The effect of growth surface morphology on the crystal structure and magnetic property of L10 order PtFe layers deposited by magnetron sputtering

2012 ◽  
Vol 258 (20) ◽  
pp. 7976-7981 ◽  
Author(s):  
Wanyu Ding ◽  
Satoshi Ishiguro ◽  
Ryo Ogatsu ◽  
Dongying Ju
2014 ◽  
Vol 586 ◽  
pp. S343-S347 ◽  
Author(s):  
N.V. Andreev ◽  
T.A. Sviridova ◽  
V.I. Chichkov ◽  
A.P. Volodin ◽  
C. Van Haesendonck ◽  
...  

2021 ◽  
Vol 2021 ◽  
pp. 1-10
Author(s):  
R. Hariharan ◽  
R. Raja ◽  
R. J. Golden Renjith Nimal ◽  
Mohamad Reda A. Refaai ◽  
S Ravi ◽  
...  

In this present research work, TiZrN and TaZrN multilayer coating was deposited on 4140 steel by RF/DC magnetron sputtering for comparative work also prepared in single layer. The flow rate ratio of Ar/N2 was set to 15 : 3 sccm and the thin film was prepared by the PVD (physical vapor deposition) method by RF/DC magnetron using a Ti-Zr and Ta-Zr target with a purity of 99.99%. The crystal structure, surface morphology microstructure, and component arrangements were explored by X-ray diffraction (XRD), scanning electron microscope (SEM), and atomic force microscopy (AFM). It has been found that the crystal structure, surface morphology, microstructure, and elemental composition of the membrane are strongly dependent on deposition parameters. It is mechanically characterized by corrosion and Vickers hardness. In AFM measurements, coarse cluster particles with increasing Ti and Ta values not only increase the average roughness (Ra) by 2.341 nm (200°C) and 2.951 nm (400°C) but also have a continuous average thickness which was shown to increase by 1.504 nm and 781.75 nm. With the increase of hardness, the roughness decreases correspondingly. The TiZrN multilayer microhardness augmented to 314 GPa at 200°C and 371 GPa for TaZrN (400°C).


Coatings ◽  
2019 ◽  
Vol 9 (9) ◽  
pp. 570 ◽  
Author(s):  
Gong ◽  
Xiao ◽  
Zhu ◽  
Wang ◽  
Ma

MoS2 films were prepared via magnetron sputtering under different deposition pressures, and the effects of deposition pressure on the crystal structure, surface morphology, and optical properties of the resulting films were investigated. The results show that the crystallinity of the films first increases and then decreases with increasing pressure. The surface of the films prepared by magnetron sputtering is dense and uniform with few defects. The deposition pressure affects the grain size, surface morphology, and optical band gap of the films. The films deposited at a deposition pressure of 1 Pa revealed remarkable crystallinity, a 30.35 nm grain size, and a 1.67 eV optical band gap. Given the large electronegativity difference between MoS2 molecules and weak van der Waals forces between layers, the MoS2 films are prone to defects at different deposition pressures, causing the exciton energy near defects to decrease and the modulation of the surrounding band.


2020 ◽  
Vol 96 (3s) ◽  
pp. 148-153
Author(s):  
С.Д. Федотов ◽  
А.В. Бабаев ◽  
В.Н. Стаценко ◽  
К.А. Царик ◽  
В.К. Неволин

Представлены результаты изучения морфологии поверхности и структуры слоев AlN, сформированных аммиачной МЛЭ на темплейтах 3C-SiC/Si(111) on-axis- и 4° off-axis-разориентации. Опробован технологический режим низкотемпературной эпитаксии зародышевого слоя AlN на поверхности 3C-SiC(111). Среднеквадратичная шероховатость поверхности (5 х 5 мкм) слоев AlN толщиной 150 ± 50 нм составила 2,5-3,5 нм на темплейтах 3C-SiC/Si(111) on-axis и 3,3-3,5 нм на 4° off-axis. Показано уменьшение шероховатости смачивающего слоя AlN при изменении скорости роста. Получены монокристаллические слои AlN(0002) со значениями FWHM (ω-геометрия) 1,4-1,6°. The paper presents the surface morphology and crystal structure of AlN layers formed by ammonia MBE on 3C-SiC/Si(111) on-axis and 4° off-axis disorientation. It offers the technological approach of low-temperature epitaxy of the AlN nucleation layer on the 3C-SiC (111) surface. Root mean square roughness (5 х 5 |xm) of AlN layers with thickness of 150 ± 50 nm was 2,5-3,5 nm onto on-axis templates and 3.3-3.5 nm onto 4° off-axis. It appears that the RMS roughness of the AlN surface is changing with the growth rate variation. Single-crystal AlN(0002) layers with FWHM values (ω-geometry) of 1.4-1.6° have been obtained.


2010 ◽  
Vol 488 (1-3) ◽  
pp. 32-37 ◽  
Author(s):  
Naoki Matsuoka ◽  
Hiroshi Kawamura ◽  
Naoki Yoshioka

Author(s):  
Hung-Cheng Chen ◽  
Jie-Min Lan ◽  
Hsiang-Lin Hsu ◽  
Chia-Wei Li ◽  
Tien-Shou Shieh ◽  
...  

Three different benzylammonium halide (Cl, Br, and I) salts were investigated to elucidate their effects as additives on MAPbI3 perovskite surface morphology, crystal structure, optical properties, and solar cell performance and stability.


2009 ◽  
Vol 12 (7) ◽  
pp. 698-700 ◽  
Author(s):  
Daopeng Zhang ◽  
Hailong Wang ◽  
Yuting Chen ◽  
Zhong-Hai Ni ◽  
Laijin Tian ◽  
...  

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