scholarly journals Investigation of a Simplified Mechanism Model for Prediction of Gallium Nitride Thin Film Growth through Numerical Analysis

Coatings ◽  
2017 ◽  
Vol 7 (3) ◽  
pp. 43 ◽  
Author(s):  
Chih-Kai Hu ◽  
Chun-Jung Chen ◽  
Ta-Chin Wei ◽  
Tomi Li ◽  
Ching-Chiun Wang ◽  
...  
Keyword(s):  
Thin Film ◽  
Gallium Nitride ◽  
Numerical Analysis ◽  
Film Growth ◽  
Thin Film Growth ◽  
Mechanism Model ◽  
Simplified Mechanism

NUMERICAL ANALYSIS ON THE THIN-FILM GROWTH AT ROOM TEMPERATURE BY COOL-LIQUEFACTION OF NANO-PHASE AEROSOL PARTICLES

2001 ◽  
Vol 32 ◽  
pp. 229-230
Author(s):  
Y. MATSUBARA ◽  
M. TAKAHASI ◽  
H. OKU ◽  
S. OGASAWARA ◽  
H. TAKANO ◽  
...  
Keyword(s):  
Thin Film ◽  
Numerical Analysis ◽  
Room Temperature ◽  
Film Growth ◽  
Aerosol Particles ◽  
Thin Film Growth

scholarly journals Numerical Verification of Gallium Nitride Thin-Film Growth in a Large MOCVD Reactor

Coatings ◽  
2017 ◽  
Vol 7 (8) ◽  
pp. 112 ◽  
Author(s):  
Chih-Kai Hu ◽  
Chun-Jung Chen ◽  
Ta-Chin Wei ◽  
Tomi T. Li ◽  
Chih-Yung Huang ◽  
...  
Keyword(s):  
Thin Film ◽  
Gallium Nitride ◽  
Film Growth ◽  
Thin Film Growth ◽  
Numerical Verification ◽  
Mocvd Reactor

scholarly journals Thin film growth of heavy fermion chiral magnet YbNi3Al9

2021 ◽  
Vol 118 (10) ◽  
pp. 102402
Author(s):  
Hiroaki Shishido ◽  
Akira Okumura ◽  
Tatsuya Saimyoji ◽  
Shota Nakamura ◽  
Shigeo Ohara ◽  
...  
Keyword(s):  
Thin Film ◽  
Heavy Fermion ◽  
Film Growth ◽  
Thin Film Growth

Radical-triggered cross-linking for molecular layer deposition of SiAlCOH hybrid thin films

2021 ◽  
Author(s):  
Kristina Ashurbekova ◽  
Karina Ashurbekova ◽  
Iva Saric ◽  
Evgeny Modin ◽  
Mladen Petravic ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Molecular Layer ◽  
Thin Film Growth ◽  
Cross Linking ◽  
Layer By Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Hybrid Thin Films ◽  
Enhanced Stability

We developed a thin film growth with a radical-initiated cross-linking of vinyl groups in a layer-by-layer manner via molecular layer deposition (MLD). The cross-linked film exhibited improved properties like 12% higher density and enhanced stability compared to the non-cross-linked film.

Atomic Layer Deposition of Chalcogenides for Next-Generation Phase Change Memory

2021 ◽  
Author(s):  
Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
Cheol Seong Hwang
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Phase Change Memory ◽  
Film Surface ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Growth Technique ◽  
Layer Deposition ◽  
Change Memory

Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...

Atomically controlled surfaces with step and terrace of β-Ga2O3 single crystal substrates for thin film growth

2008 ◽  
Vol 254 (23) ◽  
pp. 7838-7842 ◽  
Author(s):  
Shigeo Ohira ◽  
Naoki Arai ◽  
Takayoshi Oshima ◽  
Shizuo Fujita
Keyword(s):  
Thin Film ◽  
Single Crystal ◽  
Film Growth ◽  
Thin Film Growth
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