Surface-Morphology-Induced Hydrophobicity of Fluorocarbon Films Grown by a Simultaneous Etching and Deposition Process

2015 ◽  
Vol 44 (8) ◽  
pp. 2908-2914 ◽  
Author(s):  
J.S. Fang ◽  
C.S. Lin ◽  
Y.Y. Huang ◽  
T.S. Chin
Keyword(s):  
Surface Morphology ◽  
Deposition Process ◽  
Fluorocarbon Films

Magnetron Sputtering Deposition of Calcium Phosphate Films with Nanoscale Grain Morphology in their Surface

2006 ◽  
Vol 975 ◽  
Author(s):  
Wilfredo Otaño ◽  
Víctor M. Pantojas ◽  
Juan M. Figueroa ◽  
Darimar Hernández ◽  
Alejandro Rodríguez-Navarro
Keyword(s):  
Calcium Phosphate ◽  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Deposition Time ◽  
Grain Morphology ◽  
Average Diameter ◽  
Deposition Process ◽  
Medical Implants ◽  
Sputtering Deposition ◽  
Coated Implant

ABSTRACTHydroxyapatite (HA) is a calcium phosphate mineral analogous to the mineral part of bone. This similarity makes this material bioactive and suitable to coat medical implants. However, at present, there is not a coating technique which gives the coated implant the desired properties and long life required for medical implants.In an effort to produce HA coatings with improved properties, calcium phosphate films were prepared using magnetron sputtering deposition on a silicon substrate at 600°C. Initial efforts resulted in the deposition of amorphous films with a distinctive grain-like surface morphology. The morphological grain size was studied using SEM and found that it was possible to control the average diameter value of the round shaped grains by adjusting the deposition time. Increasing the deposition time increases the mean grain diameter. EDS spectra showed the unintentional addition of carbon, iron and nickel to the samples during deposition. After eliminating the impurities, it was possible to prepare calcium phosphate films in the HA phase but without the grain-like surface morphology. These results suggested that the impurities prevented the formation of the calcium phosphate HA phase while acting as nuclei for the heterogeneous nucleation of the grains. This is an important result where the deposition process parameters can be controlled to functionalize the films in order to produce distinctive nanoscale features in the surface morphology.

scholarly journals Morphology Evolution Of ZnO Thin Films Deposited By Nitrogen Mediated Crystallization Method

2018 ◽  
Vol 159 ◽  
pp. 02031 ◽  
Author(s):  
Iping Suhariadi ◽  
Masaharu Shiratani ◽  
Naho Itagaki
Keyword(s):  
Thin Films ◽  
Surface Morphology ◽  
Deposition Process ◽  
Zno Thin Films ◽  
Nitrogen Flow ◽  
Force Microscopy ◽  
Crystallization Method ◽  
Power Spectral ◽  
Density Analysis ◽  
Skewness And Kurtosis

We study the surface morphology of ZnO thin films deposited by nitrogen mediated crystallization method utilizing atomic force microscopy as a function of nitrogen flow rates. Initially, the surface morphology of ZnO thin film deposited without nitrogen exhibits a bumpy surface with spiky grains where the skewness and kurtosis values were found to be 0.48 and 4.80, respectively. By addition of small amount of nitrogen, the skewness and kurtosis values of the films significantly decrease associated with a flatter topography. Further increase in nitrogen flow rate to 16 sccm has roughened the surface shown mainly by the increase in kurtosis value to be 3.30. These results indicate that the addition of small amount of nitrogen during deposition process has enhanced the adatoms migration on the surface resulting in a superior film with a larger grain size. Two-dimensional power spectral density analysis reveals that all the films have self-affine fractal geometry with total fractal values in the range of 2.14 to above 3.00.

Effect of Deposited Angle on Structure and Surface Morphology of Fluorocarbon Films Deposited by Pulsed Plasma Thruster

2012 ◽  
Vol 268-270 ◽  
pp. 111-114
Author(s):  
Rui Zhang ◽  
Jian Jun Wu ◽  
Dai Xian Zhang ◽  
Fan Zhang ◽  
Zhen He
Keyword(s):  
Surface Morphology ◽  
Photoelectron Spectroscopy ◽  
Chemical Components ◽  
Pulsed Plasma ◽  
Fluorocarbon Films ◽  
Glass Substrates ◽  
Pulsed Plasma Thruster ◽  
Plasma Thruster ◽  
Probe Microscope ◽  
Deposited Films

A series of fluorocarbon films were deposited on glass substrates by Pulsed Plasma Thruster. The effects of deposited angle on chemical structure and surface morphology of these films were investigated using X-ray photoelectron spectroscopy (XPS) and scanning probe microscope (SPM). XPS data imply various carbon-related chemical components present on the surface of the deposited films are strongly impacted by the deposited angle. AFM measurements show that the increase in deposited angle can smoothen the surface morphology and decrease the RMS roughness. Changes in density of the neutral particle and flux of ions that reach the surface affect the formation of fluorocarbon clusters in the films and reduce surface roughness.

