The Effects of SiO, SiON on IZO Thin Film Deposited by DCMG Method

2007 ◽  
Vol 124-126 ◽  
pp. 455-458
Author(s):  
Seong Hoon Kim ◽  
Han Ki Yoon ◽  
Riichi Murakami
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Oxygen Content ◽  
Glass Substrate ◽  
Single Layer ◽  
Target Type ◽  
Dc Magnetron Sputtering ◽  
Izo Thin Film ◽  
Pet Substrate

The thin films of SiO and SiON were deposited individually by the inclination opposite target type DC magnetron sputtering equipment onto the glass substrate. And it was deposited IZO(In2O3 (90wt.%) + ZnO(10wt.%)) on those films. The effects of SiO and SiON were investigated on properties of IZO thin films. AFM images of IZO thin film included SiON film were shown smoother surfaces than that included SiO film. Multi layers of IZO were shown good properties because it have high transmissivity. Resistivity is in inverse proportion to Mobility. If it deposited SiO and SiON, generate layer of change between two layers(SiO or SiON + Substrate). Layer of change influenced resistance because Oxygen content was more than single layer of IZO. In case of using PET substrate, it influenced stronger than Glass substrate for rigid gas permeable and osmosis.

Structural, Morphological and Adhesion Properties of Cofeb Thin Films Deposited by DC Magnetron Sputtering

2013 ◽  
Vol 802 ◽  
pp. 47-52
Author(s):  
Chuleerat Ibuki ◽  
Rachasak Sakdanuphab
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Grain Size ◽  
Magnetron Sputtering ◽  
Crystalline Structure ◽  
Glass Substrate ◽  
Intrinsic Stress ◽  
Dc Magnetron Sputtering ◽  
Adhesion Properties ◽  
Sputtering Power

In this work the effects of amorphous (glass) and crystalline (Si) substrates on the structural, morphological and adhesion properties of CoFeB thin film deposited by DC Magnetron sputtering were investigated. It was found that the structure of a substrate affects to crystal formation, surface morphology and adhesion of CoFeB thin films. The X-Ray diffraction patterns reveal that as-deposited CoFeB thin film at low sputtering power was amorphous and would become crystal when the power increased. The increase in crystalline structure of CoFeB thin film is attributed to the crystalline substrate and the increase of kinetic energy of sputtering atoms. Atomic Force Microscopy images of CoFeB thin film clearly show that the roughness, grain size, and uniformity correlate to the sputtering power and the structure of substrate. The CoFeB thin film on glass substrate shows a smooth surface and a small grain size whereas the CoFeB thin film on Si substrate shows a rough surface and a slightly increases of grain size. Sticky Tape Test on CoFeB thin film deposited on glass substrate indicates the adhesion failure with a high sputtering power. The results suggest that the crystalline structure of substrate affects to the atomic bonding and the sputtering power affects to intrinsic stress of CoFeB thin film.

INFLUENCE OF THE SiO AND SiON BUFFER LAYER ON IZO THIN FILMS DEPOSITED ON PET BY INCLINATION OPPOSITE TARGET TYPE DC MAGNETRON SPUTTERING METHOD

2006 ◽  
Vol 20 (25n27) ◽  
pp. 3640-3645 ◽  
Author(s):  
ZHIYONG QIU ◽  
DO-HOON SHIN ◽  
KENJI NAKADA ◽  
RI-ICHI MURAKAMI ◽  
HAN-KI YOON
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Visible Region ◽  
Film Surface ◽  
Optical Transmittance ◽  
Target Type ◽  
Buffer Layers ◽  
Dc Magnetron Sputtering ◽  
Average Roughness ◽  
Pet Substrate

IZO films were deposited onto polyethylene terephthalate (PET) substrate at room temperature by the inclination opposite target type DC magnetron sputtering equipment. In this paper, SiO or SiON thin films of about 20nm thickness were introduced as buffer layers between the IZO thin films and the PET substrate. Electrical resistivity, transmittance and surface uniformity properties were investigated. It is clear that the film surface roughness of multilayer thin films was less than that of IZO monolayer thin films. The surface average roughness ( Ra ) of the multilayer film with 230nm IZO layer thickness was about 1.6nm, and that of IZO monolayer film was 2.4nm. All of the multilayer samples had high optical transmittance (about 90%) in the visible region. Of particular note, the transmittance of multilayer films was slightly higher than that of monolayer films when the IZO layer was thicker than 200nm. High electrical conductivity was also achieved with thick films.

