Effects of substrate temperature and reactive gas flow rate on the crystalline ceramic phases formation and tribological properties of W–Ti–Co–C–N thin films produced by co-sputtering

2020 ◽  
Vol 46 (18) ◽  
pp. 29137-29149
Author(s):  
S.A. Ataie ◽  
M. Soltanieh ◽  
R. Naghizadeh ◽  
M. Ahmadi ◽  
M. Ghanaatshoar
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Tribological Properties ◽  
Flow Rate ◽  
Gas Flow ◽  
Gas Flow Rate ◽  
Crystalline Ceramic ◽  
Reactive Gas

Study on Copper Nitride Thin Films Prepared by Reactive DC Magnetron Sputtering

2011 ◽  
Vol 687 ◽  
pp. 706-710 ◽  
Author(s):  
Xing Ao Li ◽  
Jian Ping Yang ◽  
Yong Tao Li ◽  
Li Xia Wang ◽  
Hai Yun Wang
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Flow Rate ◽  
Gas Flow ◽  
Gas Flow Rate ◽  
X Ray Diffraction ◽  
Dc Magnetron Sputtering ◽  
Copper Nitride ◽  
Glass Substrates

Copper nitride thin films were deposited on glass substrates by reactive DC magnetron sputtering at various N2-gas flow rates and different substrate temperature. X-ray diffraction measurements show that the films are composed of Cu3N crystallites with anti-ReO3structure and exhibit preferential orientation to the [111] and [100]. The preferred crystalline orientation of the films changes with the N2-gas flow rate and substrate temperature. The N2-gas flow rate and the substrate temperature not only affect the crystal structure of films but also affect the deposition rate, the resistivity and the microhardness of the Cu3N films.

A Study on the Effect of Process Parameters on Surface Topography of Al Thin Films on Various Substrates Using AFM

2011 ◽  
Vol 383-390 ◽  
pp. 903-908
Author(s):  
S. Shanmugan ◽  
D. Mutharasu ◽  
Z. Hassan ◽  
H. Abu. Hassan
Keyword(s):  
Thin Films ◽  
Surface Topography ◽  
Flow Rate ◽  
Gas Flow ◽  
Process Conditions ◽  
Gas Flow Rate ◽  
Glass Substrates ◽  
Sputtering Power ◽  
Large Particles ◽  
Ar Gas

Al thin films were prepared over different substrates at various process conditions using DC sputtering. The surface topography of all prepared films was examined using AFM technique. Very smooth, uniform and dense surface were observed for Al films coated over Glass substrates. The observed particle size was nano scale (20 -70 nm) for Glass substrates. Sputtering power showed immense effect on surface roughness with respective to Ar gas flow rate. Noticeable change on surface with large particles was observed in Copper substrates at various sputtering power and gas flow rate.

scholarly journals Structural and X-Ray Photoelectron Spectroscopy Study of Al-Doped Zinc-Oxide Thin Films

2015 ◽  
Vol 2015 ◽  
pp. 1-5 ◽  
Author(s):  
Bong Ju Lee ◽  
Ho Jun Song ◽  
Jin Jeong
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Flow Rate ◽  
Photoelectron Spectroscopy ◽  
Gas Flow ◽  
Rf Magnetron Sputtering ◽  
Photoelectron Spectra ◽  
Gas Flow Rate ◽  
X Ray ◽  
Oxide Component

Al-doped zinc-oxide (AZO) thin films were prepared by RF magnetron sputtering at different oxygen partial pressures and substrate temperatures. The charge-carrier concentrations in the films decreased from 1.69 × 1021to 6.16 × 1017 cm−3with increased gas flow rate from 7 to 21 sccm. The X-ray diffraction (XRD) patterns show that the (002)/(103) peak-intensity ratio decreased as the gas flow rate increased, which was related to the increase of AZO thin film disorder. X-ray photoelectron spectra (XPS) of the O1s were decomposed into metal oxide component (peak A) and the adsorbed molecular oxygen on thin films (peak B). The area ratio of XPS peaks (A/B) was clearly related to the stoichiometry of AZO films; that is, the higher value of A/B showed the higher stoichiometric properties.

scholarly journals ZnO:Al Thin Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization: Effects of N2/Ar Gas Flow Rate Ratio

2012 ◽  
Vol 37 (2) ◽  
pp. 165-168 ◽  
Author(s):  
Iping Suhariadi ◽  
Naho Itagaki ◽  
Kazunari Kuwahara ◽  
Koichi Oshikawa ◽  
Daisuke Yamashita ◽  
...  
Keyword(s):  
Thin Films ◽  
Flow Rate ◽  
Rate Ratio ◽  
Gas Flow ◽  
Buffer Layers ◽  
Flow Rate Ratio ◽  
Gas Flow Rate ◽  
Ar Gas

Effect of Flow Rate of Reactive Gas on Mechanical and Tribological Properties of Carbon Nitride Coatings

2018 ◽  
Vol 883 ◽  
pp. 48-52
Author(s):  
Yan Liang Su ◽  
Sun Hui Yao ◽  
Yi Ru Wu ◽  
Cheng Yeh Lin
Keyword(s):  
Tribological Properties ◽  
Flow Rate ◽  
Gas Flow ◽  
Carbon Nitride ◽  
Flow Rate Ratio ◽  
Gas Flow Rate ◽  
Mechanical And Tribological Properties ◽  
Nitride Coatings ◽  
Carbon Nitrogen Ratio ◽  
Nitrogen Ratio

This study discusses the mechanical and tribological properties of a series of carbon nitride coatings deposited by unbalanced DC magnetron sputtering using nitrogen-argon mixture gas and graphite targets. The carbon nitride coatings were with varying carbon/nitrogen ratio by varying the gas flow rate ratio of nitrogen gas/argon while kept the overall gas flow rate at constant. The carbon nitride coatings with C/N ratios from 2.01 to 3.27 were obtained. The coatings were characterized and studied by nanohardness, scratching, and wear testers. It was found that the carbon nitride coatings with C/N ratio=2.36 showed the best performance of all the evaluated properties.

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