Physical Vapor Deposition Assisted Diffusion Bonding of Al Alloy to Mg Alloy Using Silver Interlayer

2020 ◽  
Author(s):  
Hatef Shakeri ◽  
Mohammad Ammar Mofid
Keyword(s):  
Vapor Deposition ◽  
Diffusion Bonding ◽  
Physical Vapor Deposition ◽  
Mg Alloy ◽  
Al Alloy

Crystallographic Texture and Phase Formation in Blanket TifriN/AICu Films

1998 ◽  
Vol 514 ◽  
Author(s):  
P. W. DeHaven ◽  
L. A. Clevenger ◽  
R. F. Schnabe ◽  
S. J. Weber ◽  
R. C. Iggulden ◽  
...  
Keyword(s):  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Alloy Film ◽  
Al Alloy ◽  
Area Detector ◽  
Deposition Parameters ◽  
Temperature Deposition ◽  
20 Nm

ABSTRACTInterconnection metallization uses film stacks, often composed of thin (<10 nm) Ti, TiN, or Ti/TiN underlayer(s) with a thick (200–1000 nm) Al-alloy film deposited on top. The texture or preferred orientation in such film stacks has important implications for both processing and reliability. Earlier studies' have demonstrated the importance of the underlayers on Al texture; however, to date no systematic work has been done on the effect of processing conditions on underlayer texture. This study examines the effect of deposition parameters on the underlayer texture development as well as the effect of this underlayer texture on subsequently deposited Al-alloy films. Fiber plots were obtained for Ti <002> and <101> and Al <111> reflections for a series of 20 nm Ti/ 10 nm TiN/400 nm AlCu films using both a conventional Siemens D500 diffractometer with a pole figure attachment and a Siemens HI-STAR Area Detector system using Cu radiation from a rotating anode source. Because of overlap between the Al <111> and Ti <101> reflections, the Al was removed with a subtractive etch. In this way both the Al and underlayer film textures could be quantified. It was found that the Ti and Al-alloy film textures vary depending on the deposition temperature, deposition method and final film thickness. For example, an increase in the substrate temperature from 300° to 500°C caused the Ti film texture to change from <002> to <101>. Additionally, switching the TiN deposition process from physical vapor deposition (PVD) sputtering to chemical vapor deposition (CVD) in a Ti/TiN/AlCu film stack caused a degradation in the AlCu <111 > texture.

TEM characterization of WSix films

1994 ◽  
Vol 52 ◽  
pp. 848-849
Author(s):  
V. C. Kannan ◽  
S. M. Merchant ◽  
R. B. Irwin ◽  
A. K. Nanda ◽  
M. Sundahl ◽  
...  
Keyword(s):  
Integrated Circuits ◽  
Vapor Deposition ◽  
High Purity ◽  
Physical Vapor Deposition ◽  
Thermal Treatments ◽  
Rapid Thermal Anneal ◽  
Tungsten Silicide ◽  
Tem Characterization ◽  
Metal Silicides

Metal silicides such as WSi2, MoSi2, TiSi2, TaSi2 and CoSi2 have received wide attention in recent years for semiconductor applications in integrated circuits. In this study, we describe the microstructures of WSix films deposited on SiO2 (oxide) and polysilicon (poly) surfaces on Si wafers afterdeposition and rapid thermal anneal (RTA) at several temperatures. The stoichiometry of WSix films was confirmed by Rutherford Backscattering Spectroscopy (RBS). A correlation between the observed microstructure and measured sheet resistance of the films was also obtained.WSix films were deposited by physical vapor deposition (PVD) using magnetron sputteringin a Varian 3180. A high purity tungsten silicide target with a Si:W ratio of 2.85 was used. Films deposited on oxide or poly substrates gave rise to a Si:W ratio of 2.65 as observed by RBS. To simulatethe thermal treatments of subsequent processing procedures, wafers with tungsten silicide films were subjected to RTA (AG Associates Heatpulse 4108) in a N2 ambient for 60 seconds at temperatures ranging from 700° to 1000°C.

scholarly journals Noble Metals for Modern Implant Materials: MOCVD of Film Structures and Cytotoxical, Antibacterial, and Histological Studies

Biomedicines ◽  
2021 ◽  
Vol 9 (8) ◽  
pp. 851
Author(s):  
Svetlana I. Dorovskikh ◽  
Evgeniia S. Vikulova ◽  
Elena V. Chepeleva ◽  
Maria B. Vasilieva ◽  
Dmitriy A. Nasimov ◽  
...  
Keyword(s):  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Noble Metals ◽  
Mononuclear Cells ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Ti Alloy ◽  
Peripheral Blood Mononuclear ◽  
Histological Studies

