Effect of Pulse Electrical Parameters on Performance of Deposited Copper Coatings with Citrate System at Room Temperature

2014 ◽  
Vol 528 ◽  
pp. 8-13
Author(s):  
Jian Jun Xi ◽  
Jun Zhao ◽  
Zhi Gang Wang ◽  
Chun Ping Zhao ◽  
Mei Ping Xue
Keyword(s):  
Surface Morphology ◽  
Current Density ◽  
Coating Thickness ◽  
Room Temperature ◽  
Duty Ratio ◽  
Thickness Gauge ◽  
Copper Plating ◽  
Electrical Parameters ◽  
Uniform Coating ◽  
Copper Coatings

This article presents a detailed research on pulse electrical parameters for non-cyanide electroplating copper plating on stainless still substrate. The study was made about the effect of the current density, duty ratio and frequency on the surface morphology, thickness and uniformity of the deposited layers. The surface morphology was examined by MIT 300 metallurgical microscope and the thickness of copper coatings was examined by TT260 coating thickness gauge. Current density 0.4A/dm2 is the optimum current at which the best uniform coating can be formed.

scholarly journals Исследование вольт-амперных характеристик новых гетероструктур MnO-=SUB=-2-=/SUB=-/GaAs(100) и V-=SUB=-2-=/SUB=-O-=SUB=-5-=/SUB=-/GaAs(100), прошедших термическую обработку

2019 ◽  
Vol 53 (8) ◽  
pp. 1074
Author(s):  
Б.В. Сладкопевцев ◽  
Г.И. Котов ◽  
И.Н. Арсентьев ◽  
И.С. Шашкин ◽  
И.Я. Миттова ◽  
...  
Keyword(s):  
Surface Morphology ◽  
Thermal Oxidation ◽  
Current Density ◽  
Chemical Bonding ◽  
Room Temperature ◽  
Reverse Bias ◽  
Electrical Parameters ◽  
Internal Interface ◽  
Current Voltage ◽  
Bias Range

AbstractComplex oxide films with a thickness of about 200 nm are formed during the thermal oxidation of GaAs with magnetron-deposited V_2O_5 and MnO_2 nanolayers. The electrical parameters of the films (reverse-bias breakdown voltage and current density) are determined by the method of current–voltage ( I – V ) characteristics at room temperature in the bias range from –5 to +5 V, and their composition and surface morphology are investigated. It is shown that V_2O_5 facilitates the more intense (in comparison with MnO_2) chemical bonding of arsenic at the internal interface with the formation of As_2O_5. As a result, thermally oxidized V_2O_5/GaAs heterostructures exhibit higher breakdown voltages.

scholarly journals Formation of Graphite-Copper/N-Silicon Schottky Photovoltaic Diodes Using Different Plasma Technologies

Energies ◽  
2021 ◽  
Vol 14 (21) ◽  
pp. 6896
Author(s):  
Žydrūnas Kavaliauskas ◽  
Vilius Dovydaitis ◽  
Romualdas Kėželis ◽  
Liutauras Marcinauskas ◽  
Vitas Valinčius ◽  
...  
Keyword(s):  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Plasma Spraying ◽  
Current Density ◽  
Crystalline Phase ◽  
Copper Content ◽  
Schottky Diodes ◽  
Copper Films ◽  
Copper Coatings ◽  
Photovoltaic Characteristics

Plasma spraying and magnetron sputtering were used to form graphite–copper films on an n-type silicon surface. The main objective of this work was to compare the properties of the obtained graphite–copper Schottky photodiodes prepared using two different layer formation methods and to evaluate the influence of copper content on the surface morphology, phase structure, and photovoltaic characteristics of the graphite–copper films. Surface morphology analysis shows that the surface of the formed layers using either plasma spraying technology or the magnetron sputtering method consists of various sphere-shaped microstructures. The X-ray diffraction measurements demonstrated that the graphite–copper coatings formed by plasma spraying were crystalline phase. Meanwhile, the films deposited by magnetron sputtering were amorphous when the copper concentration was up to 9.7 at.%. The increase in copper content in the films led to the formation of Cu crystalline phase. Schottky diodes formed using magnetron sputtering technology had a maximum current density of 220 mA/cm2 at 5 V. Meanwhile, the maximum electric current density of Schottky photodiodes formed using plasma spraying reached 3.8 mA/cm2. It was demonstrated that the efficiency of Schottky diodes formed using magnetron sputtering was up to 60 times higher than Schottky diodes formed using plasma spraying.

