Integrable Near-Infrared Photodetectors Based on Hybrid Erbium/Silicon Junctions
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This paper presents the design, fabrication, and characterization of Schottky erbium/silicon photodetectors working at 1.55 µm. These erbium/silicon junctions are carefully characterized using both electric and optical measurements at room temperature. A Schottky barrier ΦB of ~673 meV is extrapolated; the photodetectors show external responsivity of 0.55 mA/W at room temperature under an applied reverse bias of 8 V. In addition, the device performance is discussed in terms of normalized noise and noise-equivalent power. The proposed devices will pave the way towards the development of Er-based photodetectors and light sources to be monolithically integrated in the same silicon substrate, and both operating at 1.55 µm.
2018 ◽
2012 ◽
Vol 2012
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pp. 1-6
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2008 ◽
2019 ◽
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2015 ◽
Vol 1096
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pp. 435-440
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