scholarly journals Electrochemical Behavior, Microstructure, and Surface Chemistry of Thermal-Sprayed Stainless-Steel Coatings

Coatings ◽  
2019 ◽  
Vol 9 (12) ◽  
pp. 835
Author(s):  
Alexandre R. C. Nascimento ◽  
Samantha Michelle Gateman ◽  
Janine Mauzeroll ◽  
Sylvio Savoie ◽  
Robert Schulz ◽  
...  
Keyword(s):  
Stainless Steel ◽  
Electrochemical Behavior ◽  
Photoelectron Spectra ◽  
X Ray ◽  
Polarization Behavior ◽  
Arc Melting ◽  
Deposition Parameters ◽  
Wide Range ◽  
Stainless Steel Coatings ◽  
Thermally Sprayed

Thermally sprayed stainless-steel coatings were produced with a wide range of deposition parameters. The electrochemical behavior of polished coatings was monitored for 3 weeks in 3.5 wt.% NaCl aqueous solution and compared to that of reference materials including a wrought stainless steel plate and a bulk ingot produced by arc melting of the spraying powder feedstock. Transitions in the polarization behavior are discussed based on the observed changes in coating microstructures as well as on the shifts in X-ray photoelectron spectra (XPS). Results show that the deposition parameters have a strong effect on the coating microstructures but the small differences in the polarization behavior of coatings mostly disappear after 1 week of testing. Microstructure evidence shows preferential corrosion at splats experiencing melting prior to deposition. Pitting and corrosion products between splat boundaries are also reported. XPS analysis shows that the coating surfaces are enriched in chromium oxides and hydroxides. Comparison between the coating and bulk stainless steels suggests that coating inherent defects play a major role on their impaired corrosion resistance.

scholarly journals The Effects of Ti Additions and Deposition Parameters on the Structural and Mechanical Properties of Stainless Steel-Nitride Thin Films

Coatings ◽  
2019 ◽  
Vol 9 (5) ◽  
pp. 329
Author(s):  
Faisal I. Alresheedi ◽  
James E. Krzanowski
Keyword(s):  
Stainless Steel ◽  
Photoelectron Spectroscopy ◽  
Lower Surface ◽  
Grain Structure ◽  
Composition Analysis ◽  
Transition Metal Nitrides ◽  
N Content ◽  
X Ray ◽  
Deposition Parameters ◽  
Stainless Steel Coatings

This study examines the structure and properties of stainless steel coatings deposited to incorporate large concentrations of nitrogen along with varying amounts of titanium. Deposition was carried out using magnetron co-sputtering of stainless steel and titanium from separate targets in a mixed Ar/N2 gas atmosphere. Composition analysis by X-ray photoelectron spectroscopy showed that while films with up to 4 at.% Ti exhibited little change in nitrogen content (compared to films deposited without Ti) and remained sub-stoichiometric with respect to N content. Films with 7–8 at.% Ti had a higher N level and further increasing the Ti level to 11–12 at.% resulted in stoichiometric N levels. X-ray diffraction showed that the films all had a nominally FCC structure with no additional phases. However, the peak locations for the (111) and (200) reflections indicated a distorted lattice characteristic of the S-phase, with calculated c/a values ranging from 1.007 to 1.033. The Ti additions, along with the corresponding increase in N content, helped reduce the extent of lattice distortion. The film microstructure of the higher (11–12 at.%) Ti films also showed higher density, lower surface roughness, and a finer grain structure. As a result, these films had a higher hardness compared to the sub-stoichiometric films, with hardness levels in the range of 18–23 GPa, typical of transition metal nitrides coatings.

