Optimized Wet Processes and PECVD for High-Efficiency Solar Cells
2012 ◽
Vol 195
◽
pp. 297-300
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Keyword(s):
The semiconductor industry considers wet cleans to be critical surface preparation steps. The Si/SiO2 interface, for example, is very critical to achieve high gate oxide integrity and avoid leakage or stacking faults. Similarly, the solar industry has seen the value of wet processes to achieve best cell performance. In this study, we highlight the effect of pre-cleans, texturization and final cleans on cell parameters. We also studied the importance of coupling these wet cleaning and texturization steps with the PECVD steps to achieve the film quality required for highest solar cell efficiency.
2017 ◽
Vol 20
(3)
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pp. 194-205
2013 ◽
Vol 750-752
◽
pp. 970-973
Keyword(s):
2015 ◽
Vol 242
◽
pp. 96-101
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Keyword(s):
2017 ◽
Vol 2017
◽
pp. 1-6
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Keyword(s):