scholarly journals SINTESIS LAPISAN TIPIS TiO2 BERPORI YANG DIMODIFIKASI OLEH NITROGEN DENGAN METODE PEROKSO SOL-GEL, KARAKTERISASI DAN APLIKASINYA SEBAGAI MATERIAL PEMBERSIH DIRI (SELF CLEANING MATERIAL)

2017 ◽  
Vol 9 (2) ◽  
pp. 6
Author(s):  
Diana Vanda Wellia
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Stearic Acid ◽  
Visible Light ◽  
Tio2 Thin Film ◽  
Anatase Phase ◽  
Film Surface ◽  
Visible Range ◽  
Tio2 Thin Films ◽  
Vis Spectroscopy

The photocatalytic properties of TiO2 compound in anatase phase can be activated under visible light by nitrogen modification and its ability can be increased by generated porous structure using polietilen glikol (PEG) on TiO2 thin film surface. The porous N/TiO2 thin films were prepared by heating aqueous peroxotitanate thin films by addition of polietilen glikol (PEG) deposited uniformly on superhydrophilic uncoated glass at 500 oC for 1 h. The result of X-ray diffraction (XRD) confirmed the resence of only anatase phase for all samples. The UV-Vis spectroscopy showed the synthesized porous N/TiO2 thin films exhibit the absorption in the visible range (400-500 nm). Photocatalytic activity of porous N/ TiO2 thin films were evaluated by using fourier transform-infrared spectroscopy (FTIR) to determine the ability of this photocatalyst for stearic acid degradation under visible light irradiation. The result showed that N/TiO2/PEG-2.1 thin film degraded the stearic acid was about 87,86%, which was 1,12 times higher than that of N-doped TiO2 and 9,9 times higher than that of undoped TiO2 thin film.

Electrical Property of TiO2 Thin Film Deposited by RF Sputtering

2007 ◽  
Vol 127 ◽  
pp. 221-226
Author(s):  
Kiyozumi Niizuma ◽  
Takahiro Hayakawa ◽  
Yoshio Utsushikawa
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Electrical Property ◽  
Tio2 Thin Film ◽  
Uv Light ◽  
Anatase Phase ◽  
Rf Sputtering ◽  
Light Irradiation ◽  
Tio2 Thin Films ◽  
Uv Light Irradiation

The authors investigated on the electrical property and the photo-catalytic activity of TiO2 thin films deposited in Ar+O2 atmosphere by RF magnetron sputtering. From the result of x-ray diffraction, the anatase phase was formed in TiO2 thin films. In TiO2 thin film deposited under a gas pressure of 3.0Pa, the contact angle of water showed 9 ﾟ, and the decomposition rate of Methylene Blue (measuring the absorbance of the reference light) showed -0.067 with UV light irradiation. Moreover, it revealed that the electric resistivity of TiO2 thin film deposited under the same conditions decreased from 8.0×103Ω･m to 1.4×10-2Ω･m with UV light irradiation.

scholarly journals Microstructure Evolution of Ag/TiO2 Thin Film

2021 ◽  
Vol 7 (1) ◽  
pp. 14
Author(s):  
Dewi Suriyani Che Halin ◽  
Kamrosni Abdul Razak ◽  
Mohd Arif Anuar Mohd Salleh ◽  
Mohd Izrul Izwan Ramli ◽  
Mohd Mustafa Al Bakri Abdullah ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Growth Rate ◽  
Synchrotron Radiation ◽  
Tio2 Thin Film ◽  
Sol Gel ◽  
Tio2 Thin Films ◽  
Contact Mode ◽  
X Ray ◽  
Radiation Imaging

Ag/TiO2 thin films were prepared using the sol-gel spin coating method. The microstructural growth behaviors of the prepared Ag/TiO2 thin films were elucidated using real-time synchrotron radiation imaging, its structure was determined using grazing incidence X-ray diffraction (GIXRD), its morphology was imaged using the field emission scanning electron microscopy (FESEM), and its surface topography was examined using the atomic force microscope (AFM) in contact mode. The cubical shape was detected and identified as Ag, while the anatase, TiO2 thin film resembled a porous ring-like structure. It was found that each ring that coalesced and formed channels occurred at a low annealing temperature of 280 °C. The energy dispersive X-ray (EDX) result revealed a small amount of Ag presence in the Ag/TiO2 thin films. From the in-situ synchrotron radiation imaging, it was observed that as the annealing time increased, the growth of Ag/TiO2 also increased in terms of area and the number of junctions. The growth rate of Ag/TiO2 at 600 s was 47.26 µm2/s, and after 1200 s it decreased to 11.50 µm2/s and 11.55 µm2/s at 1800 s. Prolonged annealing will further decrease the growth rate to 5.94 µm2/s, 4.12 µm2/s and 4.86 µm2/s at 2400 s, 3000 s and 3600 s, respectively.