Electrical Properties of Pulsed Laser Deposited ZnO Thin Films

2009 ◽  
Vol 67 ◽  
pp. 121-125
Author(s):  
Chattopadhyay Sourav ◽  
Kumar Nath Tapan
Keyword(s):  
Thin Films ◽  
Surface Morphology ◽  
Substrate Temperature ◽  
Hall Mobility ◽  
Pulsed Laser ◽  
Deposition Process ◽  
Zno Thin Films ◽  
Zno Films ◽  
Visible Absorption ◽  
Substrate Temperatures

Epitaxial Single-crystal ZnO thin films have been grown on c-plane (0001) sapphire by Pulsed Laser Deposition process at different substrate temperatures (300 – 800 °C) with 10-1 mbar oxygen pressure. The thicknesses of the films have been varied by varying number of pulses with a repetition rate of 10 pulse/sec. It is found that the sheet resistivity of ZnO thin films grown on c-plane sapphires are in the order of 10-2 Ω-cm and it increases with increasing substrate temperatures and film thickness. The carrier concentrations and Hall mobility are found to be in the order of 1017 cm-3 and ~195 cm2/V-s, respectively. The Hall mobility slightly decreases with increase of substrate temperature and thickness of the films. It is also found that the ZnO films are structurally uniform and well oriented with perfect wurtzite structure with c/a ratio 5.1. We have also deposited non-epitaxial ZnO films on (100) p-Silicon substrates at the same conditions. From HR FE-SEM micrographs, surface morphology of ZnO films grown at lower substrate temperature are found to be uniform compared to the films grown at higher temperatures showing non-uniformity and misoriented wurtzite structures. However, the surface morphology of ZnO flims grown epitaxially on (0001) sapphire are found to be more uniform and it does not change much with growth temperature. The resistivity of the films grown on p-Silicon at higher temperatures is in the order of 103 Ω-cm whereas films grown at lower substrate temperatures show comparatively lower resistivities (~ 102 Ω-cm). From the recorded UV-Visible absorption spectrum the band gap of the film has been estimated to be 3.38 eV.

Carbon Nanotubes Prepared by Thermal-CVD of from Palm Oil

2013 ◽  
Vol 667 ◽  
pp. 530-533
Author(s):  
L. Helena ◽  
A.A. Azira ◽  
Mohamad Rusop
Keyword(s):  
Carbon Nanotubes ◽  
Surface Morphology ◽  
Palm Oil ◽  
Deposition Temperature ◽  
Deposition Time ◽  
Deposition Process ◽  
Si Substrate ◽  
Thermal Cvd ◽  
Cvd Method ◽  
Spin Coater

Carbon nanotubes (CNTs) were produced on silicon (Si) substrate prepared by Thermal-CVD method using C55H96O6 (Palm Oil) as a starting material. Catalyst has been prepared by dissolving Nickel (II) nitrate, Ni (NO3)2.6H2O and ethyl alcohol, C2H5OH. Before the deposition process, silicon was coated with Nickel using spin coater. Various parameters such as amount of catalyst, amount of palm oil, deposition time, deposition temperature, flow rate of gas and carrier gas have been studied. By using Thermal-CVD, samples were penetrated using NH3 (argon) gas at a temperature 700 - 900oC for catalyst and 450oC for palm oil. Surface morphology and uniformity of CNTs were characterized using FESEM at different deposition temperature. Chemical functional groups of CNTs were characterized using FTIR. The surface morphology and uniformity of CNTs are dependents on parameters used.

