The Wear of Polymers Sliding on Polymeric Films Deposited on Rough Surfaces

1981 ◽  
Vol 103 (2) ◽  
pp. 266-273 ◽  
Author(s):  
N. S. Eiss ◽  
K. A. Smyth
Keyword(s):  
Vapor Deposition ◽  
Surface Coating ◽  
Friction And Wear ◽  
Deposition Process ◽  
Polymeric Films ◽  
Polymeric Coating ◽  
Deformation Characteristics ◽  
Significant Difference ◽  
Uncoated Surface ◽  
Coated Surface

The single-pass, transfer wear of LDPE, PVC, and PCTFE was studied as a function of the roughness of the steel counterface, and the presence or absence of a polymeric coating. A 50 nm thick film of poly(chloro-p-xylylene) was formed on the steel in a pyrolytic-vapor-deposition process. The results showed that LDPE had lower friction and wear on the coated surface than on the uncoated surface. There was no significant difference in wear or friction as a function of surface coating for PVC and PCTFE. The results were explained by considering the deformation characteristics of the polymeric coating and the three polymer sliders and the modification of the topography by the polymeric coating.

Analysis of Unsteady Heat and Mass Transfer During the Modified Chemical Vapor Deposition Process

1998 ◽  
Vol 120 (4) ◽  
pp. 858-864 ◽  
Author(s):  
K. S. Park ◽  
M. Choi
Keyword(s):  
Mass Transfer ◽  
Chemical Vapor Deposition ◽  
Heat And Mass Transfer ◽  
Vapor Deposition ◽  
Particle Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Inlet Region ◽  
Significant Difference ◽  
Good Agreement

An analysis of unsteady heat and mass transfer in the modified chemical vapor deposition has been carried out. It is found that the commonly used quasi-steady-state assumption could be used to predict the overall efficiency of particle deposition; however, the assumption would not be valid near the inlet region where tapered deposition occurs. The present unsteady calculations have been found to be capable of predicting the detailed deposition profile correctly even from the inlet region where further optimization is needed at a practical situation. The present results have also been compared with existing experimental data and were in good agreement. It is noted that previous quasi-steady calculation resulted in a significant difference in the deposition profile near the inlet region. The effects of time-varying torch speeds were also studied. The case of a linearly varying torch speed resulted in a much shorter tapered entry than the case of a constant torch speed.

Reaction couples of ceramic thin films prepared by CVD

1988 ◽  
Vol 46 ◽  
pp. 798-799
Author(s):  
D.W. Susnitzky ◽  
S.R. Summerfelt ◽  
C.B. Carter
Keyword(s):  
Thin Film ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Solid State Reactions ◽  
Spatial Distributions ◽  
Diffusion Couples ◽  
Kinetics Studies ◽  
Ceramic Thin Films ◽  
Initial Stage

Solid-state reactions have traditionally been studied in the form of diffusion couples. This ‘bulk’ approach has been modified, for the specific case of the reaction between NiO and Al2O3, by growing NiAl2O4 (spinel) from electron-transparent Al2O3 TEM foils which had been exposed to NiO vapor at 1415°C. This latter ‘thin-film’ approach has been used to characterize the initial stage of spinel formation and to produce clean phase boundaries since further TEM preparation is not required after the reaction is completed. The present study demonstrates that chemical-vapor deposition (CVD) can be used to deposit NiO particles, with controlled size and spatial distributions, onto Al2O3 TEM specimens. Chemical reactions do not occur during the deposition process, since CVD is a relatively low-temperature technique, and thus the NiO-Al2O3 interface can be characterized. Moreover, a series of annealing treatments can be performed on the same sample which allows both Ni0-NiAl2O4 and NiAl2O4-Al2O3 interfaces to be characterized and which therefore makes this technique amenable to kinetics studies of thin-film reactions.

Chemical Vapor Deposition of Sr1−xBaxNb2O6 Thin Films Using Metal Alkoxide Precursors

2000 ◽  
Vol 15 (8) ◽  
pp. 1702-1708
Author(s):  
Ruichao Zhang ◽  
Ren Xu
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Single Phase ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Thin Layers ◽  
Metal Alkoxide ◽  
Stoichiometry Control ◽  
Alkoxide Precursors

A novel two-step metalorganic chemical vapor deposition process was used in this study to prepare Sr1−xBaxNb2O6 (SBN) thin films. Two thin layers of single-phase SrNb2O6 and BaNb2O6 were deposited alternately on a silicon substrate, and the solid solution of SBN was obtained by high-temperature annealing. The stoichiometry control of the SrNb2O6 and the BaNb2O6 thin films was achieved through deposition process control, according to the evaporation characteristics of double metal alkoxide. The evaporation behavior of double metal alkoxide precursors SrNb2(1-OC4H9)12 and BaNb2(1-OC4H9)12 was studied, and the results were compared with the evaporation of single alkoxide Nb(1-OC4H9)5.

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