Preparation and Characterization of Nanostructured TiN Thin Films Deposited by DC Reactive MagnetronSputtering

2013 ◽  
Vol 770 ◽  
pp. 165-168 ◽  
Author(s):  
Adisorn Buranawong ◽  
Komgrit Saisereephap ◽  
Nirun Witit-Anun ◽  
Jakrapong Kaewkhao ◽  
Surasing Chaiyakun
Keyword(s):  
Crystal Structure ◽  
Thin Films ◽  
Surface Morphology ◽  
Deposition Time ◽  
Crystal Size ◽  
Sputtering Power ◽  
The Face ◽  
Tin Thin Films ◽  
Surface Morphologies ◽  
Steel Substrates

Titanium nitride (TiN) thin films of different crystal structure and morphologies were deposited by direct current (dc) reactive magnetron sputtering method under conditions of various deposition times (3090 min). The crystal structure, crystal size, thickness and surface morphology properties of the films were studied and the results were discussed with respect to deposition time. The films were deposited on Si (100) and stainless steel substrates with constant Ar to N2 ratio of 15:2 sccm and sputtering power of 280 W. The crystal structure was characterized by X-ray diffraction. The Scherrers formula was used to calculated crystal size. The surface morphology and thickness were evaluated by Atomic Force Microscope (AFM). The golden coloured with uniformnity of TiN films were obtained at deposition time for 30 min. The as-deposited films color was varied with the deposition times from gold, brown and dark brown. The polycrystalline films showed reflections corresponding to the (111), (200), (220) and (311) orientations of the face center cubic TiN structure. The crystallinity of the films was increased with increased the deposition times. The AFM results indicate that the grain size of surface morphologies changed through the deposition times. With increase in deposition time, the roughness and films thickness were increased from 5.0 nm to 21.0 nm and 551.0 nm to 1.4 μm, respectively.

Structure and Microstructure of Binary Nitride TiN Thin Films Deposited by DC Reactive Sputtering

2014 ◽  
Vol 931-932 ◽  
pp. 147-151
Author(s):  
Adisorn Buranawong ◽  
Nirun Witit-Anun ◽  
Surasing Chaiyakun
Keyword(s):  
Thin Films ◽  
Columnar Structure ◽  
X Ray Diffraction ◽  
Atomic Force ◽  
Sputtering Power ◽  
Tin Thin Films ◽  
Surface Morphologies ◽  
Steel Substrates ◽  
Structure And Microstructure ◽  
Section Analysis

Titanium nitride (TiN) thin films were deposited on to unheated silicon (100) and stainless steel substrates by home-made direct current (DC) reactive magnetron sputtering method at a deposition of 60 min in an Ar-N2 gas mixture. The effects of sputtering power on structure and microstructure of these films have been studied. The films were analyzed by X-ray diffraction (XRD), Atomic Force Microscope (AFM) and Field-Emission Scanning Electron Microscope (FE-SEM). The films colors were influenced by sputtering parameter which altered from green purple to light gold and dark gold, respectively. By XRD, the polycrystalline structure of the as-deposited films was face center cubic (fcc) of TiN structure with (111), (200), (220), and (311), planes. The increasing of sputtering power transformed film from amorphous phase to crystal phase with crystal size were enhanced from 21.9 nm to 39.8 nm. The AFM scans revealed that sputtering power significantly affected surface morphologies and thicknesses of the TiN films. With increase in sputtering power, the roughness and films thickness were increased from 0.5 nm to 25.1 nm and 331 nm to 1113 μm, respectively. The microstructure combined with cross-section analysis FE-SEM revealed that the grain refinement with columnar structure were obtained for the film deposited at sputtering power of 270 W.

Influence of Magnetron Sputtering Parameters on Surface Properties of TiN-Coated Bearing Steel

2013 ◽  
Vol 785-786 ◽  
pp. 970-973
Author(s):  
Nu Yan ◽  
Xiao Chen Xiong
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Surface Properties ◽  
Deposition Time ◽  
Suitable Condition ◽  
Surface Friction ◽  
Bearing Steel ◽  
Bearing Steels ◽  
Sputtering Power ◽  
Tin Thin Films

In order to investigate the influence of magnetron sputtering parameters on surface properties, hardness and friction tests were carried out for TiN-coated bearing steel sputtered under different deposition times varied from 5 to 30 minutes. Hardness of coated specimens was increased by magnetron sputtered and markedly affected by deposition time. Coated TiN thin films on the surface can also effectively improve the friction properties of the bearing steels. The deposition times from 5 to 10 minutes is the most suitable condition to improve the surface friction properties and hardness for bearing steel under the sputtering power with 200W.