Particle generation and thin film surface morphology in the tetraethylorthosilicate/oxygen plasma enhanced chemical vapor deposition process

2000 ◽  
Vol 88 (5) ◽  
pp. 3047-3052 ◽  
Author(s):  
Toshiyuki Fujimoto ◽  
Kikuo Okuyama ◽  
Manabu Shimada ◽  
Yousuke Fujishige ◽  
Motoaki Adachi ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Surface Morphology ◽  
Vapor Deposition ◽  
Oxygen Plasma ◽  
Film Surface ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Particle Generation ◽  
Thin Film Surface

Mechanical Properties and Surface Morphology of Diamond-Like Carbon Films with SiNx Interlayer

2015 ◽  
Vol 723 ◽  
pp. 515-519
Author(s):  
Qing Yun Chen ◽  
Kai Min Shih ◽  
Man Yi Duan ◽  
Lie Lin Wang
Keyword(s):  
Mechanical Properties ◽  
Surface Morphology ◽  
Indentation Test ◽  
Deposition Process ◽  
Industrial Applications ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Dc Magnetron Sputtering ◽  
Force Microscopy ◽  
Atomic Force

Diamond-like carbon (DLC) film has remarkable physical, mechanical, biomedical and tribological properties that make it attractive material for numerous industrial applications needs of advanced mechanical systems. In this study, deposition process of DLC films on Si (100) are performed by direct-current (DC) magnetron sputtering method. The effects of interlayer on the compositions, structures and mechanical properties of DLC films are studied. The scanning electron microscopy (SEM) and atomic force microscopy (AFM) studies reveal the creation of high uniform surface morphology and low roughness DLC films with SiNxinterlayer. For comparison, DLC films with different interlayers are also grown. The Raman spectra are analyzed in order to characterize the film compositions. Indentation test was performed to value the mechanical properties of DLC films. Raman, SEM, and AFM analyses are correlated with the mechanical properties of the DLC films.

Microstructure and Surface Structure Evolution in AlCu Polycrystalline Thin Films

1999 ◽  
Vol 562 ◽  
Author(s):  
Adriana E. Lita ◽  
John E. Sanchez
Keyword(s):  
Thin Films ◽  
Surface Morphology ◽  
Fiber Orientation ◽  
Film Formation ◽  
Deposition Process ◽  
Structure Evolution ◽  
Average Roughness ◽  
Deposition Rates ◽  
Cu Films ◽  
Polycrystalline Thin Films

ABSTRACTThe evolution of crystallographic texture, grain size and surface morphology in magnetron sputter deposited Al-0.5wt.% Cu polycrystalline thin films is reported as a function of film thickness for SiO2 and SiO2/Ti underlayers for several deposition rates. Regardless of the underlayer type, the initial ≈ 10 nm of the Al-Cu films is nearly randomly oriented, with the films developing a (111) out-of-plane texture which increases in strength with thickness during deposition. The AlCu films on sputtered Ti underlayers developed an exact (111) fiber orientation while Al-Cu films on oxide substrates were offset ≈ 5° from exact fiber orientation. Higher deposition rates were found to result in slightly better (111) textured 20 nm AlCu films. The surface morphology of films, determined by Atomic Force Microscopy (AFM), revealed two regimes of average roughness (Rrms) evolution during deposition. Rrms decreased early in the deposition process, followed by a roughening regime where Rrms increased with thickness. These results are discussed in terms of mechanisms such as grain growth, which help to determine microstructure development during film formation from the vapor.

Surface Morphology Studies of Carbon Nanotubes Prepared by Thermal Chemical Vapor Deposition Using Fermented Tapioca as a Starting Material

2013 ◽  
Vol 667 ◽  
pp. 411-414
Author(s):  
S. Aishah ◽  
M.Z. Nuraini ◽  
S.F. Nik ◽  
Mohamad Rusop
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Surface Morphology ◽  
Silicon Wafer ◽  
Vapor Deposition ◽  
Gas Flow ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Starting Material ◽  
Thermal Chemical Vapor Deposition

Carbon nanotubes (CNTs) were deposited on silicon wafer (Si) by Thermal Chemical Vapor Deposition (TCVD). The new starting material of fermented tapioca was used as carbon source. The gas flow of Argon (Ar) was constant at 70 bubbles per minute and 20 minutes of deposition time. Before the deposition process, the silicon wafer was coated with Nickel catalyst using spin coater. Various parameters such as vaporization temperature and deposition temperature have been studied. Surface morphology and uniformity were characterized using FESEM. The CNTs were structurally characterized using FESEM at different magnification to see the differences of CNTs growth at different temperature of the starting material. The surface morphology and uniformity of CNTs were dependent to parameters.

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