scholarly journals Co/Cu/Co Pseudo Spin-Valve System Prepared by Magnetron Sputtering with Different Argon Pressure

2015 ◽  
Vol 644 ◽  
pp. 211-214 ◽  
Author(s):  
A.V. Svalov ◽  
A.N. Sorokin ◽  
P.A. Savin ◽  
Alfredo García-Arribas ◽  
A. Fernández ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Spin Valve ◽  
Spin Rotation ◽  
Argon Pressure ◽  
Dc Magnetron Sputtering ◽  
Soft Layer ◽  
Valve System ◽  
Magnetic Layers ◽  
Moderate Field ◽  
The Difference

Thin Co films were fabricated by DC magnetron sputtering. The effect of argon pressure on the microstructure, surface morphology and magnetic properties of the samples was systematically studied. It was found that with the increase of argon pressure, the sharpness of the crystalline texture of the samples declines, the roughness of film surfaces and the coercivity of the films increase. Based on these results, a Co/Cu/Co pseudo spin-valve system was designed and the corresponding structures were fabricated. The difference in coercivity of magnetic layers was obtained by deposition of the Co layers at different Ar pressures. Change of the resistance of this trilayer is induced at a moderate field by the spin rotation in the soft layer with lower coercivity.

scholarly journals Tuning The Crystallographic Structure And Morphology Of Nanocrystalline CaB6 Films Deposited By DC Magnetron Sputtering

2015 ◽  
Vol 60 (2) ◽  
pp. 897-901 ◽  
Author(s):  
L. Zhang ◽  
G. Zhao ◽  
H. Liu ◽  
G. Min ◽  
H. Yu
Keyword(s):  
Grain Size ◽  
Magnetron Sputtering ◽  
Energy Dispersive Spectrometer ◽  
Argon Pressure ◽  
Raman Shift ◽  
Crystallographic Structure ◽  
Dc Magnetron Sputtering ◽  
Glass Substrates ◽  
Average Grain Size ◽  
Crystallite Sizes

Abstract Through changing the argon pressure, CaB6 films with different crystallographic orientation and morphology on glass substrates were prepared by direct current (DC) magnetron sputtering method. The film textures, crystallite sizes, composition and morphology were investigated by a spectrum of characterizing techniques in terms of X-ray diffraction (XRD), field emission scanning electron microscopy with energy dispersive spectrometer (FESEM-EDS), atomic force microscopy (AFM), Raman shift spectroscopy. The influence of argon pressure on microstructure was studied. The average grain size increased with the argon pressure increasing from 0.8 Pa to 1.5 Pa. Meanwhile, the dominant crystal face changed from (110) to (100). Then the grain size decreased when the argon pressure increased to 2.0 Pa. The surface morphology evolved from typical cauliflower-like nanocrystalline clusters to faceted rectangular pyramids. It was found that considerable amount of argon atoms were trapped in the films. The formation process of CaB6 films was also analyzed in this paper.

scholarly journals Flexible Spin Valves: Interlayer Interaction and Deformation Sensitivity

2021 ◽  
Vol 122 (11) ◽  
pp. 1066-1074
Author(s):  
L. I. Naumova ◽  
T. A. Chernyshova ◽  
R. S. Zavornitsyn ◽  
M. A. Milyaev ◽  
I. K. Maksimova ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Magnetization Reversal ◽  
Spin Valve ◽  
Spin Valves ◽  
Interlayer Interaction ◽  
Bending Deformation ◽  
Ferromagnetic Alloys ◽  
Magnetic Layers

Abstract Exchange-coupled spin valves based on ferromagnetic alloys CoFeNi and antiferromagnetic alloy FeMn are obtained on flexible polyimide substrates by magnetron sputtering. The magnetoresistive properties of films and microstrips of spin valves are measured at various degrees of bending deformation of the sample. The behavior of the dependence of the deformation sensitivity of the spin valve on the interaction between the magnetic layers and on the arrangement of the anisotropy axes with respect to the deformation vector is characterized. It is found that the deformation sensitivity decreases with an increase in the interval between the fields of magnetization reversal of the free and fixed layers in the spin valve.

scholarly journals Micromagnetics Simulation of Asymmetric Pseudo-Spin Valve Dots

