Discharge of viscous UV-curable resin droplets by screen printing for UV nanoimprint lithography

2016 ◽  
Vol 55 (6S1) ◽  
pp. 06GM01 ◽  
Author(s):  
Akira Tanabe ◽  
Takuya Uehara ◽  
Kazuro Nagase ◽  
Hiroaki Ikedo ◽  
Nobuya Hiroshiba ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Screen Printing ◽  
Uv Curable ◽  
Uv Curable Resin

Improvement of Transfer Durability of a Pillar-Shaped Release-Agent-Free Replica Mold in Ultraviolet Nanoimprint Lithography

2018 ◽  
Vol 12 (5) ◽  
pp. 723-729
Author(s):  
Junpei Tsuchiya ◽  
Gen Nakagawa ◽  
Shin Hiwasa ◽  
Jun Taniguchi ◽  
◽  
...  
Keyword(s):  
Contact Angle ◽  
Error Rate ◽  
Nanoimprint Lithography ◽  
Low Cost ◽  
Master Mold ◽  
Release Agent ◽  
Uv Curable ◽  
Low Viscosity ◽  
Large Numbers ◽  
Uv Curable Resin

Ultraviolet nanoimprint lithography (UV-NIL) can be used to fabricate nanoscale patterns with high throughput. It is expected to serve as a low-cost technique for the production of items in large numbers. However, master molds for UV-NIL are expensive and laborious to produce, and there are problems associated with the deterioration of the master mold and damage to its nanopattern due to adhesion of the UV-curable resin. Consequently, the UV-curable resin has to combine low-viscosity characteristics for coatability with an antisticking property. Coating a master mold with a release layer is important in preventing damage to the master mold or adhesion between the mold and the UV-curable resin. However, the released layer deteriorates as the master mold is repeatedly used to fabricate nanopatterns. By contrast, the use of a replica mold is a valuable technique for preventing the deterioration of the master mold, and there have been several studies on the fabrication of replicas of master molds with the use of UV-curable resins. In many cases, the fabrication of nanopatterns with replica molds requires the use of a release agent. In a previous study, we developed a material for replica molds that does not require a release agent. This material consisted of a UV-curable resin with an antifouling effect that was prepared from cationically polymerizable UV-curable and epoxy-modified fluorinated resins. With the use of this material, replica molds with patterns of pillars or holes were fabricated with UV-NIL. The lifetime of the mold with the nanopattern of pillars was shorter than that with holes. In addition, the replica mold with the pillar-shaped nanopattern had numerous defects and allowed adhesion of the transfer resin after repeated efforts. Herein, we describe an improved release-agent-free hard replica mold. We transferred large numbers of nanopatterns of pillars from the replica mold, and evaluated the error rate and contact angle of our improved release-agent-free hard replica mold. The resulting release-agent-free replica mold with a nanopattern of pillars was capable of transferring up to 1000 sequential imprints. In addition, to improve the release properties of the transfer resin, we included an additive to the transfer resin that contained a reactive fluorinated material. This material improved the release properties of the transfer resin and mitigated the deterioration of the contact angle and increase in the error rate.

Fabrication of an Antireflective Structure on a Lenticular Lens

2020 ◽  
Author(s):  
Katsuyuki Yatagawa ◽  
Masato Nakamura ◽  
Masaki Ono ◽  
Jun Taniguchi ◽  
Shin Hiwasa
Keyword(s):  
Nanoimprint Lithography ◽  
Ion Beam ◽  
Back Side ◽  
Master Mold ◽  
Uneven Surface ◽  
Uv Curable ◽  
Oxygen Ion ◽  
Lenticular Lens ◽  
Press Method ◽  
Uv Curable Resin

