Study Morphology Transitions in Self-Assembled Triblock Copolymer Thin Films with Nanostructures by AFM

2006 ◽  
Vol 532-533 ◽  
pp. 165-168
Author(s):  
Yong Zhi Cao ◽  
Shen Dong ◽  
Ying Chun Liang ◽  
Tao Sun
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Triblock Copolymer ◽  
Low Cost ◽  
Orientational Order ◽  
Solvent Annealing ◽  
Force Microscopy ◽  
Atomic Force ◽  
Ordered Nanostructures ◽  
Self Assembled

As a “bottom-up” approach to nanostructures for nanofabrication, self-assembled block copolymer thin films have received much attention not only thanks to the scale of the microdomains but also due to the convenient shape tunability. In order to realize applications of self-assembled block copolymer thin films in nanotechnologies, control over microdomain spatial and orientational order is paramount. In this paper, using atomic force microscopy (AFM), we studied systemically nanostructure transitions induced by post-solvent annealing in self-assembled block copolymer thin films. Furthermore, a variety of thin films with well-ordered nanostructures, which can be employed as templates for nanotechnologies, have been realized simply and at low cost.

scholarly journals Synthesis and design of laboratory device from proton conducting block copolymer membrane

BIBECHANA ◽  
2012 ◽  
Vol 9 ◽  
pp. 50-58
Author(s):  
Shankar P Khatiwada ◽  
Amar P Yadav ◽  
Werner Lebek ◽  
Jean Marc Saiter ◽  
Rameshwar Adhikari
Keyword(s):  
Electron Microscopy ◽  
Atomic Force Microscopy ◽  
Fourier Transform ◽  
Block Copolymer ◽  
Triblock Copolymer ◽  
Proton Conductance ◽  
Proton Conducting ◽  
Force Microscopy ◽  
Atomic Force ◽  
Laboratory Device

The butadiene units of polystyrene-block-polybutadiene-block-polystyrene (SBS) triblock copolymer were subjected to epoxidation and subsequent sulphonation in order to prepare proton conducting ionomer membrane. The products were characterized by different techniques such as atomic force microscopy, Fourier transform infrared (FTIR) spectroscopy and electron microscopy. A simple laboratory device was developed to carry out the tests on proton conductance ability of the prepared ionomer membrane. The experiments demonstrated that the prepared membrane excellently performed as proton conducting membrane. DOI: http://dx.doi.org/10.3126/bibechana.v9i0.7174 BIBECHANA 9 (2013) 50-58

THICKNESS DEPENDENCE OF THIRD-HARMONIC GENERATION FROM SELF-ASSEMBLED REGIOREGULAR POLY(3-HEXYLTHIOPHENE) THIN FILMS ON QUARTZ GLASSES WITH DIFFERENT SURFACES

2008 ◽  
Vol 17 (04) ◽  
pp. 451-463 ◽  
Author(s):  
XIN WANG ◽  
JIASHENG RU ◽  
SHIZUYASU OCHIAI ◽  
YUU YAMADA ◽  
YOSHIYUKI UCHIDA ◽  
...  
Keyword(s):  
Thin Films ◽  
Visible Absorption ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force ◽  
Cast Films ◽  
Regioregular Poly ◽  
Out Of Plane ◽  
Self Assembled ◽  
Quartz Glasses

Regioregular poly(3-hexylthiophene) [RR-P3HT] thin films were prepared on fused quartz glasses by spin-coating and drop-casting from the chloroform solutions. Film structures and morphologies were characterized by UV-visible absorption spectra, out-of-plane X-ray diffraction (XRD) and atomic force microscopy (AFM). Drop-cast films showed increased χ(3) of about three times higher than that of the spin-coated ones when the film thicknesses were both around 140 nm, and the magnitude of the increase was different for different thickness. The magnitudes of χ(3) for drop-cast RR-P3HT films were calculated in the range of 10-11 esu, and the phases of χ(3) lay in the range from 230 to 300° which were consistent with the contributions from two-photon absorptions (TPA). Hexamethyldisilazane (HMDS) treatment of the glass substrates could increase the χ(3) of drop-cast films further from about ten percent to several times higher. This also depended on the film thickness. These results revealed the deposition method and surface modification effects on the self-assembled RR-P3HT film structures, and the importance of higher-ordering and increased crystallinity for the enhancement of the χ(3) of the polymeric films for their applications in NLO devices.

