Inductively Coupled Plasma Sputtering System for Oxide Semiconductors for a Large Area Deposition

2020 ◽  
pp. 331
Author(s):  
Daisuke Matsuo ◽  
Takuya Ikeda ◽  
Shigeaki Kishida ◽  
Yoshitaka Setoguchi ◽  
Yasunori Andoh ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Large Area ◽  
Oxide Semiconductors ◽  
Inductively Coupled ◽  
Plasma Sputtering ◽  
Area Deposition ◽  
Sputtering System

Low Inductance Antenna (LIA) plasma source and plasma-enhanced dual rotatable magnetron sputter assisted with LIA

2015 ◽  
Vol 2015 (1) ◽  
pp. 000757-000760
Author(s):  
Y. Takaya ◽  
Y. Tanioka ◽  
H. Yoshino ◽  
A. Osawa
Keyword(s):  
Inductively Coupled Plasma ◽  
Low Voltage ◽  
Polymer Surface ◽  
Plasma Source ◽  
Large Area ◽  
Plasma Damage ◽  
Inductively Coupled ◽  
Temperature Deposition ◽  
Magnetron Sputter ◽  
Plasma Profile

In recent years, both low plasma damage and low temperature deposition technic for polymer substrates (e.g. PCB, films and etc.) are often required. We have developed a plasma enhanced dual rotatable magnetron sputter source assisted with inductively coupled plasma (ICP) using low inductance antenna (LIA). LIA has same unique characteristics, a)low voltage high density plasma, b)well controllability of plasma profile to ensure uniformity over large area, c)ionization of sputtered particle and etc. when in being used as a plasma assistant, and besides, LIA can be used as a ICP source for polymer surface modification. We introduce a variety of the possibilities of whether this sputter source is usable for the process of the fabrication of PCB.

Large-area ion source combining microwaves with inductively coupled plasma

2000 ◽  
Vol 71 (2) ◽  
pp. 716-718 ◽  
Author(s):  
S. Okuji ◽  
N. Sakudo ◽  
K. Hayashi ◽  
M. Okada ◽  
T. Onogawa ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Ion Source ◽  
Large Area ◽  
Inductively Coupled

An array of inductively coupled plasma sources for large area plasma

1999 ◽  
Vol 355-356 ◽  
pp. 252-255 ◽  
Author(s):  
Se-Geun Park ◽  
Chul Kim ◽  
Beom-hoan O
Keyword(s):  
Inductively Coupled Plasma ◽  
Large Area ◽  
Plasma Sources ◽  
Inductively Coupled
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