-MEMS Technology

Sensors ◽  
2020 ◽  
Vol 21 (1) ◽  
pp. 180
Author(s):  
Chi-Feng Chen ◽  
Chih-Hsiung Shen ◽  
Yun-Ying Yeh
Keyword(s):  
Fdtd Method ◽  
Elliptical Hole ◽  
Oxide Semiconductor ◽  
Active Area ◽  
Hole Array ◽  
Cmos Mems ◽  
Simulation Results ◽  
Hole Arrays ◽  
Hole Structure ◽  
Sub Wavelength

A thermopile device with sub-wavelength hole array (SHA) is numerically and experimentally investigated. The infrared absorbance (IRA) effect of SHAs in active area of the thermopile device is clearly analyzed by the finite-difference time-domain (FDTD) method. The prototypes are manufactured by the 0.35 μm 2P4M complementary metal-oxide-semiconductor micro-electro-mechanical-systems (CMOS-MEMS) process in Taiwan semiconductor manufacturing company (TSMC). The measurement results of those prototypes are similar to their simulation results. Based on the simulation technology, more sub-wavelength hole structural effects for IRA of such thermopile device are discussed. It is found from simulation results that the results of SHAs arranged in a hexagonal shape are significantly better than the results of SHAs arranged in a square and the infrared absorption efficiencies (IAEs) of specific asymmetric rectangle and elliptical hole structure arrays are higher than the relatively symmetric square and circular hole structure arrays. The overall best results are respectively up to 3.532 and 3.573 times higher than that without sub-wavelength structure at the target temperature of 60 °C when the minimum structure line width limit of the process is ignored. Obviously, the IRA can be enhanced when the SHAs are considered in active area of the thermopile device and the structural optimization of the SHAs is absolutely necessary.

scholarly journals Optical pump-rejection filter based on silicon sub-wavelength engineered photonic structures

2017 ◽  
Vol 42 (8) ◽  
pp. 1468 ◽  
Author(s):  
Diego Pérez-Galacho ◽  
Carlos Alonso-Ramos ◽  
Florent Mazeas ◽  
Xavier Le Roux ◽  
Dorian Oser ◽  
...  
Keyword(s):  
Optical Pump ◽  
Photonic Structures ◽  
Rejection Filter ◽  
Sub Wavelength

A SILVER-COATED SINUSOIDAL SUB-WAVELENGTH STRUCTURE WITH POLARIZATION FEATURE FOR LIGHT EMITTING DIODE

2009 ◽  
Vol 16 (04) ◽  
pp. 631-634 ◽  
Author(s):  
CHENG-HAO KO ◽  
JIAN-SHIAN LIN ◽  
CHANG-TAI CHEN ◽  
NIEN-PO CHEN
Keyword(s):  
Light Emitting Diode ◽  
Red Light ◽  
Fdtd Method ◽  
Dielectric Materials ◽  
Transmission Efficiency ◽  
Light Emitting ◽  
Light Region ◽  
Fluorescence Efficiency ◽  
Difference Time ◽  
Sub Wavelength

A two-dimensional sub-wavelength grating (SWG) is fabricated on light-emitting diodes (LEDs). The SWG is simulated by finite-difference time-domain (FDTD) method. The SWG surface has silver-coated dielectric materials with sinusoidal structures, 175 nm period and 125 m depth of groove. When the incident wave is in the red light region of 600–700nm, the transmission efficiency of TM propagated light will reach 0.82. If this SWG structure is applied in LCD direct backlight module, the lower polarization piece can be replaced and fluorescence efficiency of LED can be improved.

The Theoretical Study of TM Transmittance and Contrast Ratio for Sub-Wavelength Metallic Gratings

2014 ◽  
Vol 575 ◽  
pp. 138-141
Author(s):  
Ren Cheng Jin ◽  
Yang Rui ◽  
Jin Kui Chu ◽  
Ying Jie Zhang
Keyword(s):  
Performance Indicators ◽  
Theoretical Study ◽  
Structural Parameters ◽  
Contrast Ratio ◽  
Fdtd Method ◽  
Slit Width ◽  
Wave Band ◽  
Metallic Gratings ◽  
Difference Time ◽  
Sub Wavelength

According to the requirement of the bionic navigation sensitive wave band of 380nm~520nm for sub-wavelength metallic gratings, in order to achieve performance indicators under the basic structural parameters. Analyzing TM transmittance and contrast ratio is carried out by employing finite-difference time-domain (FDTD) method. The result reveals that height, slit width and dielectric of grating impact TM transmittance and contrast ratio in various extents, and the greatest influence on the TM transmittance and contrast ratio is slit dielectric and slit width respectively.

scholarly journals Sub‐Wavelength Passive Optical Isolators Using Photonic Structures Based on Weyl Semimetals

2021 ◽  
Vol 9 (15) ◽  
pp. 2101068
Author(s):  
Viktar S. Asadchy ◽  
Cheng Guo ◽  
Bo Zhao ◽  
Shanhui Fan
Keyword(s):  
Photonic Structures ◽  
Weyl Semimetals ◽  
Optical Isolators ◽  
Sub Wavelength

Metallic Ellipsoidal Array – Film for Enhancing Transmission via Plasmonic Coupling