Abstract In our previous study, various lenses with antireflective structures (ARSs) were fabricated by ultraviolet nanoimprint lithography (UV-NIL) and a thin flexible replica mold, which had ARSs. However, in the case of a lens with a large uneven surface such a lenticular lens, it is difficult to transfer an ARS. In this paper, the improvement of the transfer process for a lenticular lens with an ARS is investigated. A master mold of ARSs was fabricated by irradiating glassy carbon with an oxygen ion beam. A flexible replica mold with ARSs was transferred from the ARS master mold by UV-NIL. In this case, the thickness of the flexible replica mold was 210 μm. A lenticular lens with the reverse shape was also transferred from the original lenticular lens by UV-NIL. To add an ARS to the lenticular lens with the reverse shape, it was covered with a flexible replica mold coated with a UV-curable resin. In addition, the lenticular lens was placed on the back side of the flexible replica mold to contact the lens curve properly. Afterwards, the setting samples were pressed with a roll press and simultaneously UV-cured. After this roll press method was carried out, a lenticular lens with the reverse shape and an ARS was obtained. Using this mold, a lenticular lens with an ARS was replicated by UV-NIL and the reverse-shape mold with an ARS.

scholarly journals Transfer Durability of Line-Patterned Replica Mold Made of High-Hardness UV-Curable Resin

Nanomaterials ◽  
2020 ◽  
Vol 10 (10) ◽  
pp. 1956
Author(s):  
Tetsuma Marumo ◽  
Shin Hiwasa ◽  
Jun Taniguchi
Keyword(s):  
Contact Angle ◽  
Nanoimprint Lithography ◽  
High Hardness ◽  
Contact Angle Measurement ◽  
Angle Measurement ◽  
Line Pattern ◽  
Uv Curable ◽  
High Durability ◽  
Uv Curable Resin ◽  
Line Patterns

Ultraviolet nanoimprint lithography (UV-NIL) requires high durability of the mold for the mass production of nanostructures. To evaluate the durability of a line-patterned replica mold made of high-hardness UV curable resin, repetitive transfer and contact angle measurements of the replica mold were carried out. In the line patterns, as the contact angle decreases due to repeated transfer, capillary action occurs, and water flows along them. Therefore, it can be said that a mold with a line pattern exhibits an anisotropic contact angle because these values vary depending on the direction of the contact angle measurement. Subsequently, these anisotropic characteristics were investigated. It was determined that it was possible to predict the lifetime of line-and-space molds over repeated transfers. As the transcription was repeated, the contact angle along the line patterns decreased significantly before becoming constant. Moreover, the contact angle across the line pattern decreased slowly while maintaining a high contact angle with respect to the contact angle along the line pattern. The contact angle then decreased linearly from approximately 90°. The mold was found to be macroscopically defect when the values of the contact angle along the line pattern and the contact angle across the line pattern were close. Predicting the mold’s lifetime could potentially lead to a shortened durability evaluation time and the avoidance of pattern defects.

scholarly journals Fast Fabrication of Nanostructured Films Using Nanocolloid Lithography and UV Soft Mold Roller Embossing: Effects of Processing Parameters

Polymers ◽  
2021 ◽  
Vol 13 (3) ◽  
pp. 405
Author(s):  
Demei Lee ◽  
Ya-Ling Tang ◽  
Shih-Jung Liu
Keyword(s):  
Uv Light ◽  
Processing Parameters ◽  
Polymeric Films ◽  
Step Motor ◽  
Silicon Substrates ◽  
Casting Method ◽  
Uv Curable ◽  
Soft Mold ◽  
Uv Curable Resin ◽  
Spin Coater

