Stress and Adhesion Determination of a Wedged Iron Film System by Buckle Morphologies

By using the mobile property of silicone oil, a wedged iron (Fe) film system, deposited on glass substrate, has been prepared by dc-magnetron sputtering technique. The wedged Fe film is quenched by the silicone oil during deposition, and therefore contains a very high compressive stress, which is relieved by formation of a large number of telephone cord buckles. Both the buckle width l and maximum buckle deflection δ increase linearly with the film thickness, but the ratio of δ to l (l/δ ) decreases steadily. The internal stress and adhesion energy are estimated in the frame of continuum elastic theory.

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GROWTH MECHANISM OF IRON FILMS ON SILICONE OIL SURFACES PREPARED BY SPUTTERING METHOD

Surface Review and Letters ◽

10.1142/s0218625x06008840 ◽

2006 ◽

Vol 13 (06) ◽

pp. 779-784 ◽

Cited By ~ 9

Author(s):

SEN-JIANG YU ◽

YONG-JU ZHANG ◽

JIANG-XING CHEN ◽

HONG-LIANG GE

Keyword(s):

Magnetron Sputtering ◽

Film Thickness ◽

Growth Mechanism ◽

Silicone Oil ◽

Atomic Clusters ◽

Iron Film ◽

Film System ◽

Dc Magnetron Sputtering ◽

Iron Films ◽

Sputtering Power

The growth mechanism and characteristic ordered patterns of iron ( Fe ) films deposited on the silicone oil surfaces by a DC-magnetron sputtering method are presented in this paper. It is found that as the film thickness increases, the iron atoms deposited on the oil surface first form compact clusters, then transfer to ramified aggregates and web-shaped structures, and finally form a continuous iron film. The average branch width of the ramified aggregates is about 0.34 μm, which is almost independent of the sputtering power, i.e., the deposition rate. In the continuous iron films, large spatially disk-shaped patterns are observed, which result from spontaneous ordered organization of the iron atoms and atomic clusters driven by the internal stress in this nearly free sustained film system.

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MECHANICAL BEHAVIORS OF QUENCHED IRON FILM SPUTTERING DEPOSITED ON GLASS SUBSTRATE

Surface Review and Letters ◽

10.1142/s0218625x07010366 ◽

2007 ◽

Vol 14 (05) ◽

pp. 879-884 ◽

Cited By ~ 4

Author(s):

YONG-JU ZHANG ◽

SEN-JIANG YU ◽

PING-GEN CAI ◽

HONG ZHOU

Keyword(s):

Kinetic Energy ◽

Magnetron Sputtering ◽

Glass Substrate ◽

Silicone Oil ◽

Crack Pattern ◽

Iron Film ◽

Film System ◽

Mechanical Behaviors ◽

Dc Magnetron Sputtering ◽

High Kinetic Energy

A characteristic wedge-shaped iron ( Fe ) film system, deposited on glass substrate by a DC-magnetron sputtering method and quenched by silicone oil during deposition, has been successfully fabricated. The mechanical behaviors of the quenched and non-quenched Fe films have been compared and analyzed. The internal stress is found to transform from tension to compression in nature after quenching, which results in the formation of buckling pattern in the quenched Fe film while crack pattern in the non-quenched film. It is proposed that the origin of the compressive stress is mainly due to freezing of the Fe atoms (or clusters) with high kinetic energy and doping of the oil molecules into the Fe film defects.

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EXPERIMENTAL OBSERVATIONS OF DISK-SHAPED PATTERNS IN Fe FILMS SPUTTERING DEPOSITED ON SILICONE OIL SURFACES

International Journal of Modern Physics B ◽

10.1142/s0217979209049772 ◽

2009 ◽

Vol 23 (14) ◽

pp. 3147-3157 ◽

Cited By ~ 10

Author(s):

YONG-JU ZHANG ◽

SEN-JIANG YU

Keyword(s):

Magnetron Sputtering ◽

Internal Stress ◽

Silicone Oil ◽

Atomic Clusters ◽

Vacuum Condition ◽

Growth Time ◽

Film System ◽

Dc Magnetron Sputtering ◽

Power Deposition ◽

Sputtering Power

We report the experimental observations of large spatially disk-shaped patterns in an iron (Fe) film system deposited on silicone oil surfaces by a DC-magnetron sputtering method. These disk patterns form spontaneously during deposition and grow successively in vacuum condition after deposition. Their nucleation, growth and evolution are strongly dependent on the sputtering power, deposition period and growth time. The experiment indicates that they may result from the spontaneous organization and gathering of the Fe atoms and atomic clusters driven by the internal stress.

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GROWTH CHARACTERISTIC OF GZO FILM FABRICATED BY RF MAGNETRON SPUTTERING

Jurnal Teknologi ◽

10.11113/jt.v75.5169 ◽

2015 ◽

Vol 75 (7) ◽

Author(s):

Farah Lyana Shain ◽

Azmizam Manie @ Mani ◽

Lam Mui Li ◽

Saafie Salleh ◽

Afishah Alias ◽

...

