Dose Characteristics of Multilayer Chitosan-Metal-Dielectric Nanostructures for Electronic Nanolithography

2015 ◽  
Vol 245 ◽  
pp. 195-199 ◽  
Author(s):  
Sergey Voznesenskiy ◽  
Aleksandr Nepomnyaschiy

This paper presents the results of the study of chitosan-metal nanofilms for the formation of submicron structures on glass substrates by electron lithography. The dependence of their basic lithographic characteristics from the selection of the metal for intermediate layer is obtained.

2015 ◽  
Vol 4 (1) ◽  
pp. 85-90 ◽  
Author(s):  
L. Ebersberger ◽  
G. Fischerauer

Abstract. To date, very little has been written about the influence of the substrate layer on the overall sensor impedance of single- and multilayer planar sensors (e.g., metal-oxide sensors). However, the substrate is an elementary part of the sensor element. Through the selection of a substrate, the sensor performance can be manipulated. The current contribution reports on the substrate influence in multilayer metal-oxide chemical sensors. Measurements of the impedance are used to discuss the sensor performance with quartz substrates, (laboratory) glass substrates and substrates covered by silicon-dioxide insulating layers. Numerical experiments based on previous measurement results show that inexpensive glass substrates contribute up to 97% to the overall sensor responses. With an isolating layer of 200 nm SiO2, the glass substrate contribution is reduced to about 25%.


2009 ◽  
Vol 1165 ◽  
Author(s):  
Alberto Bollero ◽  
Maarja Grossberg ◽  
Taavi Raadik ◽  
Juan Francisco Trigo ◽  
José Herrero ◽  
...  

AbstractCuInS2 has emerged during recent years as a good candidate to substitute CuInSe2 as polycrystalline absorber in thin film solar cells, mainly due to its direct band gap energy of 1.5 eV. In this study, absorber layers of both Cu-rich and Cu-poor types have been grown on soda-lime glass substrates by proper selection of the deposition parameters. The morphology and the optical properties of the resulting CuInS2 films were studied in dependence of the deposition order of the elemental constituents: alternate evaporation of the precursors, simultaneous deposition of the three constituents and sequential modulation of the evaporation fluxes.


2013 ◽  
Vol 12 (1) ◽  
pp. 17-29
Author(s):  
C Gunasekaran ◽  
V Senthilkumar ◽  
P Kokila ◽  
S Uma ◽  
S Banumathi

Adherent and uniform films of ZnS and ZnS:Ni were deposited reproducibly by Dip coating method onto a glass substrate, under acidic conditions from solutions containing Zinc Nitrate, Nickel Nitrate, Ammonium Nitrate, Sodium citrate, thiourea and distilled water. The growth of ZnS thin films on glass substrates have been thoroughly investigated by SEM, EDAX and X- ray diffraction techniques. The grain sizes (D) of crystallites were estimated using the Scherrer’s formula. Depending on selection of precursors and presence of dopant, ZnS and ZnS films can be of Sphalenite or wurtzite structure. The effect of the dopant on the crystallinity and surface morphology of ZnS thin films have been studied. The surface morphology, which has been evaluated by scanning electron microscope (SEM), shows a relatively flat and uniform surface.


2007 ◽  
Vol 1058 ◽  
Author(s):  
Motofumi Suzuki ◽  
Kenji Hamachi ◽  
Koji Nagai ◽  
Ryo Kita ◽  
Kaoru Nakajima ◽  
...  

ABSTRACTWe demonstrate high temperature glancing deposition (HT-GLAD) of metals on the heated substrate. It has been found that Al, Ag, Au, Fe nano-whiskers grow on the substrate of Si, SiO2, and glass substrates. The robustness in the selection of materials suggests that the HT-GLAD is a universal method to grow nano-whiskers of various metals. We also demonstrate the selective growth of the nano-whiskers on the substrate with micro-trench patterns. The metal nano-whiskers are useful for the nano electromechanical devices and vacuum microelectronics.


1997 ◽  
Vol 11 (02n03) ◽  
pp. 87-92 ◽  
Author(s):  
Hou Qingrun ◽  
J. Gao

The influence of silicon intermediate layer on adhesion of carbon films has been investigated by using the micro-scratch method. The carbon films with and without Si intermediate layer were grown on glass substrates by both electron beam evaporation and pulsed laser deposition. To improve the adhesion of carbon, a silicon intermediate layer was deposited by electron beam evaporation with thickness ranged from 6 to 42 nm. Variations in adhesion were found for different coating techniques and deposition conditions, especially the thickness of silicon intermediate layers. The cause of such variations was discussed.


RSC Advances ◽  
2016 ◽  
Vol 6 (68) ◽  
pp. 63314-63324 ◽  
Author(s):  
K. Ravichandran ◽  
K. Subha ◽  
A. Manivasaham ◽  
M. Sridharan ◽  
T. Arun ◽  
...  

A triple layer system (TaZO/Ag/TaZO), consisting of tantalum doped zinc oxide (TaZO) as the top and bottom layers and metallic silver (Ag) as the intermediate layer, was deposited onto glass substrates.


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