2014 ◽  
Vol 548-549 ◽  
pp. 393-396
Author(s):  
Ying Hu ◽  
Gui Qiang Liu ◽  
Xiang Nan Zhang ◽  
Yuan Hao Chen ◽  
Zheng Jie Cai ◽  
...  
Keyword(s):  
Slow Light ◽  
Fdtd Method ◽  
Three Dimensional ◽  
Metal Structure ◽  
Transparent Conductors ◽  
Long Wavelength ◽  
Highly Sensitive ◽  
Highly Sensitive Sensors ◽  
Difference Time ◽  
Sub Wavelength

In this paper, a novel metal structure that integrates double continuous Au films and double aligned gold (Au) non-close-packed ellipsoidal nanoparticle arrays is proposed. The optical features of this structure are simulated by using the three-dimensional finite-difference time-domain (3D-FDTD) method. Bimodal plasmonic resonances with the highest transmission up to 74% and 66% (corresponding to the short and long-wavelength, respectively) are achieved. This proposed structure with sub-wavelength size may provide fascinating applications in optoelectronic devices such as transparent conductors and conductive devices, slow light devices, highly sensitive sensors.

Surface Plasmon Assisted Laser Nanolithography Using Metalic Mask

2005 ◽  
Author(s):  
Dongbing Shao ◽  
Shanchen Chen
Keyword(s):  
Surface Plasmon ◽  
Quartz Substrate ◽  
Fdtd Method ◽  
High Density ◽  
Optical Diffraction ◽  
Intensity Control ◽  
Thick Photoresist ◽  
Wavelength Scale ◽  
Very High ◽  
Sub Wavelength

Traditional photolithography has a resolution at wavelength scale due to optical diffraction. In this paper, a high-density direct photolithography method beyond diffraction limit by utilizing surface plasmons (SPs) was developed on virtually any substrate. Simulation results by Finite Different Time Domain (FDTD) method have shown that surface plasmon excited on both the mask and the substrate helps to confine the light behind the apertures of the mask. Numerical simulations have demonstrated that very high density sub-wavelength patterns can be transferred using this method. In experiments, a polarized laser beam of 355nm wavelength was used as a light source to photo-initiate a 80nm-thick photoresist on a silicon substrate with 50nm Ti coating. 100nm line aperture patterns were made on gold film on quartz substrate as mask. Experimental results showed that illumination intensity control is crucial to the lithography results. The feature size using such method could be further scaled down, limited theoretically by the validity of dielectric function of the material, and practically by the fabrication of mask.

scholarly journals Tunable Mid-Infrared Graphene Plasmonic Cross-Shaped Resonator for Demultiplexing Application

2020 ◽  
Vol 10 (3) ◽  
pp. 1193 ◽  
Author(s):  
Somayyeh Asgari ◽  
Tapio Fabritius
Keyword(s):  
Fdtd Method ◽  
Three Dimensional ◽  
Single Mode ◽  
Transmission Spectra ◽  
Mid Infrared ◽  
Coupled Mode ◽  
Light Waves ◽  
Dimensional Parameters ◽  
Difference Time ◽  
Sub Wavelength

In this study, a tunable graphene plasmonic filter and a two-channel demultiplexer are proposed, simulated, and analyzed in the mid-infrared (MIR) region. We discuss the optical transmission spectra of the proposed cross-shaped resonator and the two-channel demultiplexer. The transmission spectra of the proposed MIR resonator are tunable by change of its dimensional parameters and the Fermi energy of the graphene. Our proposed structures have a single mode in the wavelength range of 5–12 µm. The minimum full width at half maximum (FWHM) and the maximum transmission ratio of the proposed resonator respectively reached 220 nm and 55%. Simulations are performed by use of three-dimensional finite-difference time-domain (3D-FDTD) method. Coupled mode theory (CMT) is used to investigate the structure theoretically. The numerical and the theoretical results are in good agreement. The performance of the proposed two-channel demultiplexer is investigated based on its crosstalk. The minimum value of crosstalk reaches −48.30 dB. Our proposed structures are capable of providing sub-wavelength confinement of light waves, useful in applications in MIR region.

scholarly journals A Plasmonic Chip-Scale Refractive Index Sensor Design Based on Multiple Fano Resonances

Sensors ◽  
2018 ◽  
Vol 18 (10) ◽  
pp. 3181 ◽  
Author(s):  
Kunhua Wen ◽  
Li Chen ◽  
Jinyun Zhou ◽  
Liang Lei ◽  
Yihong Fang
Keyword(s):  
Refractive Index ◽  
Fdtd Method ◽  
High Sensitivity ◽  
Refractive Index Sensor ◽  
Fano Resonances ◽  
Metal Insulator Metal ◽  
High Figure ◽  
On Chip ◽  
Difference Time ◽  
Sub Wavelength

In this paper, multiple Fano resonances preferred in the refractive index sensing area are achieved based on sub-wavelength metal-insulator-metal (MIM) waveguides. Two slot cavities, which are placed between or above the MIM waveguides, can support the bright modes or the dark modes, respectively. Owing to the mode interferences, dual Fano resonances with obvious asymmetrical spectral responses are achieved. High sensitivity and high figure of merit are investigated by using the finite-difference time-domain (FDTD) method. In view of the development of chip-scale integrated photonics, two extra slot cavities are successively added to the structure, and consequently, three and four ultra-sharp Fano peaks with considerable performances are obtained, respectively. It is believed that this proposed structure can find important applications in the on-chip optical sensing and optical communication areas.

Sign in / Sign up

Export Citation Format

Share Document