scholarly journals Photocatalytic Degradation of Different VOCs in the Gas-Phase over TiO2 Thin Films Prepared by Ultrasonic Spray Pyrolysis

Catalysts ◽  
2019 ◽  
Vol 9 (11) ◽  
pp. 915 ◽  
Author(s):  
Ibrahim Dundar ◽  
Marina Krichevskaya ◽  
Atanas Katerski ◽  
Malle Krunks ◽  
Ilona Oja Acik
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Photocatalytic Degradation ◽  
Spray Pyrolysis ◽  
Tio2 Thin Film ◽  
Ultrasonic Spray Pyrolysis ◽  
Airflow Rate ◽  
Tio2 Films ◽  
Tio2 Thin Films ◽  
Ultrasonic Spray

In this study, we deposited TiO2 thin films onto borosilicate glass by ultrasonic spray pyrolysis at 350 and 450 °C. The aim of study is to determine the effect of deposition temperature on photocatalytic activity of TiO2 thin films and to investigate the performance of TiO2 thin films on photocatalytic degradation of methyl tert-butyl ether (MTBE), acetone, acetaldehyde, and heptane as functions of different operating parameters. TiO2 thin films deposited at 350 and 450 °C have a thickness value of 190 and 330 nm, respectively. All as-prepared TiO2 films possess an anatase crystalline structure. According to the X-ray photon spectroscopy (XPS) study, the TiO2 thin film deposited at 350 °C showed a higher amount of oxygen vacancies and hydroxyl groups on the film surface after UV treatment. The aged-TiO2 thin film deposited at 350 °C showed a water contact angle (WCA) value of 0° after 10 min UV irradiation, showing superhydrophilic surface behavior. The TiO2 film deposited at 350 °C exhibited the highest amount of conversion of MTBE (100%). The results also showed that TiO2 films are capable of photocatalytic degradation of MTBE (100%) and acetaldehyde (approx. 80%) in humid air conditions and high airflow rate. The visible-light-activity of TiO2 thin films was tested with 5 ppm MTBE and acetone. TiO2 thin films deposited at 350 °C with a surface area of 600 cm2 showed 60% of MTBE and 33% of acetone degradation under VIS light.

scholarly journals Rapid and Scalable Wire-bar Strategy for Coating of TiO2 Thin-films: Effect of Post-Annealing Temperatures on Structures and Catalytic Dye-Degradation

Molecules ◽  
2020 ◽  
Vol 25 (7) ◽  
pp. 1683 ◽  
Author(s):  
P. Divya ◽  
S. Arulkumar ◽  
S. Parthiban ◽  
Anandarup Goswami ◽  
Tansir Ahamad ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Dye Degradation ◽  
Window Glass ◽  
Visible Range ◽  
Large Area ◽  
Tio2 Thin Films ◽  
Water Contact ◽  
Annealing Temperatures ◽  
Post Annealing

Titanium dioxide (TiO2) thin films were rapidly coated on Corning glass substrates from the precursor solution using the wire-bar technique at the room temperature and then post-annealed at 400, 500 and 600 °C for 1 h under atmospheric conditions. The structural, morphological, optical, wettability and photocatalytic properties of the films were studied. X-ray diffraction analysis confirmed the formation of an anatase TiO2 structure irrespective of the post-annealing temperatures. The optical transparency of the films in the visible range was measured to be > 70%. A water contact angle (WCA) of ~0° was observed for TiO2 thin-film, post-annealed at 400 °C and 500 °C. However, WCA of 40.3° was observed for post-annealed at 600 °C. The photocatalytic dye-degradation using post-annealed thin-film was investigated indicating a steady improvement in the dye-degradation percentage (from 24.3 to 29.4%) with the increase of post-annealing temperature. The demonstrated TiO2 thin-films deposited by wire-bar coating technique showed promises for the manufacturing of large-area cost-effective self-cleaning window glass.

