Optimizing the quality of bootstrap-based prediction intervals

Author(s):  
Abbas Khosravi ◽  
Saeid Nahavandi ◽  
Doug Creighton ◽  
Dipti Srinivasan
Keyword(s):  
Energies ◽  
2019 ◽  
Vol 12 (24) ◽  
pp. 4713 ◽  
Author(s):  
Ricardo Aler ◽  
Javier Huertas-Tato ◽  
José M. Valls ◽  
Inés M. Galván

Prediction Intervals are pairs of lower and upper bounds on point forecasts and are useful to take into account the uncertainty on predictions. This article studies the influence of using measured solar power, available at prediction time, on the quality of prediction intervals. While previous studies have suggested that using measured variables can improve point forecasts, not much research has been done on the usefulness of that additional information, so that prediction intervals with less uncertainty can be obtained. With this aim, a multi-objective particle swarm optimization method was used to train neural networks whose outputs are the interval bounds. The inputs to the network used measured solar power in addition to hourly meteorological forecasts. This study was carried out on data from three different locations and for five forecast horizons, from 1 to 5 h. The results were compared with two benchmark methods (quantile regression and quantile regression forests). The Wilcoxon test was used to assess statistical significance. The results show that using measured power reduces the uncertainty associated to the prediction intervals, but mainly for the short forecasting horizons.


2011 ◽  
Vol 19 (6) ◽  
pp. 1364-1376 ◽  
Author(s):  
Abbas Khosravi ◽  
Ehsan Mazloumi ◽  
Saeid Nahavandi ◽  
Doug Creighton ◽  
J.W.C. Van Lint

2021 ◽  
Vol 18 (1) ◽  
pp. 78-99
Author(s):  
Sulian Wang ◽  
Chen Wang

The present study aims to investigate the quality of quantile judgments on a quantity of interest that follows the lognormal distribution, which is skewed and bounded from below with a long right tail. We conduct controlled experiments in which subjects predict the losses from a future typhoon based on losses from past typhoons. Our experiments find underconfidence of the 50% prediction intervals, which is primarily driven by overestimation of the 75th percentiles. We further perform exploratory analyses to disentangle sampling errors and judgmental biases in the overall miscalibration. Finally, we show that the correlations of log-transformed judgments between subjects are smaller than is justified by the information overlapping structure. It leads to overconfident aggregate predictions using the Bayes rule if we treat the low correlations as an indicator for independent information.


2015 ◽  
Vol 62 (7) ◽  
pp. 4420-4429 ◽  
Author(s):  
Mohammad Anwar Hosen ◽  
Abbas Khosravi ◽  
Saeid Nahavandi ◽  
Douglas Creighton
Keyword(s):  

Author(s):  
K. T. Tokuyasu

During the past investigations of immunoferritin localization of intracellular antigens in ultrathin frozen sections, we found that the degree of negative staining required to delineate u1trastructural details was often too dense for the recognition of ferritin particles. The quality of positive staining of ultrathin frozen sections, on the other hand, has generally been far inferior to that attainable in conventional plastic embedded sections, particularly in the definition of membranes. As we discussed before, a main cause of this difficulty seemed to be the vulnerability of frozen sections to the damaging effects of air-water surface tension at the time of drying of the sections.Indeed, we found that the quality of positive staining is greatly improved when positively stained frozen sections are protected against the effects of surface tension by embedding them in thin layers of mechanically stable materials at the time of drying (unpublished).


Author(s):  
L. D. Jackel

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.


Author(s):  
G. Lehmpfuhl

Introduction In electron microscopic investigations of crystalline specimens the direct observation of the electron diffraction pattern gives additional information about the specimen. The quality of this information depends on the quality of the crystals or the crystal area contributing to the diffraction pattern. By selected area diffraction in a conventional electron microscope, specimen areas as small as 1 µ in diameter can be investigated. It is well known that crystal areas of that size which must be thin enough (in the order of 1000 Å) for electron microscopic investigations are normally somewhat distorted by bending, or they are not homogeneous. Furthermore, the crystal surface is not well defined over such a large area. These are facts which cause reduction of information in the diffraction pattern. The intensity of a diffraction spot, for example, depends on the crystal thickness. If the thickness is not uniform over the investigated area, one observes an averaged intensity, so that the intensity distribution in the diffraction pattern cannot be used for an analysis unless additional information is available.


Author(s):  
K. Shibatomi ◽  
T. Yamanoto ◽  
H. Koike

In the observation of a thick specimen by means of a transmission electron microscope, the intensity of electrons passing through the objective lens aperture is greatly reduced. So that the image is almost invisible. In addition to this fact, it have been reported that a chromatic aberration causes the deterioration of the image contrast rather than that of the resolution. The scanning electron microscope is, however, capable of electrically amplifying the signal of the decreasing intensity, and also free from a chromatic aberration so that the deterioration of the image contrast due to the aberration can be prevented. The electrical improvement of the image quality can be carried out by using the fascionating features of the SEM, that is, the amplification of a weak in-put signal forming the image and the descriminating action of the heigh level signal of the background. This paper reports some of the experimental results about the thickness dependence of the observability and quality of the image in the case of the transmission SEM.


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