2002 ◽  
Vol 731 ◽  
Author(s):  
N. Dao ◽  
C. A. Ross ◽  
F. J. Castaño ◽  
M. J. Donahue ◽  
S. L. Whittenburg
Keyword(s):  
Magnetization Reversal ◽  
Reasonable Agreement ◽  
Domain Walls ◽  
Spin Valve ◽  
Experimental Results ◽  
Soft Layer ◽  
Aspect Ratios ◽  
Magnetic Layers ◽  
Simulation Results ◽  
Present Simulation

AbstractWe present simulation results for Ni79Fe21 (5 nm)/Cu (3 nm)/Co (4nm) pseudo-spin valves. These simulations have been conducted on several different aspect ratios of rectangular dots. Distinct switches of the two magnetic layers were observed. At smaller aspect ratios, magnetization reversal proceeds through a leaf state in the soft layer and a flower state in the hard layer. For larger aspect ratios, reversal proceeds by nucleation and annihilation of domain walls. Our simulations show a reasonable agreement with the experimental results. Differences between the experimental and simulation results are discussed.

Effect of Sputtering Pressure on Al-doped ZnO Films by DC Magnetron Sputtering

2013 ◽  
Vol 27 (10) ◽  
pp. 1112-1116 ◽  
Author(s):  
Ke-Wei SUN ◽  
Wan-Cheng ZHOU ◽  
Shan-Shan HUANG ◽  
Xiu-Feng TANG
Keyword(s):  
Magnetron Sputtering ◽  
Zno Films ◽  
Dc Magnetron Sputtering ◽  
Doped Zno ◽  
Sputtering Pressure

Structure and Optical Properties CdS and CdTe Films on Flexible Substrate Obtained by DC Magnetron Sputtering for Solar Cells

2017 ◽  
Vol 9 (5) ◽  
pp. 05035-1-05035-6 ◽  
Author(s):  
G. I. Kopach ◽  
◽  
R. P. Mygushchenko ◽  
G. S. Khrypunov ◽  
A. I. Dobrozhan ◽  
...  
Keyword(s):  
Optical Properties ◽  
Solar Cells ◽  
Magnetron Sputtering ◽  
Flexible Substrate ◽  
Dc Magnetron Sputtering ◽  
Cdte Films

Preparing transparent cobalt-doped ZnO thin films by DC magnetron sputtering

2017 ◽  
Vol 4 (5) ◽  
pp. 6311-6316 ◽  
Author(s):  
Pongladda Panyajirawut ◽  
Nattha Pratumsuwan ◽  
Kornkamon Meesombad ◽  
Kridsana Thanawattana ◽  
Artit Chingsungnoen ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Zno Thin Films ◽  
Dc Magnetron Sputtering ◽  
Doped Zno

scholarly journals Black TiOx Films with Photothermal-Assisted Photocatalytic Activity Prepared by Reactive Sputtering

Materials ◽  
2021 ◽  
Vol 14 (10) ◽  
pp. 2508
Author(s):  
Quan Mao ◽  
Meng Liu ◽  
Yajie Li ◽  
Yuquan Wei ◽  
Yong Yang ◽  
...  
Keyword(s):  
Photocatalytic Activity ◽  
Magnetron Sputtering ◽  
High Light ◽  
Chemical Compositions ◽  
Practical Application ◽  
Dc Magnetron Sputtering ◽  
Optical Absorbance ◽  
Low Efficiency ◽  
Tio2 Phase ◽  
Photocatalytic Tio2

Titanium oxide is widely applied as a photocatalyst. However, its low efficiency and narrow light absorption range are two main disadvantages that severely impede its practical application. In this work, black TiOx films with different chemical compositions were fabricated by tuning target voltage and controlling O2 flow during reactive DC magnetron sputtering. The optimized TiOx films with mixed phases (TiO, Ti2O3, Ti3O5, and TiO2) exhibited fantastic photothermal and photocatalytic activity by combining high light-absorptive Ti2O3 and Ti3O5 phases with the photocatalytic TiO2 phase. The sample prepared with oxygen flow at 5.6 ± 0.2 sccm and target voltage near 400 V exhibited excellent optical absorbance of 89.29% under visible light, which could improve surface temperature to 114 °C under sunlight. This film could degrade Rhodamine-B up to 74% after 150 min of UV irradiation. In a word, this work provides a guideline for fabricating black TiOx films with photothermal-assisted photocatalytic activity by reactive DC magnetron sputtering, which could avoid the usage of hydrogen and is convenient for quantity preparation.

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