Charge and elemental composition of plasma generated by sputtering of powder target from amorphous boron
Abstract One of the effective and widespread methods of surface hardening of metal products is an ion-plasma saturation of the surface of machine parts and mechanisms with various elements (nitrogen, oxygen, carbon). Less investigated method is the process of ion-plasma saturation of the metals and alloys surface with boron. The purpose of the present work is to develop a method for the formation and study of parameters (electron temperature, plasma potential and concentration), elemental and charge composition of plasma generated at sputtering of a target from amorphous boron powder. To achieve the stated goal, a discharge system with a hot anode made of powder boron, as well as a pulse arc evaporator with a hot cathode made of sintered boron powder, was developed, designed, created and tested. Charge and elemental composition of boron-containing plasma generated during powder target sputtering from amorphous boron are defined by optical spectrometry method. It is shown that the generated plasma contains mainly neutral atoms and single-charge boron ions, as well as iron, silicon, copper and argon particles.