Organosiloxane nanolayer as diffusion barrier for Cu Metallization on Si
1995 ◽
Vol 34
(Part 1, No. 12B)
◽
pp. 6857-6860
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Keyword(s):
2003 ◽
Vol 163-164
◽
pp. 214-219
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Keyword(s):
2001 ◽
Vol 40
(Part 1, No. 7)
◽
pp. 4657-4660
◽
1998 ◽
Vol 37
(Part 2, No. 4A)
◽
pp. L406-L408
◽
2016 ◽
Vol 34
(4)
◽
pp. 041504
◽
Keyword(s):
Nitrogen impurity effects of W–B–C–N quaternary thin film for diffusion barrier for Cu metallization
2008 ◽
Vol 23
(2-4)
◽
pp. 484-487
◽