scholarly journals Ways to Improve the Quality of Die Steel 5KhNM

Author(s):  
S V Efimov ◽  
O Yu Malykhina ◽  
A G Pavlova ◽  
V G Milyuts ◽  
V V Tsukanov ◽  
...  
Keyword(s):  
2019 ◽  
Vol 23 (6) ◽  
pp. 1104-1115
Author(s):  
Nikolay Ulakhanov ◽  
◽  
Undrakh Mishigdorzhiyn ◽  
Anatoly Greshilov ◽  
Alexander Tikhonov ◽  
...  

2014 ◽  
Vol 968 ◽  
pp. 129-132
Author(s):  
Hang Yu Zhu ◽  
Jian Li Li ◽  
Wei Wang ◽  
Zheng Liang Xue

A new process of making steel by direct alloying with molybdenum oxides has been regarded in years. The characteristic of the new process is by using of the cheaper molybdenum oxides powder as alloy agent which can improve the flexibility of choosing main raw materials. The implementation of the process can reduce the production cost, protect environment and improve the economic profits and social benefits. In this study, an industrial experiment for direct alloying by using of molybdenum oxides was carried out, and the technological process appeared as follows: EAF (30t) → LF (30t) → VD → ESR →Rolling. Results show that throug the new smelting process quality of ingots meets the requirements of H13 die steel, meanwhile, [O], [H] and [N] contents in molten steel reach a low level compared to traditional smelting process. Therefore, it is feasible to smelt H13 die steel by using of molybdenum oxides instead of ferromolybdenum.


1979 ◽  
Vol 21 (9) ◽  
pp. 725-727
Author(s):  
A. A. Kisurin ◽  
V. I. Fateev ◽  
E. V. Revyakina

Materials ◽  
2019 ◽  
Vol 12 (10) ◽  
pp. 1660 ◽  
Author(s):  
Peter Jurči

The effects of surface roughness, presence of nitrided diffusion regions, and magnetron sputtering of Cr2N–6Ag thin films on the toughness of Cr–V ledeburitic Vanadis 6 die steel were investigated by using the flexural strength measurement method, which was coupled with careful microstructural investigations and analyses of fractured surfaces. The results undoubtedly show that enhanced surface roughness reduces the material toughness, since the cusps formed on the metallic surface as a result of the machining act as preferential sites for crack nucleation and growth. The presence of nitrided regions on the surface, on the other hand, forms a structural notch there, which has a strong detrimental effect on toughness. Deposition of Cr2N–6Ag thin films has only marginal effect on the steel toughness. Practical recommendations for the designers, heat treaters, and coaters of the tools are thus that they should maintain the surface finish quality of the tools as high as possible, avoid too thick and supersaturated nitrided regions, and that there is almost no risk of tool embrittlement due to physical vapor deposition (PVD) coating.


1988 ◽  
Vol 30 (6) ◽  
pp. 449-453
Author(s):  
O. A. Bannykh ◽  
Yu. AP Liberov ◽  
A. V. Tereshchenko

Author(s):  
K. T. Tokuyasu

During the past investigations of immunoferritin localization of intracellular antigens in ultrathin frozen sections, we found that the degree of negative staining required to delineate u1trastructural details was often too dense for the recognition of ferritin particles. The quality of positive staining of ultrathin frozen sections, on the other hand, has generally been far inferior to that attainable in conventional plastic embedded sections, particularly in the definition of membranes. As we discussed before, a main cause of this difficulty seemed to be the vulnerability of frozen sections to the damaging effects of air-water surface tension at the time of drying of the sections.Indeed, we found that the quality of positive staining is greatly improved when positively stained frozen sections are protected against the effects of surface tension by embedding them in thin layers of mechanically stable materials at the time of drying (unpublished).


Author(s):  
L. D. Jackel

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.


Author(s):  
G. Lehmpfuhl

Introduction In electron microscopic investigations of crystalline specimens the direct observation of the electron diffraction pattern gives additional information about the specimen. The quality of this information depends on the quality of the crystals or the crystal area contributing to the diffraction pattern. By selected area diffraction in a conventional electron microscope, specimen areas as small as 1 µ in diameter can be investigated. It is well known that crystal areas of that size which must be thin enough (in the order of 1000 Å) for electron microscopic investigations are normally somewhat distorted by bending, or they are not homogeneous. Furthermore, the crystal surface is not well defined over such a large area. These are facts which cause reduction of information in the diffraction pattern. The intensity of a diffraction spot, for example, depends on the crystal thickness. If the thickness is not uniform over the investigated area, one observes an averaged intensity, so that the intensity distribution in the diffraction pattern cannot be used for an analysis unless additional information is available.


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