Technology on Ni-ZrO2-CeO2 Nanocomposites by Pulse Electroforming in an Ultrasonic Field

2013 ◽  
Vol 579-580 ◽  
pp. 138-143
Author(s):  
Yang Yang Xu ◽  
Yu Jun Xue ◽  
Ji Shun Li ◽  
Yi Liu ◽  
Fang Yang
Keyword(s):  
Surface Morphology ◽  
Current Density ◽  
Pulse Current ◽  
Ultrasonic Field ◽  
Double Pulse ◽  
Duty Ratio ◽  
Positive Duty ◽  
Average Current Density ◽  
Average Current ◽  
Positive Frequency

Ni-ZrO2-CeO2 nanocomposites were prepared by double-pulse current in an ultrasonic field. The effect of average current density, duty ratio and frequency of double-pulse current on nanoparticles content of Ni-ZrO2-CeO2 nanocomposites was studied. Meanwhile, surface morphology and microhardness of nanocomposites were analyzed. The results show that, with the positive average current density, positive duty ratio and positive frequency increased, the nanoparticles contents increased at first and then decreased. On the contrary, it reduced while reverse average current density, reverse duty ratio and reverse frequency were increasing. Compared with Ni-ZrO2-CeO2 prepared by direct current and monopulse current, grain of Ni-ZrO2-CeO2 nanocomposite prepared by double-pulse current is finer, the microhardness is also higher.

Effects of Processing Parameters of Oxide Layer in Ultrasonic Vibration and Electrolytic In-Process Dressing Combined Grinding

2014 ◽  
Vol 1027 ◽  
pp. 3-7
Author(s):  
Bo Zhao ◽  
Xiao Feng Jia
Keyword(s):  
Surface Morphology ◽  
Oxide Layer ◽  
Ultrasonic Vibration ◽  
Processing Parameters ◽  
Wheel Speed ◽  
Duty Ratio ◽  
Process Conditions ◽  
Layer Surface ◽  
Electrical Parameters ◽  
Electrode Gap

In order to study the states of oxide layer under different pre-dressing process conditions in ultrasonic vibration and electrolytic in-process dressing combined grinding. The effects of electrical parameters, wheel speed, ultrasonic vibration on the oxide layer are investigated with indicators of oxide layer surface morphology and thickness characteristics. The results indicate that the oxide layer thickness increases with the decrease of inter-electrode gap and the increase of duty ratio with pre-dressing time. The effect of ultrasonic vibration cause thinning of the oxide layer. Oxide layer surface morphology allowing processing requirements are obtained by duty cycle of 5μs: 5μs, electrode gap of 0.3mm, wheel speed of 3200 r/min.

Influence of Momentary Annealing on the Nanoscale Surface Morphology of Room Temperature Pulsed Laser Deposited NiO(111) Epitaxial Thin Films on Atomically Stepped Sapphire (0001) Substrates

2013 ◽  
Vol 1507 ◽  
Author(s):  
Ryosuke Yamauchi ◽  
Geng Tan ◽  
Daishi Shiojiri ◽  
Nobuo Tsuchimine ◽  
Koji Koyama ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Morphology ◽  
Room Temperature ◽  
Pulsed Laser ◽  
Film Surface ◽  
Transient State ◽  
Epitaxial Thin Films ◽  
Flat Surfaces ◽  
Surface Nanostructure ◽  
Atomically Flat

ABSTRACTWe examined the influence of momentary annealing on the nanoscale surface morphology of NiO(111) epitaxial thin films deposited on atomically stepped sapphire (0001) substrates at room temperature in O2 at 1.3 × 10−3 and 1.3 × 10−6 Pa using a pulsed laser deposition (PLD) technique. The NiO films have atomically flat surfaces (RMS roughness: approximately 0.1–0.2 nm) reflecting the step-and-terrace structures of the substrates, regardless of the O2 deposition pressure. After rapid thermal annealing (RTA) of the NiO(111) epitaxial film deposited at 1.3 × 10−3 Pa O2, a periodic straight nanogroove array related to the atomic steps of the substrate was formed on the film surface for 60 s. In contrast, the fabrication of a transient state in the nanogroove array formation was achieved with RTA of less than 1 s. However, when the O2 atmosphere during PLD was 1.3 × 10−6 Pa, random crystal growth was observed and resulted in a disordered rough surface nanostructure after RTA.

Study on Electrodeposition of Ni-Graphite Composite Coatings in Sulfamate Bath

2010 ◽  
Vol 150-151 ◽  
pp. 1546-1550 ◽  
Author(s):  
Xiang Zhu He ◽  
Xiao Wei Zhang ◽  
Xin Li Zhou ◽  
Zhi Hong Fu
Keyword(s):  
Surface Morphology ◽  
Process Parameters ◽  
Current Density ◽  
Graphite Particle ◽  
Particle Concentration ◽  
Composite Coatings ◽  
Nickel Matrix ◽  
Graphite Composite ◽  
Surface Morphologies ◽  
Sulfamate Bath

This paper presented the composite coatings of nickel with graphite particle on the aluminum substrate using a nickel sulfamate bath. Effects of graphite particle concentration on the surface morphologies of the composite coatings were investigated. The inclusion of graphite particle into metal deposits was dependent on many process parameters, including particle concentration, current density, pH and temperature. Results of SEM and XRD demonstrated that graphite particle had successfully deposited on that nickel matrix; besides, the surface morphology of coatings obtained from sulfamate bath containing 2g/L graphite particle dispersed more uniformly than the ones with higher concentration.

