Effect of the pre-gate oxide cleaning temperature on the reliability of GOI and devices performances in deep submicron CMOS technology

2008 ◽  
Vol 48 (11-12) ◽  
pp. 1786-1790 ◽  
Author(s):  
Y.T. Chiang ◽  
Y.K. Fang ◽  
Y.J. Huang ◽  
T.H. Chou ◽  
S.Y. Yeh ◽  
...  
Keyword(s):  
Gate Oxide ◽  
Cmos Technology ◽  
Deep Submicron ◽  
Submicron Cmos

He plus remote plasma nitridation of ultra-thin gate oxide for deep submicron CMOS technology applications

2001 ◽  
Vol 37 (12) ◽  
pp. 788 ◽  
Author(s):  
Shyh-Fann Ting ◽  
Yean-Kuen Fang ◽  
Chien-Hao Chen ◽  
Chih-Wei Yang ◽  
Mo-Chiun Yu ◽  
...  
Keyword(s):  
Gate Oxide ◽  
Cmos Technology ◽  
Deep Submicron ◽  
Remote Plasma ◽  
Plasma Nitridation ◽  
Technology Applications ◽  
Submicron Cmos ◽  
Thin Gate Oxide

Deep Submicron CMOS Technology Using Top-Edge Round STI and Dual Gate Oxide for Low Power 256 M-Bit Mobile DRAM

2003 ◽  
Vol 42 (Part 1, No. 4B) ◽  
pp. 1892-1896 ◽  
Author(s):  
Chihoon Lee ◽  
Donggun Park ◽  
Namhyuk Jo ◽  
Chanseong Hwang ◽  
Hyeong Joon Kim ◽  
...  
Keyword(s):  
Low Power ◽  
Gate Oxide ◽  
Cmos Technology ◽  
Deep Submicron ◽  
Dual Gate ◽  
Submicron Cmos

A Time-Resolved, Low-Noise Single-Photon Image Sensor Fabricated in Deep-Submicron CMOS Technology

2012 ◽  
Vol 47 (6) ◽  
pp. 1394-1407 ◽  
Author(s):  
Marek Gersbach ◽  
Yuki Maruyama ◽  
Rahmadi Trimananda ◽  
Matt W. Fishburn ◽  
David Stoppa ◽  
...  
Keyword(s):  
Single Photon ◽  
Cmos Technology ◽  
Image Sensor ◽  
Deep Submicron ◽  
Low Noise ◽  
Time Resolved ◽  
Submicron Cmos

ESD reliability of thinner gate oxide in deep-submicron low-voltage CMOS technology

2002 ◽  
Author(s):  
Ming-Dou Ker ◽  
Chung-Yu Wu ◽  
Hun-Hsien Chang ◽  
Chien-Chang Huang ◽  
Chau-Neng Wu ◽  
...  
Keyword(s):  
Low Voltage ◽  
Gate Oxide ◽  
Cmos Technology ◽  
Deep Submicron
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