Surface Plasmon Assisted Laser Nanolithography Using Metalic Mask

2005 ◽  
Author(s):  
Dongbing Shao ◽  
Shanchen Chen
Keyword(s):  
Surface Plasmon ◽  
Quartz Substrate ◽  
Fdtd Method ◽  
High Density ◽  
Optical Diffraction ◽  
Intensity Control ◽  
Thick Photoresist ◽  
Wavelength Scale ◽  
Very High ◽  
Sub Wavelength

Traditional photolithography has a resolution at wavelength scale due to optical diffraction. In this paper, a high-density direct photolithography method beyond diffraction limit by utilizing surface plasmons (SPs) was developed on virtually any substrate. Simulation results by Finite Different Time Domain (FDTD) method have shown that surface plasmon excited on both the mask and the substrate helps to confine the light behind the apertures of the mask. Numerical simulations have demonstrated that very high density sub-wavelength patterns can be transferred using this method. In experiments, a polarized laser beam of 355nm wavelength was used as a light source to photo-initiate a 80nm-thick photoresist on a silicon substrate with 50nm Ti coating. 100nm line aperture patterns were made on gold film on quartz substrate as mask. Experimental results showed that illumination intensity control is crucial to the lithography results. The feature size using such method could be further scaled down, limited theoretically by the validity of dielectric function of the material, and practically by the fabrication of mask.

Surface-Plasmons-Assisted Nanoscale Photolithography

2005 ◽  
Author(s):  
Dongbing Shao ◽  
Shaochen Chen
Keyword(s):  
Low Cost ◽  
Near Field ◽  
Optical Diffraction ◽  
Scanning Probe ◽  
Fabrication Technology ◽  
Scanning Probe Lithography ◽  
Low Contrast ◽  
The Past ◽  
Wavelength Scale ◽  
Sub Wavelength

Photolithography has remained a useful micro-fabrication technology because of its high throughput, low cost, simplicity, and reproducibility over the past several decades. However its resolution is limited at a sub-wavelength scale due to optical diffraction. Among all different approaches to overcoming this problem, such as electron-beam lithography, imprint lithography and scanning probe lithography, near-field optical lithography inherits many merits of the traditional photolithography method. Major drawbacks of this approach include low contrast, low transmission and low density.

scholarly journals Observing and controlling a Tamm plasmon at the interface with a metasurface

Nanophotonics ◽  
2020 ◽  
Vol 9 (4) ◽  
pp. 897-903 ◽  
Author(s):  
Oleksandr Buchnev ◽  
Alexandr Belosludtsev ◽  
Victor Reshetnyak ◽  
Dean R. Evans ◽  
Vassili A. Fedotov
Keyword(s):  
Liquid Crystal ◽  
Metal Film ◽  
Near Infrared ◽  
Thin Metal Film ◽  
Outer Side ◽  
Spectral Position ◽  
External Perturbations ◽  
Dielectric Mirror ◽  
Wavelength Scale ◽  
Sub Wavelength

AbstractWe demonstrate experimentally that Tamm plasmons in the near infrared can be supported by a dielectric mirror interfaced with a metasurface, a discontinuous thin metal film periodically patterned on the sub-wavelength scale. More crucially, not only do Tamm plasmons survive the nanopatterning of the metal film but they also become sensitive to external perturbations as a result. In particular, by depositing a nematic liquid crystal on the outer side of the metasurface, we were able to red shift the spectral position of Tamm plasmon by 35 nm, while electrical switching of the liquid crystal enabled us to tune the wavelength of this notoriously inert excitation within a 10-nm range.

scholarly journals Ultra-high-Q resonances in plasmonic metasurfaces

2021 ◽  
Vol 12 (1) ◽  
Author(s):  
M. Saad Bin-Alam ◽  
Orad Reshef ◽  
Yaryna Mamchur ◽  
M. Zahirul Alam ◽  
Graham Carlow ◽  
...  
Keyword(s):  
Incident Light ◽  
Reducing Power ◽  
Field Enhancement ◽  
Plasmonic Nanostructures ◽  
High Q ◽  
Alternative Material ◽  
Order Of Magnitude ◽  
Wavelength Scale ◽  
Strong Confinement ◽  
Sub Wavelength

AbstractPlasmonic nanostructures hold promise for the realization of ultra-thin sub-wavelength devices, reducing power operating thresholds and enabling nonlinear optical functionality in metasurfaces. However, this promise is substantially undercut by absorption introduced by resistive losses, causing the metasurface community to turn away from plasmonics in favour of alternative material platforms (e.g., dielectrics) that provide weaker field enhancement, but more tolerable losses. Here, we report a plasmonic metasurface with a quality-factor (Q-factor) of 2340 in the telecommunication C band by exploiting surface lattice resonances (SLRs), exceeding the record by an order of magnitude. Additionally, we show that SLRs retain many of the same benefits as localized plasmonic resonances, such as field enhancement and strong confinement of light along the metal surface. Our results demonstrate that SLRs provide an exciting and unexplored method to tailor incident light fields, and could pave the way to flexible wavelength-scale devices for any optical resonating application.

