Preparation of silicon carbide and similar materials for analysis by ISO 12677 X-ray fluorescence (XRF) - Fused cast-bead method

2018 ◽  
2004 ◽  
Vol 230-232 ◽  
pp. 1-16 ◽  
Author(s):  
William M. Vetter

Synchrotron white-beam x-ray topographs taken in the back-reflection mode have proved a powerful tool in the study of defects in semiconductor-grade silicon carbide crystals. Capable of mapping the distribution of axial dislocations across a wafer's area (notably the devastating micropipe defect), it can also provide information on their natures. Under favorable conditions, various other types of defect may be observed in back-reflection topographs of SiC, among which are subgrain boundaries, inclusions, and basal plane dislocations. Observed defect images in backreflection topographs may be simulated using relatively simple computer algorithms based on ray tracing. It has been possible to use back-reflection topographs of SiC substrates with device structures deposited upon them to relate the incidence of defects to device failure.


1991 ◽  
Vol 6 (12) ◽  
pp. 2723-2734 ◽  
Author(s):  
Gary M. Renlund ◽  
Svante Prochazka ◽  
Robert H. Doremus

Silicon oxycarbide glass is formed by the pyrolysis of silicone resins and contains only silicon, oxygen, and carbon. The glass remains amorphous in x-ray diffraction to 1400 °C and shows no features in transmission electron micrographs (TEM) after heating to this temperature. After heating at higher temperature (1500–1650 °C) silicon carbide lines develop in x-ray diffraction, and fine crystalline regions of silicon carbide and graphite are found in TEM and electron diffraction. XPS shows that silicon-oxygen bonds in the glass are similar to those in amorphous and crystalline silicates; some silicons are bonded to both oxygen and carbon. Carbon is bonded to either silicon or carbon; there are no carbon-oxygen bonds in the glass. Infrared spectra are consistent with these conclusions and show silicon-oxygen and silicon-carbon vibrations, but none from carbon-oxygen bonds. 29Si-NMR shows evidence for four different bonding groups around silicon. The silicon oxycarbide structure deduced from these results is a random network of silicon-oxygen tetrahedra, with some silicons bonded to one or two carbons substituted for oxygen; these carbons are in turn tetrahedrally bonded to other silicon atoms. There are very small regions of carbon-carbon bonds only, which are not bonded in the network. This “free” carbon colors the glass black. When the glass is heated above 1400 °C this network composite rearranges in tiny regions to graphite and silicon carbide crystals. The density, coefficient of thermal expansion, hardness, elastic modulus, index of refraction, and viscosity of the silicon oxycarbide glasses are all somewhat higher than these properties in vitreous silica, probably because the silicon-carbide bonds in the network of the oxycarbide lead to a tighter, more closely packed structure. The oxycarbide glass is highly stable to temperatures up to 1600 °C and higher, because oxygen and water diffuse slowly in it.


2006 ◽  
Vol 21 (10) ◽  
pp. 2550-2563 ◽  
Author(s):  
Maxime J-F. Guinel ◽  
M. Grant Norton

The oxidation of both single crystal and relatively pure polycrystalline silicon carbide, between 973 and 2053 K, resulted in the formation of cristobalite, quartz, or tridymite, which are the stable crystalline polymorphs of silica (SiO2) at ambient pressure. The oxide scales were found to be pure SiO2 with no contamination resulting from the oxidizing environment. The only variable affecting the occurrence of a specific polymorph was the oxidation temperature. Cristobalite was formed at temperatures ≥1673 K, tridymite between 1073 and 1573 K, and quartz formed at 973 K. The polymorphs were determined using electron diffraction in a transmission electron microscope. These results were further confirmed using infrared and Raman spectroscopies. Cristobalite was observed to grow in a spherulitic fashion from amorphous silica. This was not the case for tridymite and quartz, which appeared to grow as oriented crystalline films. The presence of a thin silicon oxycarbide interlayer was detected at the interface between the SiC substrate and the crystalline silica using x-ray photoelectron spectroscopy.


CIRP Annals ◽  
1999 ◽  
Vol 48 (1) ◽  
pp. 277-280 ◽  
Author(s):  
Y. Namba ◽  
H. Kobayashi ◽  
H. Suzuki ◽  
K. Yamashita ◽  
N. Taniguchi

2015 ◽  
Vol 5 (01) ◽  
pp. 31
Author(s):  
Resky Irfanita ◽  
Asnaeni Ansar ◽  
Ayu Hardianti Pratiwi ◽  
Jasruddin J ◽  
Subaer S

The objective of this study is to investigate the effect of sintering temperature on the synthesis of SiC produced from rice husk ash (RHA) and 2B graphite pencils. The SiC was synthesized by using solid state reaction method sintered at temperatures of 750°C, 1000°C and 1200°C for 26 hours, 11.5 hours and 11.5 hours, respectively. The quantity and crystallinity level of SiC phase were measured by means of Rigaku MiniFlexII X-Ray Diffraction (XRD). The microstructure of SiC was examined by using Tescan Vega3SB Scanning Electron Microscopy (SEM). The XRD results showed that the concentration (wt%) of SiC phase increases with the increasing of sintering temperature. SEM results showed that the crystallinity level of SiC crystal is improving as the sintering temperature increases


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