Electrochemical behavior of thermally sprayed stainless steel coatings in 3.4% NaCl solution

2005 ◽  
Vol 47 (3) ◽  
pp. 605-620 ◽  
Author(s):  
P.H. Suegama ◽  
C.S. Fugivara ◽  
A.V. Benedetti ◽  
J. Fernández ◽  
J. Delgado ◽  
...  
Keyword(s):  
Stainless Steel ◽  
Electrochemical Behavior ◽  
Nacl Solution ◽  
Stainless Steel Coatings ◽  
Thermally Sprayed

In Situ Synchrotron X-ray Absorption Experiments and Modelling of the Growth Rates of Electrochemically Deposited ZnO Nanostructures

2007 ◽  
Vol 1017 ◽  
Author(s):  
Bridget Ingham ◽  
Benoit N. Illy ◽  
Jade R. Mackay ◽  
Stephen P. White ◽  
Shaun C. Hendy ◽  
...  
Keyword(s):  
Growth Rates ◽  
High Resolution Electron Microscopy ◽  
Ex Situ ◽  
X Ray ◽  
Deposition Parameters ◽  
Wide Range ◽  
Electrochemically Deposited ◽  
Electrochemical Current ◽  
X Ray Absorption

AbstractZnO is known to produce a wide variety of nanostructures that have enormous scope for optoelectronic applications. Using an aqueous electrochemical deposition technique, we are able to tightly control a wide range of deposition parameters (Zn2+ concentration, temperature, potential, time) and hence the resulting deposit morphology. By simultaneously conducting synchrotron x-ray absorption spectroscopy (XAS) experiments during the deposition, we are able to directly monitor the growth rates of the nanostructures, as well as providing direct chemical speciation of the films. In situ experiments such as these are critical to understanding the nucleation and growth of such nanostructures.Recent results from in situ XAS synchrotron experiments demonstrate the growth rates as a function of potential and Zn2+ concentration. These are compared with the electrochemical current density recorded during the deposition, and the final morphology revealed through ex situ high resolution electron microscopy. The results are indicative of two distinct growth regimes, and simultaneous changes in the morphology are observed.These experiments are complemented by modelling the growth of the rods in the transport-limited case, using the Nernst-Planck equations in 2 dimensions, to yield the growth rate of the volume, length, and radius as a function of time.

X-ray photoelectron spectra of adhesion-enhanced a-Si:H on stainless steel induced by plasma treatments

1998 ◽  
Vol 227-230 ◽  
pp. 59-62 ◽  
Author(s):  
A Gheorghiu-de La Rocque ◽  
N Bertrand ◽  
P.A Bonnefont ◽  
P Bulkin ◽  
B Drévillon ◽  
...  
Keyword(s):  
Stainless Steel ◽  
Photoelectron Spectra ◽  
X Ray ◽  
Plasma Treatments

Investigation of Thermal Sprayed Stainless Steel/WC-12wt%Co Nanocomposite Coatings

2011 ◽  
Vol 695 ◽  
pp. 441-444 ◽  
Author(s):  
Chaiyasit Banjongprasert ◽  
Piyaporn Jaimeewong ◽  
Sukanda Jiansirisomboon
Keyword(s):  
Stainless Steel ◽  
Steel Powder ◽  
Industrial Applications ◽  
Nano Particles ◽  
X Ray Diffraction ◽  
Wear Properties ◽  
Cross Sectional ◽  
X Ray ◽  
Spray Coatings ◽  
Wide Range

The thermal spray coatings of stainless steel with nano-sized particles as reinforcement have been studied. Stainless steel powder mixed with 0, 2.5, 5 and 10 wt% WC-12wt%Co nano-sized powder was flame sprayed. The presence of WC-12wt%Co nano-particles in mixed powders as feedstock was confirmed. The microstructure of the coatings has been investigated using a wide range of characterization techniques: optical microscopy with image analysis, X-ray diffraction (XRD), and scanning electron microscopy (SEM) with energy dispersive spectroscopy (EDS) to understand the microstructure evolution. Chemical composition and microstructure of the coatings showed that the coatings contained stainless steel, WC, Co, and oxide layers. The addition of WC-12wt%Co increased cross-sectional hardness, reduced porosity and friction coefficient. The improved wear properties demonstrate a high potential for industrial applications of stainless steel/WC-12wt%Co coatings.