scholarly journals Grain-Boundary-Induced Alignment of Block Copolymer Thin Films

Nanomaterials ◽  
2020 ◽  
Vol 10 (1) ◽  
pp. 103 ◽  
Author(s):  
Steven Gottlieb ◽  
Marta Fernández-Regúlez ◽  
Matteo Lorenzoni ◽  
Laura Evangelio ◽  
Francesc Perez-Murano
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Grain Boundary ◽  
Grain Boundaries ◽  
Direct Writing ◽  
Force Microscopy ◽  
Mechanical Removal ◽  
Atomic Force ◽  
Vertically Aligned ◽  
Critical Process

We present and discuss the capability of grain boundaries to induce order in block copolymer thin films between horizontally and vertically assembled block copolymer grains. The system we use as a proof of principle is a thermally annealed 23.4 nm full-pitch lamellar Polystyrene-block-polymethylmetacrylate (PS-b-PMMA) di-block copolymer. In this paper, grain-boundary-induced alignment is achieved by the mechanical removal of the neutral brush layer via atomic force microscopy (AFM). The concept is also confirmed by a mask-less e-beam direct writing process. An elongated grain of vertically aligned lamellae is trapped between two grains of horizontally aligned lamellae. This configuration leads to the formation of 90° twist grain boundaries. The features maintain their orientation on a characteristic length scale, which is described by the material’s correlation length ξ. As a result of an energy minimization process, the block copolymer domains in the vertically aligned grain orient perpendicularly to the grain boundary. The energy-minimizing feature is the grain boundary itself. The width of the manipulated area (e.g., the horizontally aligned grain) does not represent a critical process parameter.

Atomic force microscopic studies of oxide thin films on organic self-assembled monolayers

1999 ◽  
Vol 14 (6) ◽  
pp. 2464-2475 ◽  
Author(s):  
T. P. Niesen ◽  
M. R. De Guire ◽  
J. Bill ◽  
F. Aldinger ◽  
M. Rühle ◽  
...  
Keyword(s):  
Thin Films ◽  
Film Growth ◽  
Self Assembled Monolayers ◽  
Oxide Thin Films ◽  
Force Microscopy ◽  
Atomic Force ◽  
Assembled Monolayers ◽  
Microscopic Studies ◽  
Self Assembled ◽  
Attachment Mechanism

The surface morphology of TiO2- and ZrO2-based thin films, deposited from aqueous solution at 70–80 °C onto functionalized organic self-assembled monolayers (SAMs) on silicon has been examined using atomic force microscopy (AFM). The films have been previously shown to consist, respectively, of nanocrystalline TiO2 (anatase) and of nanocrystalline tetragonal ZrO2 with amorphous basic zirconium sulfate. The films exhibit characteristic surface roughnesses on two length scales. Roughness on the nanometer scale appears to be dictated by the size of the crystallites in the film. Roughness on the micron scale is postulated to be related to several factors, including the topography of the SAM and the effects of larger, physisorbed particles or agglomerates. The topographies of the oxide thin films, on both the nanometer and micron scales, are consistent with a particle-attachment mechanism of film growth.

The preparation and tribological characteristics of a phosphorylated 3-aminopropyltriethoxysilane self-assembled nanometre film

2009 ◽  
Vol 223 (7) ◽  
pp. 1727-1732
Author(s):  
J Li ◽  
X H Sheng
Keyword(s):  
Thin Films ◽  
Silicon Substrate ◽  
The Other ◽  
Chemical Compositions ◽  
Self Assembled Monolayer ◽  
X Ray ◽  
Force Microscopy ◽  
Self Assembling ◽  
Atomic Force ◽  
Self Assembled

Thin films deposited on a phosphonate 3-aminopropyltriethoxysilane (APTES) self- assembled monolayer (SAM) were prepared on a hydroxylated silicon substrate by self-assembling. The chemical compositions and the chemical state of the film elements were determined by X-ray photoelectron spectrometry. The thickness of the films was determined with an ellipsometer, while the morphologies and nanotribological properties of the samples were analysed by atomic force microscopy. As a result, the target film was obtained. It was also found that the thin films showed the lowest friction and adhesion, followed by APTES—SAM and phosphorylated APTES—SAM, while the silicon substrate showed the highest friction and adhesion. Microscale scratch/wear studies clearly showed that thin films were much more scratch/wear resistant than the other samples.