Fabrication of Al–TiO2 Thin Film Electrode by Spray Pyrolysis Technique for Urea Sensing

2020 ◽  
Vol 20 (5) ◽  
pp. 2887-2892 ◽  
Author(s):  
A. Mathi Vathani ◽  
S. Dhanalakshmi ◽  
N. Jeyakumaran ◽  
N. Prithivikumaran
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Spray Pyrolysis ◽  
Kidney Diseases ◽  
Spray Pyrolysis Technique ◽  
Anatase Phase ◽  
Visible Region ◽  
Film Electrode ◽  
Thin Film Electrode ◽  
Vis Spectroscopy

A simple cost effective Al–TiO2 thin film electrode was fabricated for urea sensing. Urea is the key end product of nitrogen metabolism in humans. Increased level of urea leads to loss of kidney function. Thus determination of urea is important in analysis of kidney diseases. Al–TiO2 thin films were deposited with different concentration of Al by Spray pyrolysis technique. The X-ray diffraction (XRD) pattern reveals the anatase phase of the Al–TiO2 thin films with tetragonal structure. A shift is observed in the XRD peak position compared to as prepared TiO2 thin film indicates the incorporation of Al ions into Ti ions. The UV-Vis spectroscopy study shows that the absorption increases and the absorption peak shifts towards the visible region for Al–TiO2 thin films compared with that of the as prepared TiO2 thin film. The optical band gap values changes with the change in the Al concentration in TiO2 thin films. The electrochemical analysis for optimized Al–TiO2 thin film electrode was carried out by cyclic voltammetry (CV) method. CV studies of Al–TiO2 thin film electrode show the good stability and linearity which is essential to fabricate biosensor. The sensor response to urea is linear with correlation coefficient of 0.944 and the sensitivity is 3.17 μA mM−1 cm−2.

Immobilization of a Series of Homo/Heterobinuclear Metal (II) Phthalocyanine Hexasulphonates on Nanocrystalline TiO2 Thin Films and their Application in the Degradation of Methylene Blue

2011 ◽  
Vol 356-360 ◽  
pp. 1728-1732
Author(s):  
Yan Zhen Yang ◽  
Ren Jie Sun ◽  
Yu Cheng Wu ◽  
Li Tao ◽  
Cheng Wu Shi
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Methylene Blue ◽  
Catalytic Activity ◽  
Visible Light ◽  
Visible Light Irradiation ◽  
Light Irradiation ◽  
Dark Condition ◽  
Tio2 Thin Films ◽  
Nanocrystalline Tio2

A series of binuclear metal (II) phthalocyanine hexasulphonates, (M-M)Pc, including (Co-Co)Pc, (Co-Zn)Pc, (Co-Mn)Pc, (Zn-Zn)Pc, (Zn-Mn)Pc and (Mn-Mn)Pc were synthesized and immobilized on nanocrystalline TiO2 thin films. The nanocrystalline TiO2 thin film was characterized by SEM, XRD and profilometer. The catalytic activity of various (M-M)Pc/nanocrystalline TiO2 thin films was evaluated by the degradation of methylene blue (MB) with air as the oxidant under visible light irradiation and dark condition. The results indicated that the prepared nanocrystalline TiO2 thin film had good crystalline and uniform particle size distribution. According to the degradation results of MB, various homo/hetero (M-M)Pc can sensitize nanocrystalline TiO2 thin films and improve their photocatalytic activity under visible light irradiation. The catalytic activity of hetero (M-M)Pc/nanocrystalline TiO2 thin films were more effective than that of homo (M-M)Pc under both visible light irradiation and dark condition, and the air purging was essential in degradation of MB. Therefore, these (M-M)Pc/nanocrystalline TiO2 thin films can be applied to the degradation of MB as a promising catalyzer.

scholarly journals Effect of Target Sintering Temperature on the Morphological and Optical Properties of Pulsed Laser Deposited TiO2 Thin Films

Coatings ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 561
Author(s):  
Laid Kadri ◽  
Georgiana Bulai ◽  
Aurelian Carlescu ◽  
Stoian George ◽  
Silviu Gurlui ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Optical Properties ◽  
Indium Tin Oxide ◽  
Sintering Temperature ◽  
Pulsed Laser ◽  
Visible Range ◽  
Tio2 Thin Films ◽  
Vis Spectroscopy ◽  
Ito Glass

In this paper, we report on the effect of titanium dioxide (TiO2) target sintering temperature on the morphological and optical properties of amorphous titanium dioxide thin films synthesized by pulsed laser deposition (PLD) on indium tin oxide (ITO) glass substrate and subsequently heat-treated in air at low temperature (150 °C). Three types of targets were used, unsintered (pressed at room temperature), sintered at 500 °C and sintered at 1000 °C. The surface morphology of the samples was investigated by scanning electron microscopy (SEM), and profilometry was used for thickness measurements. The structural properties of the films were examined by X-ray diffraction (XRD), while their optical properties were studied by UV‒vis spectroscopy. The obtained TiO2 thin films have an amorphous nature, as shown by XRD analysis. Profilometer showed that sintered target samples have more reliable thicknesses than unsintered ones. The SEM studies revealed the sufficient structural homogeneity of sintered target nanosized TiO2 films and agglomerates in the case of unsintered target film. The UV‒vis transmittance spectra showed high transparency in the visible range of PLD films, proportional to the target sintering temperature. The optical band gaps of the films deposited using the 500 °C and 1000 °C sintered targets are closer to those of anatase and rutile phases, respectively, which provides a promising approach to the challenges of amorphous TiO2-based nanostructures.