X-ray photoelectron spectra of C6F5X compounds (X = CH3, CF3, CN, CHO, OH, OCH3, NH2, NO2)

1978 ◽  
Vol 56 (4) ◽  
pp. 538-542 ◽  
Author(s):  
Barry C. Trudell ◽  
S. James W. Price
Keyword(s):  
Gas Phase ◽  
Curve Fitting ◽  
Binding Energies ◽  
Photoelectron Spectra ◽  
Atomic Charges ◽  
X Ray ◽  
Wide Range ◽  
Charge Calculations

The gas phase photoelectron spectra, XPS, were observed for the series C6F5X (X = CH3, CF3, OCH3, OH, CHO, NO2, NH2, CN). Binding energies were determined from the spectra by using computer curve fitting. Charge calculations were carried out using CNDO/2 and ACHARGE techniques. The CNDO/2 analysis led to the following correlation for the C 1s binding energies and the atomic charges, qi[Formula: see text]Correlations were also obtained for O 1s and N 1s:[Formula: see text]These equations are based on only four and three points respectively. However, the N 1s values cover a wide range (Ei, 402 to 419 eV; qi, −0.2 to 0.5) and show a better correlation than those for oxygen.

scholarly journals Effect of nano-grain carbide formation on electrochemical behavior of 316L stainless steel

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Chatdanai Boonruang ◽  
Wutipong Sanumang
Keyword(s):  
Stainless Steel ◽  
Relaxation Process ◽  
Electrochemical Behavior ◽  
Photoelectron Spectroscopy ◽  
316L Stainless Steel ◽  
Electrochemical Impedance ◽  
Carbide Formation ◽  
Low Oxygen ◽  
Compound Formation ◽  
X Ray

AbstractThe effect of low oxygen-partial pressured carburizing on relaxation process for 316L stainless steel is reported. Phase, morphology, and amount of compound formation during initial stage of carburizing are investigated using X-ray diffractometry (XRD) and X-ray photoelectron spectroscopy (XPS). The results show formation and development of surface multilayer with nano-grain-carbide (Cr7C3, Fe7C3, and/or Cr3C2) generation in the layer located below outermost protective layer. The relaxation process has been investigated using electrochemical impedance spectroscopy (EIS). Formation of nano-grain carbide(s) during carburizing causes deterioration effect on the electrochemical behavior of steel. However, the steel with large amount of carbide generation (carburized for 30 min) tends to have higher corrosion resistance (indicated by higher values of Rcl and Rct) than the smaller ones (10 and 20 min) due to the effect of phase, grain size, morphology, and amount of compound formation.

PROPERTIES AND PREPARATION OF AlN THIN FILMS BY REACTIVE LASER ABLATION WITH NITROGEN DISCHARGE

2000 ◽  
Vol 14 (14) ◽  
pp. 523-530 ◽  
Author(s):  
HONG-HAI WANG
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Substrate Temperature ◽  
Preferred Orientation ◽  
Photoelectron Spectra ◽  
Breakdown Field ◽  
Orientation Relationships ◽  
X Ray ◽  
Deposition Parameters ◽  
Nitrogen Discharge

Highly oriented AlN thin films have been deposited on (100) and (111) Si wafers by reactive laser ablation with nitrogen discharge at low substrate temperature. The composition and microstructure of films strongly depend on deposition parameters. X-ray photoelectron spectra showed that nitrogen discharge is of great importance to the composition of the films. The effect of substrate temperature on the preferred orientation of films has been investigated carefully by means of X-ray diffraction. Under optimizing deposition parameters — 1.0 J/cm 2 laser fluence, 5 Hz pulse frequency, 100 mTorr nitrogen pressure, 650 V discharge voltage and 200°C substrate temperature — the AlN films deposited on silicon substrates were smooth, dense and stoichiometric with very good preferred orientation. The orientation relationships between films and substrates were AlN(100)//Si(100) and AlN(110)//Si(111). The average refractive index was found to be 2.05 with the usage of an ellipsometer. The films had a band gap of 6.2 eV as measured by UV–visible absorption. The IR spectrum had an absorption characteristic of AlN. Examination of electric properties of films that was carried out on the metal–insulator–semiconductor structure of Au/AlN/Si showed that the dielectric constant, resistivity and breakdown field were 8.3, 2 × 1013 Ω· cm and 3 × 106 V/cm , respectively.

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