Investigation on the compensation effect of residual carbon impurities in low temperature grown Mg doped GaN films

2014 ◽  
Vol 115 (16) ◽  
pp. 163704 ◽  
Author(s):  
J. Yang ◽  
D. G. Zhao ◽  
D. S. Jiang ◽  
P. Chen ◽  
Z. S. Liu ◽  
...  
2017 ◽  
Vol 56 (14) ◽  
pp. 4197 ◽  
Author(s):  
Feng Liang ◽  
Degang Zhao ◽  
Desheng Jiang ◽  
Zongshun Liu ◽  
Jianjun Zhu ◽  
...  

2019 ◽  
Vol 11 (26) ◽  
pp. 23798-23807 ◽  
Author(s):  
Nina Joseph ◽  
Jobin Varghese ◽  
Merja Teirikangas ◽  
Timo Vahera ◽  
Heli Jantunen

2012 ◽  
Vol 26 (22) ◽  
pp. 1250142 ◽  
Author(s):  
SHUHUA YAO ◽  
YUANHUA SANG ◽  
DEHONG YU ◽  
MAXIM AVDEEV ◽  
HONG LIU ◽  
...  

Neutron powder diffraction has been carried out on a congruent LiNbO 3 sample containing 7 Li isotope ( C 7 LN ) and a near stoichiometric Mg doped LiNbO 3 sample ( Mg : NSLN ) in the temperature range of 4 K and 90 K. Large anisotropic displacement parameters (ADPs) of the Li ions have shown evidence of large disorder along the c-axis for both samples. The results have shown no evidence for the existence of anomalous structural behavior for both samples at low temperatures, although abnormal structural features at 55 K and 100 K for a LiNbO 3 crystal having different Li content as the samples used in the present studies have been observed by Fernandez-Ruiz et al. [Phys. Rev. B72 (2005) 184108].


2007 ◽  
Vol 356 (1) ◽  
pp. 13-18 ◽  
Author(s):  
Xiujian Chou ◽  
Jiwei Zhai ◽  
Jianying Sun ◽  
Xi Yao

2010 ◽  
Vol 312 (21) ◽  
pp. 3131-3135 ◽  
Author(s):  
Daisuke Iida ◽  
Kenta Tamura ◽  
Motoaki Iwaya ◽  
Satoshi Kamiyama ◽  
Hiroshi Amano ◽  
...  

2020 ◽  
Author(s):  
Dong Fong

The short research of optimization of the growth method to obtain p-type GaAs (001) layers using Si as the dopant was reported in this work. Atomic force microscopy was used to analyze the surface morphology and low-temperature photoluminescence also used to confirm the p-type of the layers.


1989 ◽  
Vol 168 ◽  
Author(s):  
David C. Smith ◽  
Steve G. Pattillo ◽  
Norman E. Elliott ◽  
Thomas G. Zocco ◽  
Carol J. Burns ◽  
...  

AbstractLow-temperature chemical vapor deposition of M(allyl)3 (M = Rh, Ir; allyl = η3 -C3H5) in the presence of H• yields thin, crystalline metal films of greater than 97% metal composition. Depositions using H2 result in the formation of materials which are amorphous and contain a significant amount of residual carbon (14%). The composition of these materials does not differ significantly from that obtained from the vacuum thermal deposition of M(allyl)3.


2010 ◽  
Vol 96 (15) ◽  
pp. 152906 ◽  
Author(s):  
Olena Okhay ◽  
Aiying Wu ◽  
Paula M. Vilarinho ◽  
Alexander Tkach

Sign in / Sign up

Export Citation Format

Share Document