Preparation and Characterization of the Visible Light Responsive TiO2 Thin Film Photocatalysts Prepared by Magnetron Sputtering Method and Their Photocatalytic Activities for the Water Splitting Reactions

2005 ◽  
Vol 486-487 ◽  
pp. 81-84 ◽  
Author(s):  
Masaya Matsuoka ◽  
Masaaki Kitano ◽  
Masato Takeuchi ◽  
Masakazu Anpo ◽  
John M. Thomas
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Visible Light ◽  
Water Splitting ◽  
Glass Container ◽  
Proton Exchange ◽  
Light Irradiation ◽  
Tio2 Thin Films ◽  
Photocatalytic Activities

Visible light responsive TiO2 (Vis-TiO2) thin films were successfully developed by the radio-frequency magnetron sputtering method, and their photocatalytic activities for the water splitting reactions were investigated. Pt-loaded Vis-TiO2 thin films acted as photocatalysts to decompose water involving sacrificial reagent such as methanol or silver nitrate under visible light irradiation (λ³ 420 nm). Furthermore, the separate evolution of H2 and O2 was successfully achieved under solar light irradiation by applying these photocatalysts in a H-type glass container, which consists of two water phases separated by a TiO2 thin film and proton-exchange membrane.

The Preparation of Visible Light-Responsive TiO2 Thin Films by Applying a RF-Magnetron Sputtering Deposition Method and Their Photocatalytic Reactivity for the Decomposition of Water with a Separate Evolution of H2 and O2

2006 ◽  
Vol 317-318 ◽  
pp. 823-826 ◽  
Author(s):  
Masaaki Kitano ◽  
Hisashi Kikuchi ◽  
Takahiro Hosoda ◽  
Masato Takeuchi ◽  
Masaya Matsuoka ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Visible Light ◽  
Tio2 Thin Film ◽  
Rf Magnetron Sputtering ◽  
Light Irradiation ◽  
Deposition Method ◽  
Sputtering Deposition ◽  
Magnetron Sputtering Deposition Method

TiO2 (Vis-TiO2) thin films absorbing UV and visible light in regions of 250-600nm have been successfully developed by applying a radio-frequency (RF) magnetron sputtering deposition method. SIMS depth profiles of Vis-TiO2 revealed that the O/Ti ratio gradually decreases from the top surface (O/Ti ratio : 2.00 ± 0.01) to the inside (1.93 ± 0.01). This unique declined O/Ti composition (anisotropic structure) may be the origin of the significant perturbation in the electronic structure of Vis-TiO2, enabling the absorption of visible light and their high photocatalytic performance under visible light irradiation. In fact, it was found that the separate evolution of H2 and O2 from water could be successfully achieved under visible light or solar light irradiation by applying these thin film photocatalysts in an H-type glass container separating the two aqueous solutions by a TiO2 thin film and proton-exchange membrane, having H2 evolution from Pt side and O2 evolution from TiO2 thin film side, respectively.

Characterization of TiO2 Thin Films Prepared by Vacuum Evaporation

2014 ◽  
Vol 887-888 ◽  
pp. 783-786 ◽  
Author(s):  
Li Li Wang ◽  
Yi Wei Zhang ◽  
Chun Mei Zhang ◽  
Zheng Duo Wang ◽  
Tao Meng
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Deposition Rate ◽  
Tio2 Thin Film ◽  
Amorphous Structure ◽  
Vacuum Evaporation ◽  
X Ray Diffraction ◽  
Tio2 Thin Films ◽  
Atomic Force

The TiO2 thin films were prepared by vacuum evaporation on glass using TiO2 powder 99.99% as coating material and with varying deposition speed. The TiO2 thin films were characterized by a-step device, X-ray diffraction (XRD), atomic force microscope (AFM). The influence of deposition rate were discussed. The results indicated that thickness of the TiO2 thin film was prepared under the deposition rate of 4Å/sec was 200 nm at room temperature, with amorphous structure. The film changed to anatase crystal structure when was annealed at 450 °C for one hour and the TiO2 thin film was uniform and well combined with the glass substrate.

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