We report the fabrication of nanofeatured polymeric films using nanosphere lithography and ultraviolet (UV) soft-mold roller embossing and show an illuminative example of their application to solar cells. To prepare the nanofeatured template, polystyrene nanocolloids of two distinct sizes (900 and 300 nm) were overlaid on silicon substrates using a spin coater. A lab-made soft-mold roller embossing device equipped with a UV light source was adopted. A casting method was employed to replicate the nanofeatured template onto polydimethylsiloxane, which was used as the soft mold. During the embossing procedure, the roller was driven by a step motor and compressed the UV-curable resin against the glass substrate to form the nanofeatured layer, which was subsequently cured by UV radiation. Polymer films with nanoscaled features were thus obtained. The influence of distinct processing variables on the reproducibility of the nanofeatured films was explored. The empirical outcomes demonstrate that UV soft-mold roller embossing offers a simple yet potent way of producing nanofeatured films.

scholarly journals Preparation of alkali-resistant PVDF membranes via immobilization of sodium lauryl sulfate (SDS) on surface

2021 ◽  
Vol 11 (3) ◽  
Author(s):  
Gongpu Wen ◽  
Kun Chen ◽  
Yanhong Zhang ◽  
Yue Zhou ◽  
Jun Pan ◽  
...  
Keyword(s):  
Sodium Lauryl Sulfate ◽  
Alkali Treatment ◽  
Membrane Surface ◽  
Alkali Resistance ◽  
Lauryl Sulfate ◽  
Uv Curable ◽  
Pvdf Membrane ◽  
Glycol Diacrylate ◽  
Polyester Acrylate ◽  
Uv Curable Resin

AbstractA novel strategy was proposed to fabricate alkali-resistant PVDF membrane via sodium lauryl sulfate (SDS) attached to the surface of membrane and immobilized by UV-curable polyester acrylate and tri(propylene glycol) diacrylate (TPGDA). The attached anionic surfactant, SDS, on the membrane surface can resist the alkali corrosion by NaOH, and the curing of the resin can immobilize the SDS on the membrane firmly. Due to the unique alkali resistance of SDS and resin formed, the UV-curable resin-modified PVDF membrane showed greatly enhanced alkali-resistant ability. Characterization of SEM and FTIR showed that polyester acrylate and TPGDA were cured successfully under the action of 1-hydroxycyclohexyl phenyl ketone (184) and ultraviolet light. Whiteness, differential scanning calorimeter and X-ray photoelectron spectrometer characterization showed that the modified PVDF membrane had a lower degree of dehydrofluorination than the pristine PVDF membrane after alkali treatment. Results of the detailed alkali-resistant analysis indicated that the F/C ratio of the UV-curable resin-modified PVDF membrane decreased by 2.6% after alkali treatment compared to pristine PVDF membrane decreased by 19.28%. The alkali-resistant performance was mainly attributed to the immobilized SDS. This study provided a facile and scalable method for designing alkali-resistant PVDF membrane, which shows a promising potential in the treatment of alkaline wastewater and alkaline-cleaning PVDF membrane.

Self-Assembly of Monolayers of Submicron Sized Particles on Thin Liquid Films

2013 ◽  
Author(s):  
Shriram Pillapakkam ◽  
N. A. Musunuri ◽  
P. Singh
Keyword(s):  
Electric Field ◽  
Self Assembly ◽  
Uv Light ◽  
Capillary Forces ◽  
Liquid Films ◽  
Thin Liquid Films ◽  
Liquid Interfaces ◽  
Uv Curable ◽  
Particle Monolayer ◽  
Uv Curable Resin

In this paper, we present a technique for freezing monolayers of micron and sub-micron sized particles onto the surface of a flexible thin film after the self-assembly of a particle monolayer on fluid-liquid interfaces has been improved by the process we have developed where an electric field is applied in the direction normal to the interface. Particles smaller than about 10 microns do not self-assemble under the action of lateral capillary forces alone since capillary forces amongst them are small compared to Brownian forces. We have overcome this problem by applying an electric field in the direction normal to the interface which gives rise to dipoledipole and capillary forces which cause the particles to arrange in a triangular pattern. The technique involves assembling the monolayer on the interface between a UV-curable resin and another liquid by applying an electric field, and then curing the resin by applying UV light. The monolayer becomes embedded on the surface of the solidified resin film.

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