363. Evaluating Passive Badge Samplers for Perchloroethylene Monitoring in Dry Cleaning Operations

This paper investigates a textile material of low surface mass for its protection against electromagnetic radiation (EMR), which is suitable for composite structures of garments, and for technical and interior applications. The shielding effectiveness against EMR of fabric knitted from polyamide threads coated with silver, measured in the frequency range of 0.9 GHz to 2.4 GHz, indicated a high degree of protection. The key contribution of the paper is the evaluation of the stability of the shielding properties against EM radiation after applying apolar and polar solvents, in synergy with the cyclic process parameters of wet and dry cleaning. The results of the study confirmed the decline in the shielding effectiveness after successive cycles of material treatment with dry and wet cleaning. The effect of wet cleaning in relation to dry cleaning is more apparent, which is due to the damage of the silver coating on the polyamide threads in the knitted fabric.

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Production-ready dry cleaning and deposition processes for low-temperature Si and SiGe epitaxy

Applied Surface Science ◽

10.1016/j.apsusc.2003.08.087 ◽

2004 ◽

Vol 224 (1-4) ◽

pp. 36-40 ◽

Cited By ~ 2

Author(s):

H.M. Buschbeck ◽

A. Erhart ◽

Y. Goeggel ◽

C. Rosenblad ◽

S. Wiltsche ◽

...

Keyword(s):

Low Temperature ◽

Dry Cleaning ◽

Deposition Processes

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Study on Kidney Function in Female Workers Exposed to Perchlorethylene

Human & Experimental Toxicology ◽

10.1177/096032719000900603 ◽

1990 ◽

Vol 9 (6) ◽

pp. 377-380 ◽

Cited By ~ 14

Author(s):

A. Vyskočil ◽

S. Emminger ◽

J. Tejral ◽

Z. Fiala ◽

E. Ettlerova ◽

...

Keyword(s):

Urinary Excretion ◽

Biochemical Parameters ◽

Renal Damage ◽

Ambient Air ◽

Exposed Group ◽

Control Group ◽

Total Proteins ◽

Dry Cleaning ◽

Female Workers ◽

Occupationally Exposed

1 Biochemical markers of kidney damage were examined in 16 female workers chronically exposed to tetrachlorethylene (TCE) in five dry-cleaning shops. The results were compared with those obtained in 13 females non-occupationally exposed to organic solvents. 2 The intensity of exposure was monitored by personal environmental monitoring. The time-weighed average exposure to TCE amounted to 157 mg m-3 (range 9-799 mg m-3). A satisfactory agreement was found between the concentration of TCE in ambient air sampled with the charcoal tube method and with a passive dosimeter. 3 The urinary excretion of lysozyme was increased in the exposed group. No difference was found in the urinary excretion of albumin, β2-microglobulin, lactate dehydrogenase, total proteins or glucose. The prevalence of abnormal values of biochemical parameters in the exposed group did not differ from that observed in the control group. No correlation was found between the level of TCE exposure and biochemical parameters. 4 The present study suggests that chronic exposure to TCE does not lead to renal damage.

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RESEARCH OF CYCLONE CHARACTERISTICS FOR DRY CLEANING OF GASES FROM DUST

Joupnal of New Technologies in Environmental Science ◽

10.30540/jntes-2020-3.4 ◽

2020 ◽

Vol 5 (3) ◽

pp. 49-61

Author(s):

Andrii Cheilytko ◽

◽

Sergii Ilin

Keyword(s):

Mathematical Model ◽

Mass Transfer ◽

Working Conditions ◽

Ecological Condition ◽

Air Purification ◽

Dust Collection ◽

Dry Cleaning ◽

Harmful Emissions ◽

Reduce Emissions ◽

The Mathematical Model

The development and application of new, more efficient dust collection units that will help reduce emissions and conserve some very valuable resources for production is an important area of research. With the growth of innovation in technological enterprises, the number of harmful emissions into the atmosphere is growing. Thus, the ecological condition of the environment deteriorates. The basic analytical dependences which are necessary for construction of a technique of carrying out experiments and calculations of dust catching for concrete working conditions are developed. Methods of calculating cyclones as vortex devices and research of cyclone operation for air purification from dust were investigated. On the basis of the used basic theoretical positions of heat and mass transfer and thermodynamics at carrying out analytical researches the mathematical model was offered. Calculations of new designs of modern cyclones to obtain their geometric dimensions, resistance and dust capture efficiency were presented. Modern cyclones are designed to more effectively remove dust from the air during various types of work.

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Restaurarea unui antimis datat 1822

Anuarul Muzeului Etnograif al Transilvaniei ◽

10.47802/amet.2020.34.20 ◽

2020 ◽

Vol 34 ◽

pp. 343-350

Author(s):

Laura Troșan

Keyword(s):

Dry Cleaning ◽

Silk Cloth ◽

Original Shape ◽

Wax Deposits ◽

Printing Techniques

"Restoration of an antimension dated 1822 The antimension is a consecrated liturgical textile object, it is kept on an altar, and without it the Divine Liturgy cannot be celebrated. The antimension is made of a rectangular linen or silk cloth, decorated with the representation of the Entombment of Christ and of the four Evangelists, in various printing techniques. The restoration operations carried out include mechanical dry cleaning, removal of wax deposits, rehydration and regaining the original shape of the piece. Keywords: Antimension, restoration, cult objects, Romanian in the Cyrillic alphabet, Slavonic "

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Removal of CrN Contamination from EUV Mask Backside Using Dry Cleaning

Solid State Phenomena ◽

10.4028/www.scientific.net/ssp.282.59 ◽

2018 ◽

Vol 282 ◽

pp. 59-63

Author(s):

Hyun Tae Kim ◽

Nagendra Prasad Yerriboina ◽

Hee Jin Song ◽

Jin Goo Park

Keyword(s):

Electrostatic Force ◽

High Vacuum ◽

Material Structure ◽

Front Side ◽

Dry Cleaning ◽

Lithography Process ◽

Contact Points ◽

Strong Energy ◽

Euv Lithography ◽

High Vacuum Environment

For EUV lithography, a reflective mask is essential because of use of the strong energy, wavelength of 13.5 nm. The EUV mask consists of multi-layered, multi-material structure and is susceptible to various contaminants. Since EUV lithography process should be used in a high vacuum environment, an electrostatic chuck (ESC) is used to fix or hold the EUV mask using electrostatic force. In general, in order to use ESC chuck, it needs a thin conductive layer (CrN layer) on the backside. However, the contact points of the electrostatic pin chuck can make exfoliation of conductive CrN layer producing CrN particles. If these particles are present on the backside of the mask, CD or DOF may be affected during EUV exposure. The 1 μm particle can leads to a gap radius of 42mm [4]. Moreover, these backside particles may travel to the front side. Therefore, backside cleaning should be performed to remove particles from the mask backside surface.

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