This work is aimed at developing the modification of the surface of medical implants with film materials based on noble metals in order to improve their biological characteristics. Gas-phase transportation methods were proposed to obtain such materials. To determine the effect of the material of the bottom layer of heterometallic structures, Ir, Pt, and PtIr coatings with a thickness of 1.4–1.5 μm were deposited by metal–organic chemical vapor deposition (MOCVD) on Ti6Al4V alloy discs. Two types of antibacterial components, namely, gold nanoparticles (AuNPs) and discontinuous Ag coatings, were deposited on the surface of these coatings. AuNPs (11–14 nm) were deposited by a pulsed MOCVD method, while Ag films (35–40 nm in thickness) were obtained by physical vapor deposition (PVD). The cytotoxic (24 h and 48 h, toward peripheral blood mononuclear cells (PBMCs)) and antibacterial (24 h) properties of monophase (Ag, Ir, Pt, and PtIr) and heterophase (Ag/Pt, Ag/Ir, Ag/PtIr, Au/Pt, Au/Ir, and Au/PtIr) film materials deposited on Ti-alloy samples were studied in vitro and compared with those of uncoated Ti-alloy samples. Studies of the cytokine production by PBMCs in response to incubation of the samples for 24 and 48 h and histological studies at 1 and 3 months after subcutaneous implantation in rats were also performed. Despite the comparable thickness of the fibrous capsule after 3 months, a faster completion of the active phase of encapsulation was observed for the coated implants compared to the Ti alloy analogs. For the Ag-containing samples, growth inhibition of S. epidermidis, S. aureus, Str. pyogenes, P. aeruginosa, and Ent. faecium was observed.

scholarly journals Characterization of Thin Chromium Coatings Produced by PVD Sputtering for Optical Applications

Coatings ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 215
Author(s):  
Andreia A. Ferreira ◽  
Francisco J. G. Silva ◽  
Arnaldo G. Pinto ◽  
Vitor F. C. Sousa
Keyword(s):  
Automotive Industry ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Early Stage ◽  
Chemical Vapor ◽  
Experimental Tests ◽  
Scratch Test ◽  
Industrial Sectors ◽  
Deposition Processes ◽  
Optical Applications

PVD (physical vapor deposition) and CVD (chemical vapor deposition) have gained greater significance in the last two decades with the mandatory shift from electrodeposition processes to clean deposition processes due to environmental, public safety, and health concerns. Due to the frequent use of coatings in several industrial sectors, the importance of studying the chromium coating processes through PVD–sputtering can be realized, investing in a real alternative to electroplated hexavalent chromium, usually denominated by chromium 6, regularly applied in electrodeposition processes of optical products in the automotive industry. At an early stage, experimental tests were carried out to understand which parameters are most suitable for obtaining chromium coatings with optical properties. To study the coating in a broad way, thickness and roughness analysis of the coatings obtained using SEM and AFM, adhesion analyzes with the scratch-test and transmittance by spectrophotometry were carried out. It was possible to determine that the roughness and transmittance decreased with the increase in the number of layers, the thickness of the coating increased linearly, and the adhesion and resistance to climatic tests remained positive throughout the study. Thus, this study allows for the understanding that thin multilayered Cr coatings can be applied successfully to polymeric substrates regarding optical applications in the automotive industry.

Direct Cladding from Molten Metals of Aluminum and Magnesium Alloys Using a Tandem Horizontal Twin Roll Caster

2015 ◽  
Vol 772 ◽  
pp. 250-256 ◽  
Author(s):  
Hideto Harada ◽  
Shin Ichi Nishida ◽  
Mayumi Suzuki ◽  
Hisaki Watari ◽  
T. Haga
Keyword(s):  
Surface Condition ◽  
Hardness Test ◽  
Al Alloys ◽  
Mg Alloy ◽  
Al Alloy ◽  
Molten Metals ◽  
Electron Probe Micro Analyzer ◽  
Twin Roll Caster ◽  
Aluminum And Magnesium Alloys ◽  
Twin Roll

This paper describes direct cladding of magnesium (Mg) and aluminum (Al) alloys using a tandem horizontal twin roll caster that has three pairs of upper and lower rolls. Manufacturing conditions that are appropriate for fabricating Al/Mg and Al/Mg/Al cladded material were investigated. The surface condition of the cladded cast strip was examined. An electron probe micro analyzer was used to observe the interface between Al alloy and Mg alloy. The thickness of the mixed layer of Al and Mg alloy was 15μm, and how the materials were connected was clarified. Microscopic observation and backscattered electron analysis were used to investigate the cladding mechanisms of the Al and Mg alloy layers. Average hardness was determined using the Vickers hardness test at the Al layer and at the diffused layer between Mg and Al alloys. Cladding of Al/Mg alloy and A/Mg/Al alloy was possible using a tandem twin-roll caster. In addition, Al3Mg2 and Al12Mg17 phase precipitation at the interface of the Al and Mg alloys was confirmed during direct cladding from molten metals.

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