scholarly journals Magnonic Spin-Transfer Torque MRAM With Low Power, High Speed, and Error-Free Switching

2012 ◽  
Vol 48 (6) ◽  
pp. 2016-2024 ◽  
Author(s):  
Niladri N. Mojumder ◽  
David W. Abraham ◽  
Kaushik Roy ◽  
D. C. Worledge
Electronics ◽  
2021 ◽  
Vol 10 (19) ◽  
pp. 2384
Author(s):  
Siddharth Rao ◽  
Sebastien Couet ◽  
Simon Van Beek ◽  
Shreya Kundu ◽  
Shamin Houshmand Sharifi ◽  
...  

Spin-transfer torque magnetoresistive random access memory (STT-MRAM) technology is considered to be the most promising nonvolatile memory (NVM) solution for high-speed and low power applications. Dual MgO-based composite free layers (FL) have driven the development of STT-MRAMs over the past decade, achieving data retention of 10 years at the cost of higher write power consumption. In addition, the need for tunnel magnetoresistance (TMR)-based read schemes limits the flexibility in materials beyond the typical CoFeB/MgO interfaces. In this study, we propose a novel spacerless FL stack comprised of CoFeB alloyed with heavy metals such as tungsten (W) which allows effective modulation of the magnet properties (Ms, Hk) while retaining compatibility with MgO layers. The addition of W results favours a delayed crystallization process, in turn enabling higher thermal budgets up to 180 min at 400 °C. The presence of tungsten reduces the total FL magnetization (Ms) but simultaneously increasing its temperature dependence, thus, enabling a dynamic write current reduction of ~15% at 2 ns pulse widths. Reliable operation is demonstrated with a WER of 1 ppm and endurance >1010 cycles. These results pave the way for alternative designs of STT-MRAMs for low power electronics.


2012 ◽  
Vol 12 (4) ◽  
pp. 756-766 ◽  
Author(s):  
Charles Augustine ◽  
Niladri Narayan Mojumder ◽  
Xuanyao Fong ◽  
Sri Harsha Choday ◽  
Sang Phill Park ◽  
...  

2016 ◽  
Vol 2016 ◽  
pp. 1-12 ◽  
Author(s):  
Hyein Lim ◽  
Seungjun Lee ◽  
Hyungsoon Shin

Spin-transfer torque-based magnetoresistive random access memory (STT-MRAM) is a promising candidate for universal memory that may replace traditional memory forms. It is expected to provide high-speed operation, scalability, low-power dissipation, and high endurance. MRAM switching technology has evolved from the field-induced magnetic switching (FIMS) technique to the spin-transfer torque (STT) switching technique. Additionally, material technology that induces perpendicular magnetic anisotropy (PMA) facilitates low-power operation through the reduction of the switching current density. In this paper, the modeling of magnetic tunnel junctions (MTJs) is reviewed. Modeling methods and models of MTJ characteristics are classified into two groups, macromodels and behavioral models, and the most important characteristics of MTJs, the voltage-dependent MTJ resistance and the switching behavior, are compared. To represent the voltage dependency of MTJ resistance, some models are based on physical mechanisms, such as Landau-Lifshitz-Gilbert (LLG) equation or voltage-dependent conductance. Some behavioral models are constructed by adding fitting parameters or introducing new physical parameters to represent the complex switching behavior of an MTJ over a wide range of input current conditions. Other models that are not based on physical mechanisms are implemented by simply fitting to experimental data.


2018 ◽  
Vol 8 (4) ◽  
pp. 44 ◽  
Author(s):  
Tetsuo Endoh ◽  
Hiroaki Honjo

Nonvolatile (NV) memory is a key element for future high-performance and low-power microelectronics. Among the proposed NV memories, spintronics-based ones are particularly attractive for applications, owing to their low-voltage and high-speed operation capability in addition to their high-endurance feature. There are three types of spintronics devices with different writing schemes: spin-transfer torque (STT), spin-orbit torque (SOT), and electric field (E-field) effect on magnetic anisotropy. The NV memories using STT have been studied and developed most actively and are about to enter into the market by major semiconductor foundry companies. On the other hand, a development of the NV memories using other writing schemes are now underway. In this review article, first, the recent advancement of the spintronics device using STT and the NV memories using them are reviewed. Next, spintronics devices using the other two writing schemes (SOT and E-field) are briefly reviewed, including issues to be addressed for the NV memories application.


2013 ◽  
Vol 49 (9) ◽  
pp. 4982-4987 ◽  
Author(s):  
Erya Deng ◽  
Yue Zhang ◽  
Jacques-Olivier Klein ◽  
Dafine Ravelsona ◽  
Claude Chappert ◽  
...  

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