scholarly journals Experimental nanofocusing of surface plasmon polaritons using a gravitational field

Nanophotonics ◽  
2020 ◽  
Vol 9 (10) ◽  
pp. 3279-3285 ◽  
Author(s):  
Zhiwei Yan ◽  
Chong Sheng ◽  
Shining Zhu ◽  
Hui Liu
Keyword(s):  
Gravitational Field ◽  
Surface Plasmon ◽  
Surface Plasmon Polaritons ◽  
Simple Structure ◽  
Spatial Scales ◽  
Optical Process ◽  
Design Structure ◽  
Nonlinear Optical Process ◽  
Plasmon Polaritons ◽  
Sub Wavelength

AbstractHow to capture electromagnetic fields into sub-wavelength spatial scales has been a major challenge in nanophotonics, especially confining surface plasmon polaritons into regions as small as a few nanometers. Although various methods are proposed to achieve this goal, these methods require complex fabrication process. Here, we demonstrate experimentally the achievement of nanofocusing of surface plasmon polaritons with an intensity enhancement of three, using the simple structure with just pasting a sliver microwire on a sliver layer. And the designed structure has a well-defined gravitational field inspired by transformation optics. This simple design structure has applications to enhance light–matter interactions, such as nonlinear optical process and Raman scattering.

scholarly journals A Thermopile Device with Sub-Wavelength Hole Arrays by CMOS-MEMS Technology

Sensors ◽  
2020 ◽  
Vol 21 (1) ◽  
pp. 180
Author(s):  
Chi-Feng Chen ◽  
Chih-Hsiung Shen ◽  
Yun-Ying Yeh
Keyword(s):  
Fdtd Method ◽  
Elliptical Hole ◽  
Oxide Semiconductor ◽  
Active Area ◽  
Hole Array ◽  
Cmos Mems ◽  
Simulation Results ◽  
Hole Arrays ◽  
Hole Structure ◽  
Sub Wavelength

A thermopile device with sub-wavelength hole array (SHA) is numerically and experimentally investigated. The infrared absorbance (IRA) effect of SHAs in active area of the thermopile device is clearly analyzed by the finite-difference time-domain (FDTD) method. The prototypes are manufactured by the 0.35 μm 2P4M complementary metal-oxide-semiconductor micro-electro-mechanical-systems (CMOS-MEMS) process in Taiwan semiconductor manufacturing company (TSMC). The measurement results of those prototypes are similar to their simulation results. Based on the simulation technology, more sub-wavelength hole structural effects for IRA of such thermopile device are discussed. It is found from simulation results that the results of SHAs arranged in a hexagonal shape are significantly better than the results of SHAs arranged in a square and the infrared absorption efficiencies (IAEs) of specific asymmetric rectangle and elliptical hole structure arrays are higher than the relatively symmetric square and circular hole structure arrays. The overall best results are respectively up to 3.532 and 3.573 times higher than that without sub-wavelength structure at the target temperature of 60 °C when the minimum structure line width limit of the process is ignored. Obviously, the IRA can be enhanced when the SHAs are considered in active area of the thermopile device and the structural optimization of the SHAs is absolutely necessary.

Linear and Nonlinear Transmission of Surface Plasmon Polaritons in an Optical Nanowire

2004 ◽  
Vol 846 ◽  
Author(s):  
N. C. Panoiu ◽  
R. M. Osgood
Keyword(s):  
Surface Plasmon ◽  
Nonlinear Optical ◽  
Fdtd Method ◽  
Frequency Dispersion ◽  
Kerr Nonlinearity ◽  
Dielectric Shell ◽  
Polymer Metal ◽  
A Chain ◽  
Kerr Coefficient ◽  
20 Nm

ABSTRACTPolymer-metal composites offer the possibility of strongly enhanced nonlinear optical properties, which can be used for ultrasmall photonic devices. In this paper, we investigate numerically, by means of the finite-difference time-domain (FDTD) method, the propagation characteristics of surface plasmon polariton (SPP) modes excited in an optical nanowire consisting of a chain of either metallic cylinders or metallic spheres embedded in dielectric shells made of polymers (or other material) with optical Kerr nonlinearity. Our FDTD calculations incorporate both the nonlinear optical response of the dielectrics as well as the frequency dispersion of the metals, which is considered to obey a Drude-like model. It is demonstrated that, in the linear limit, the nanowire supports two SPP modes, a transverse and a longitudinal one, separated by Δλ = 20 nm. Furthermore, the dependence of the transmission of these SPP modes, on both the pulse peak power and Kerr coefficient of the dielectric shell, is investigated. Nonlinear optical phenomena, such as power-dependent mode frequency, switching, or optical limiting, are observed.

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