Keyword(s):

Magnetron Sputtering ◽

Film Thickness ◽

Glass Substrate ◽

Deposition Time ◽

Growth Characteristic ◽

Rf Magnetron Sputtering ◽

Optical Transmittance ◽

Rf Power ◽

Argon Flow ◽

Sputtering Power

This paper investigate the dependence of film thickness onto characteristic of Gallium doped Zinc Oxide (GZO). GZO films were deposited on a glass substrate by RF Magnetron Sputtering using GZO ceramic target with 99.99% purity. Thicknesses were altered by varying the deposition time from 10 min to 50 min meanwhile the sputtering power, argon flow and target distance were fixed in order to investigate the influence of film thickness to the growth characteristic, structural, optical properties and surface morphology of the films. Sputtering was performed with RF power of 100 watt and the argon flow was set at 10 sccm. GZO thin films on various thicknesses range from 130 nm to 460 nm were successfully deposited onto glass substrate with the crystallite grain size in range of 20.63 nm to 22.04 nm with the optical transmittance above 85 %.

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Structural, Morphological and Adhesion Properties of Cofeb Thin Films Deposited by DC Magnetron Sputtering

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.802.47 ◽

2013 ◽

Vol 802 ◽

pp. 47-52

Author(s):

Chuleerat Ibuki ◽

Rachasak Sakdanuphab

Keyword(s):

Thin Film ◽

Thin Films ◽

Grain Size ◽

Magnetron Sputtering ◽

Crystalline Structure ◽

Glass Substrate ◽

Intrinsic Stress ◽

Dc Magnetron Sputtering ◽

Adhesion Properties ◽

Sputtering Power

In this work the effects of amorphous (glass) and crystalline (Si) substrates on the structural, morphological and adhesion properties of CoFeB thin film deposited by DC Magnetron sputtering were investigated. It was found that the structure of a substrate affects to crystal formation, surface morphology and adhesion of CoFeB thin films. The X-Ray diffraction patterns reveal that as-deposited CoFeB thin film at low sputtering power was amorphous and would become crystal when the power increased. The increase in crystalline structure of CoFeB thin film is attributed to the crystalline substrate and the increase of kinetic energy of sputtering atoms. Atomic Force Microscopy images of CoFeB thin film clearly show that the roughness, grain size, and uniformity correlate to the sputtering power and the structure of substrate. The CoFeB thin film on glass substrate shows a smooth surface and a small grain size whereas the CoFeB thin film on Si substrate shows a rough surface and a slightly increases of grain size. Sticky Tape Test on CoFeB thin film deposited on glass substrate indicates the adhesion failure with a high sputtering power. The results suggest that the crystalline structure of substrate affects to the atomic bonding and the sputtering power affects to intrinsic stress of CoFeB thin film.

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The Effect of Charged Ag Nanoparticles on Thin Film Growth during DC Magnetron Sputtering

Coatings ◽

10.3390/coatings10080736 ◽

2020 ◽

Vol 10 (8) ◽

pp. 736

Author(s):

Gil-Su Jang ◽

Du-Yun Kim ◽

Nong-Moon Hwang

Keyword(s):

Electron Microscopy ◽

Growth Rate ◽

Magnetron Sputtering ◽

Film Thickness ◽

Film Growth ◽

Average Particle ◽

Carbon Membrane ◽

Dc Magnetron Sputtering ◽

Film Growth Rate ◽

Ag Particles

The possibility that charged nanoparticles (CNPs) are generated in the gas phase during direct current (DC) magnetron sputtering of Ag is studied. Sputtered Ag particles could be captured on an ultrathin amorphous carbon membrane for transmission electron microscopy (TEM) observation. It is confirmed that the average particle size and the total area of deposition under the condition of the positive bias applied to the substrate are bigger than those under the condition of the negative bias applied to the substrate. The results indicate that some of the sputtered Ag particles are negatively charged. To evaluate the contribution of negatively-charged particles to the film growth, Ag thin films were deposited for 30 min on the Si substrate with the substrate biases of −300, 0 and +300 V and analyzed by field-emission scanning electron microscopy (FESEM), X-ray diffraction (XRD) and four-point probe. When +300 V was applied to the substrate, the film growth rate was highest with the film thickness of 85.0 nm, the crystallinity was best with the smallest full width at half maximum (FWHM) value of 0.44 and the resistivity was smallest with 3.67 μΩ·cm. In contrast, when −300 V was applied to the substrate, the film growth rate was lowest with the film thickness of 68.9 nm, the crystallinity was worst with the largest FWHM value of 0.53 and the resistivity was largest with 8.87 μΩ·cm. This result indicates that the charge plays an important role in film growth and can be a new process parameter in sputtering.

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THE INFLUENCE OF EXTERNAL DISTURBANCE ON BUCKLING PATTERNS IN WEDGE-SHAPED Fe FILMS

Surface Review and Letters ◽

10.1142/s0218625x13500297 ◽

2013 ◽

Vol 20 (03n04) ◽

pp. 1350029 ◽

Cited By ~ 1

Author(s):

HONG ZHOU ◽

SEN-JIANG YU ◽

YONG-JU ZHANG ◽

MIAO-GEN CHEN

Keyword(s):

Magnetron Sputtering ◽

Growth Process ◽

Silicone Oil ◽

External Disturbance ◽

Morphological Characteristics ◽

Film System ◽

Glass Substrates ◽

Spontaneous Formation ◽

Stress Energy ◽

Direct Current Magnetron Sputtering

A wedge-shaped iron (Fe) film system, quenched by silicone oil during deposition, has been prepared on glass substrates by direct current magnetron sputtering, and the influence of external disturbance on buckling patterns is investigated. The experiment shows that the wedge-shaped Fe film possesses a high compressive stress, which is relieved by spontaneous formation of telephone cord buckles in the atmosphere condition. The growth process can last several days to more than a month. When the film is disturbed by an external force, the stored stress energy will release drastically to form straight-sided buckles within several seconds. The morphological characteristics, edge effect and formation mechanism of the straight-sided buckles are discussed in detail.

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