Effect of deposition condition on wet and dry etch rates of device quality inductively coupled plasma-chemically vapor deposited SiNx
1998 ◽
Vol 42
(11)
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pp. 2017-2021
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2009 ◽
Vol 615-617
◽
pp. 663-666
2002 ◽
Vol 20
(5)
◽
pp. 2120
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