Effects of Continuous and Discontinuous Deposition Time in Reactive Direct Current Magnetron Sputtering of Titanium Dioxide Thin Films

2015 ◽  
Vol 1131 ◽  
pp. 251-254
Author(s):  
Montri Aiempanakit ◽  
Chantana Salawan ◽  
Kamon Aiempanakit
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Deposition Time ◽  
Spherical Shape ◽  
Contact Angles ◽  
Water Contact ◽  
Direct Current Magnetron Sputtering

The effect of continuous and discontinuous deposition time on the properties of TiO2 thin films deposited by reactive direct current magnetron sputtering (DCMS) on glass substrates was investigated. The deposition processes were designed for a condition of continuous deposition time D1 (60 min) and three conditions of discontinuous deposition time D2 (30 min × 2 times), D3 (15 min × 4 times), and D4 (1 min × 60 times). The crystal structure, surface morphology, and hydrophilicity of TiO2 thin films were characterized by X-ray diffraction, atomic force microscope, and water contact angle method, respectively. It was found that the increasing of discontinuous deposition time (conditions from D1 to D4) shows the changing of grain size from big grain size with spherical shape to small grain size with oval shape. The crystallinity of TiO2 films decrease with increasing the discontinuous deposition time. The water contact angles also decrease as a function of increasing discontinuous deposition time. These results may be explained from the accumulation of heat on the substrate which affected the phase composition and surface morphology of TiO2 thin films.

scholarly journals Optical Properties and Microstructure of TiNxOy and TiN Thin Films before and after Annealing at Different Conditions

Coatings ◽  
2019 ◽  
Vol 9 (1) ◽  
pp. 22 ◽  
Author(s):  
Hanan A. Abd El-Fattah ◽  
Iman S. El-Mahallawi ◽  
Mostafa H. Shazly ◽  
Waleed A. Khalifa
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Pure Titanium ◽  
Rf Magnetron Sputtering ◽  
Visible Range ◽  
Optical Absorbance ◽  
Atomic Force ◽  
Before And After ◽  
Tin Thin Films ◽  
Steel Substrates

TiN and TiNxOy thin films share many properties such as electrical and optical properties. In this work, a comparison is conducted between TiN (with and without annealing at 400 °C in air and vacuum) and TiNxOy thin films deposited by using RF magnetron sputtering with the same pure titanium target, Argon (Ar) flow rate, nitrogen flow rates, and deposition time on stainless steel substrates. In the case of TiNxOy thin film, oxygen was pumped in addition. The optical properties of the thin films were characterized by spectrophotometer, and Fourier transform infrared spectroscopy (FTIR). The morphology, topography, and structure were studied by scanning electron microscope (SEM), atomic force microscope (AFM), and X-ray diffraction (XRD). The results show that both thin films have metal-like behavior with some similarities in phases, structure, and microstructure and differences in optical absorbance. It is shown that the absorbance of TiN (after vacuum-annealing) and TiNxOy have close absorbance percentages at the visible range of light with an unstable profile, while after air-annealing the optical absorbance of TiN exceeds that of TiNxOy. This work introduces annealed TiN thin films as a candidate solar selective absorber at high-temperature applications alternatively to TiNxOy.

Crystal structure and surface morphology of magnetron sputtering deposited hexagonal and perovskite-like YbMnO3 thin films

2014 ◽  
Vol 586 ◽  
pp. S343-S347 ◽  
Author(s):  
N.V. Andreev ◽  
T.A. Sviridova ◽  
V.I. Chichkov ◽  
A.P. Volodin ◽  
C. Van Haesendonck ◽  
...  
Keyword(s):  
Crystal Structure ◽  
Thin Films ◽  
Surface Morphology ◽  
Magnetron Sputtering

Preparation and Character Measurements of AlN Films for RF Magnetron Sputtering

2013 ◽  
Vol 663 ◽  
pp. 409-412
Author(s):  
Tai Long Gui ◽  
Si Da Jiang ◽  
Chun Cheng Ban ◽  
Jia Qing Liu
Keyword(s):  
Crystal Structure ◽  
Thin Films ◽  
Refractive Index ◽  
Magnetron Sputtering ◽  
Total Pressure ◽  
Rf Magnetron Sputtering ◽  
Elliptical Polarization ◽  
Dielectric Thin Films ◽  
Temperature Changes ◽  
Sputtering Power

AlN dielectric thin films were deposited on N type Si(100) substrate by reactive radio frequency magnetron sputtering that directly bombardment AlN target under different sputtering-power and total pressure. The crystal structure,composition,surface and refractive index of the thin films were studied by XRD, SEM, AFM and elliptical polarization instrument. The results show that the surface and refractive of the thin films strongly depends on the sputtering-power and total pressure,the good uniformity and smoothness is found at 230 W, Ar flow ratio 5.0 LAr/sccm, substrate temperature 100°Cand 1.2 Pa. The crystal structure of the as-deposited thin-films is amorphous，then it transforms from blende structure to wurtzite structure as the rapid thermal annealing(RTA) temperature changes from 600 to 1200°C. The refractive index also increases with the RTA temperature it is increasing significantly from 800 to 1000°C．

Residual Stress Evolution by the ex-situ Annealing of TiN Thin Films Deposited on Steel Substrates

1998 ◽  
Vol 287-288 ◽  
pp. 275-282 ◽  
Author(s):  
M. Ye ◽  
G. Berton ◽  
J-.L. Delplancke ◽  
M.-P. Delplancke ◽  
Luc Segers ◽  
...  
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Ex Situ ◽  
Stress Evolution ◽  
Tin Thin Films ◽  
Steel Substrates
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