CHARACTERIZATION OF CHEMICALLY DEPOSITED CADMIUM SULFIDE THIN FILMS

2010 ◽  
Vol 24 (30) ◽  
pp. 5901-5911 ◽  
Author(s):  
R. I. CHOWDHURY ◽  
M. A. HOSSEN ◽  
G. MUSTAFA ◽  
S. HUSSAIN ◽  
S. N. RAHMAN ◽  
...  
Keyword(s):  
Thin Films ◽  
Cadmium Sulfide ◽  
Growth Parameters ◽  
Low Cost ◽  
Diffraction Measurement ◽  
Optical Absorbance ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force ◽  
Cds Thin Films

Cadmium sulfide (CdS) thin films have been deposited on glass/conducting glass substrates using low-cost chemical bath deposition method. The deposited films have been characterized using various techniques in order to optimize growth parameters. It has been confirmed by X-ray diffraction measurement that the deposited layers are mainly consisting of CdS phase. The PEC measurements indicate that the deposited CdS layer is n-type in electrical conduction, and optical absorbance measurements show that the band gap is 2.42 eV for as-deposited film and 2.27 eV upon heat treatment for one hour in air ambient. Both atomic force microscopy and scanning electron microscopy measurements indicate the formation of pinhole free and smooth surface of CdS films of nanosized grains. The electrical resistivity is also observed in the order of 1044 Ω cm and decreases as temperature increases.

scholarly journals Dispersion of Few-Layer Black Phosphorus in Binary Polymer Blend and Block Copolymer Matrices

Nanomaterials ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 1996
Author(s):  
Serena Coiai ◽  
Elisa Passaglia ◽  
Simone Pinna ◽  
Stefano Legnaioli ◽  
Silvia Borsacchi ◽  
...  
Keyword(s):  
Thin Films ◽  
Raman Spectroscopy ◽  
Block Copolymer ◽  
Raft Polymerization ◽  
Black Phosphorus ◽  
Force Microscopy ◽  
Atomic Force ◽  
Binary Polymer ◽  
Reversible Addition ◽  
Copolymer Matrices

Exfoliated black phosphorus (bP) embedded into a polymer is preserved from oxidation, is stable to air, light, and humidity, and can be further processed into devices without degrading its properties. Most of the examples of exfoliated bP/polymer composites involve a single polymer matrix. Herein, we report the preparation of biphasic polystyrene/poly(methyl methacrylate) (50/50 wt.%) composites containing few-layer black phosphorus (fl-bP) (0.6–1 wt.%) produced by sonicated-assisted liquid-phase exfoliation. Micro-Raman spectroscopy confirmed the integrity of fl-bP, while scanning electron microscopy evidenced the influence of fl-bP into the coalescence of polymeric phases. Furthermore, the topography of thin films analyzed by atomic force microscopy confirmed the effect of fl-bP into the PS dewetting, and the selective PS etching of thin films revealed the presence of fl-bP flakes. Finally, a block copolymer/fl-bP composite (1.2 wt.%) was prepared via in situ reversible addition–fragmentation chain transfer (RAFT) polymerization by sonication-assisted exfoliation of bP into styrene. For this sample, 31P solid-state NMR and Raman spectroscopy confirmed an excellent preservation of bP structure.

A low-temperature and low-cost method to produce high-quality epitaxial anatase TiO2 thin films

2005 ◽  
Vol 20 (2) ◽  
pp. 292-294 ◽  
Author(s):  
Zhaoming Zhang
Keyword(s):  
Thin Films ◽  
Low Cost ◽  
X Ray Diffraction ◽  
Tio2 Thin Films ◽  
Epitaxial Relationship ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Average Size ◽  
Lattice Matched

Epitaxial anatase TiO2 thin films were successfully grown on lattice-matched SrTiO3 (001) substrates by a novel hydrothermal method at very low temperatures (120–200 °C). This method is extremely simple and inexpensive in that the SrTiO3 substrate itself provides the source material for the TiO2 film. X-ray diffraction confirmed the high crystallinity and phase purity of the anatase films. The epitaxial relationship between the film and the substrate was determined as (001)[100]anatase // (001)[100]SrTiO3. Atomic force microscopy revealed the average size of the anatase crystallites as approximately 50 to 200 nm.

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