FORMATION OF TRIANGULAR Cu MICROCRYSTALS IN Ti/Cu/Si THIN FILMS DURING ANNEALING

2018 ◽  
Vol 25 (05) ◽  
pp. 1850097
Author(s):  
QIJING LIN ◽  
WEIXUAN JING ◽  
ZHUANGDE JIANG ◽  
NA ZHAO ◽  
ZIRONG WU ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Rapid Thermal Annealing ◽  
Dc Magnetron Sputtering ◽  
Triangular Pyramid ◽  
Single Side ◽  
Surface Patterns ◽  
Cu Thin Film ◽  
Sputtering System

Sandwich stacked Ti/Cu/Si thin films were deposited on a single-side polished Si(111) substrate using DC magnetron sputtering system and annealed using a rapid thermal annealing (RTA) system. Complex dendritic patterns, whose branches are composed of Cu rods and triangular Cu microcrystals were obtained on Ti/Cu thin film annealed at 700[Formula: see text]C. The shape of one triangular Cu microcrystal is a truncated equilateral triangular pyramid with a flat top. Triangular Cu microcrystals grow in the number when Ti/Cu thin films are annealed at 800[Formula: see text]C. Experimental results show that anisotropy affects the growth of surface patterns and the top Ti capping layer works as a protection for the underlying Cu layer from oxidation.

Raman scattering from sputtered films of YBa2Cu3Oy

1988 ◽  
Vol 66 (8) ◽  
pp. 695-699 ◽  
Author(s):  
J. Chrzanowski ◽  
J. C. Irwin ◽  
R. R. Parsons ◽  
P. J. Mulhern
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
Magnetron Sputtering ◽  
Raman Scattering ◽  
Oxygen Content ◽  
High Temperature Superconductor ◽  
Superconducting Films ◽  
Vibrational Modes ◽  
Dc Magnetron Sputtering ◽  
Sputtered Films

Thin films of the high-temperature superconductor YBa2Cu3Oy have been deposited on Al2O3 and MgO substrates by dc magnetron sputtering. Raman-scattering experiments have been carried out on these films at various temperatures. The results of these experiments have been used to estimate the amount of impurity phases in the films, to characterize the actual superconducting films, and to test for any preferential orientation within the film. Vibrational modes of the superconductor were found at 148, 226, and 338 cm−1 in both sets of films, at 446 and 491 cm−1 in the Al2O3 films, and at 441 and 500 cm−1 in the MgO films. The measured frequencies of the highest energy modes have been used to determine the oxygen content of the films.

Multilayer Coatings for Focusing Hard X-ray Telescopes

1998 ◽  
Vol 551 ◽  
Author(s):  
A. Ivan ◽  
R. Bruni ◽  
K. Byun ◽  
J. Everett ◽  
P. Gorenstein ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Single Layer ◽  
Multilayer Coatings ◽  
Dc Magnetron Sputtering ◽  
Film Properties ◽  
Auger Analysis ◽  
Cross Sectional ◽  
X Ray ◽  
Specular Reflectivity

AbstractSeveral multilayer test coatings for hard X-ray telescopes were fabricated using DC magnetron sputtering. The process parameters were selected from a series of trials of single layer depositions. The samples were characterized using X-ray specular reflectivity scans, AFM, and cross-sectional TEM. Additional measurements (stylus profilometry, RBS, and Auger analysis) were used in the optimization of the deposition rate and of the thin film properties (density, composition, surface/interface microroughness). The X-ray reflectivity scans showed that the combinations of reflector and spacer materials tested so far (W/Si and W/C) are suited for graded d-spacing multilayer coatings that present a constant reflectivity bandpass up to 70 keV.

Effect of Annealing Temperature on Platinum/YSZ Thin Film Fabricated Using RF and DC Magnetron Sputtering

2017 ◽  
Vol 268 ◽  
pp. 229-233
Author(s):  
A.R. Nurhamizah ◽  
Zuhairi Ibrahim ◽  
Rosnita Muhammad ◽  
Yussof Wahab ◽  
Samsudi Sakrani
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Annealing Temperature ◽  
X Ray Diffraction ◽  
Dc Magnetron Sputtering ◽  
X Ray ◽  
Post Annealing ◽  
Two Temperatures ◽  
Platinum Thin Film

This research aims to study the growth and the effect of annealing temperature on the structural properties of Platinum/YSZ/Platinum thin film. The thin films were prepared by RF and DC magnetron sputtering method utilized platinum as electrodes (anode and cathode) and YSZ as electrolyte. Two temperatures of annealing (400 and 600 °C) were conducted onto Platinum/YSZ/Platinum thin film for comparison in this study. Crystalline phase, microstructure and thickness of thin films were evaluated using X-Ray Diffraction (XRD) and Field Emission Scanning Electron Microscope (FE-SEM) technique. Results show that Pt/YSZ/Pt thin film without post-annealing gives a better morphology and crystal phase.

Investigation on Optical Properties of Transparent ITO Thin Films

2011 ◽  
Vol 347-353 ◽  
pp. 3481-3484
Author(s):  
Xue Hua Li ◽  
Dong Sheng Wang ◽  
Jian Zhou Du
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Refractive Index ◽  
Optical Properties ◽  
Glass Substrate ◽  
Film Theory ◽  
Single Layer ◽  
Minimum Value ◽  
Ito Thin Films ◽  
Layer Thin Film

Based on the single-layer thin film theory, we calculated transmittance of ITO thin film. The reflectivity arrive a maximum or a minimum according to whether the refractive index of film is greater or smaller than the refractive index of the glass substrate. we obtain the same maximum of transparence which is above 95% and the minimum value which decrease to 76.5% with the increase of refractive index.

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