AFM Study of Surface Morphology of Aluminum Nitride Thin Films

1995 ◽  
Vol 388 ◽  
Author(s):  
Yoshihisa Watanabe ◽  
Yoshikazu Nakamura ◽  
Shigekazu Hirayama ◽  
Yuusaku Naota
Keyword(s):  
Thin Films ◽  
Surface Morphology ◽  
Substrate Temperature ◽  
Single Crystal ◽  
Room Temperature ◽  
Ion Beam ◽  
Soda Lime ◽  
Silicon Single Crystal ◽  
Soda Lime Glass ◽  
Average Roughness

AbstractAluminum nitride (AlN) thin films have been synthesized by ion-beam assisted deposition method. Film deposition has been performed on the substrates of silicon single crystal, soda-lime glass and alumin A. the influence of the substrate roughness on the film roughness is studied. the substrate temperature has been kept at room temperature and 473K and the kinetic energy of the incident nitrogen ion beam and the deposition rate have been fixed to 0.5 keV and 0.07 nm/s, respectively. the microstructure of the synthesized films has been examined by X-ray diffraction (XRD) and the surface morphology has been observed by atomic force microscopy(AFM). IN the XRD patterns of films synthesized at both room temperature and 473K, the diffraction line indicating the alN (10*0) can be discerned and the broad peak composed of two lines indicating the a1N (00*2) and a1N (10*1) planes is also observed. aFM observations for 100 nm films reveal that (1) the surface of the films synthesized on the silicon single crystal and soda-lime glass substrates is uniform and smooth on the nanometer scale, (2) the average roughness of the films synthesized on the alumina substrate is similar to that of the substrate, suggesting the evaluation of the average roughness of the film itself is difficult in the case of the rough substrate, and (3) the average roughness increases with increasing the substrate temperature.

scholarly journals Skyrmion flow near room temperature in an ultralow current density

2012 ◽  
Vol 3 (1) ◽  
Author(s):  
X.Z. Yu ◽  
N. Kanazawa ◽  
W.Z. Zhang ◽  
T. Nagai ◽  
T. Hara ◽  
...  
Keyword(s):  
Current Density ◽  
Room Temperature

Wet Chemical Etching of Zn-containing oxides and HfO2 for the fabrication of Transparent TFTs

2009 ◽  
Vol 1201 ◽  
Author(s):  
Jae-Kwan Kim ◽  
Jun Young Kim ◽  
Seung-Cheol Han ◽  
Joon Seop Kwak ◽  
Ji-Myon Lee
Keyword(s):  
Sulfuric Acid ◽  
Surface Morphology ◽  
Chemical Etching ◽  
Etch Rate ◽  
Room Temperature ◽  
Wet Chemical ◽  
Wet Chemical Etching

AbstractThe etch rate and surface morphology of Zn-containing oxide and HfO2 films after wet chemical etching were investigated. ZnO could be easily etched using each acid tested in this study, specifically sulfuric, formic, oxalic, and HF acids. The etch rate of IGZO was strongly dependent on the etchant used, and the highest measured etch rate (500 nm/min) was achieved using buffered oxide etchant at room temperature. The etch rate of IGZO was drastically increased when sulfuric acid at concentration greater than 1.5 molar was used. Furthermore, etching of HfO2 films by BF acid proceeded through lateral widening and merging of the initial irregular pits.

scholarly journals Effect of pH on the characteristics of electroless Ni-P coatings

2017 ◽  
Vol 53 (3) ◽  
pp. 327-332 ◽  
Author(s):  
M. Czagany ◽  
P. Baumli
Keyword(s):  
Heat Treatment ◽  
Surface Morphology ◽  
Coating Thickness ◽  
Phase Structure ◽  
Phosphorus Content ◽  
Effect Of Ph ◽  
Alkaline Bath ◽  
Steel Substrates ◽  
Electroless Ni ◽  
Thick Coatings

In this study electroless Ni-P coatings were deposited on W302 steel substrates. The effects of bath pH and heat treatment at 400?C were investigated on the surface morphology, phase structure, phosphorus content, thickness and microhardness of the coatings. It was observed that both the phosphorus content and coating thickness are dependent on the bath pH. In an acidic/neutral bath, low and medium phosphorus coatings with thickness of 13.9-19.8 ?m were synthesized, while in an alkaline bath, high phosphorus, 4.8-5.8 ?m-thick coatings were formed. Coatings containing medium or high P seemed to be amorphous, while low P coatings had microcrystalline structures. Hardness was also dependent on the composition of the coating. After heat treatment, the structure of the coatings transformed into crystalline Ni with the precipitation of Ni3P phases, which resulted further increases in hardness.

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