Modulation of Conductance of Thin Films of Semi-Conductors by Surface Charges

Author(s):  
W. SHOCKLEY ◽  
G. L. PEARSON
Keyword(s):  
2018 ◽  
Vol 101 (10) ◽  
pp. 4677-4688 ◽  
Author(s):  
Keigo Suzuki ◽  
Tadasu Hosokura ◽  
Takafumi Okamoto ◽  
James Steffes ◽  
Koji Murayama ◽  
...  

2012 ◽  
Vol 2012 ◽  
pp. 1-6 ◽  
Author(s):  
A. Hemati ◽  
S. Shrestha ◽  
M. Agarwal ◽  
K. Varahramyan

Thin films of CIGS nanoparticles interdigited with polymers have been fabricated through a cost-effective nonvacuum film deposition process called layer-by-layer (LbL) nanoassembly. CIGS nanoparticles synthesized by heating copper chloride, indium chloride, gallium chloride, and selenium in oleylamine were dispersed in water, and desired surface charges were obtained through pH regulation and by coating the particles with polystyrene sulfonate (PSS). Raising the pH of the nanoparticle dispersion reduced the zeta-potential from+61 mV at pH 7 to−51 mV at pH 10.5. Coating the CIGS nanoparticles with PSS (CIGS-PSS) produced a stable dispersion in water with−56.9 mV zeta-potential. Thin films of oppositely charged CIGS nanoparticles (CIGS/CIGS), CIGS nanoparticles and PSS (CIGS/PSS), and PSS-coated CIGS nanoparticles and polyethylenimine (CIGS-PSS/PEI) were constructed through the LbL nanoassembly. Film thickness and resistivity of each bilayer of the films were measured, and photoelectric properties of the films were studied for solar cell applications. Solar cell devices fabricated with a 219 nm CIGS film, when illuminated by 50 W light-source, produced 0.7 V open circuit voltage and 0.3 mA/cm2short circuit current density.


2004 ◽  
Vol 828 ◽  
Author(s):  
Qiang Fu ◽  
Lei An ◽  
Chenguang Lu ◽  
Jie Liu

AbstractHigh-density and high-quality single walled carbon nanotubes are directly grown on surface by Chemical Vapor Depositions. We found that those SWNT thin films could be used to fabricate thin film field-effect transistors. Those transistors are very sensitive to surface charges changes in aqueous solutions and could be used tobuild chemical sensors.


2021 ◽  
pp. 009524432199640
Author(s):  
Pooja Saxena ◽  
Prashant Shukla

In this paper, we have reported the interpretation of air gap (Thermally Stimulated Depolarization Current) of surface charges in PVDF-PMMA (Polyvinylidene fluoride (PVDF)–Polymethyl methacrylate (PMMA)) double-layered polymer thin films whose decay could not be observed in metalized electrets with short-circuit TSDC. Since short-circuit TSDC is caused by the relaxations of homo- and hetero-charge flow in one direction and thus makes it difficult to identify, separate, and characterize its components, therefore, an air gap was introduced to the short-circuit TSDC technique to carry out air-gap TSDC. This technique enables one to observe the orientation of dipoles, excess charge decay by ohmic conduction, and decay of surface charge. When a dielectric is charged by an application of an external field, two charges with opposite polarity and different nature can be found. Air-gap TSDC’s of double-layer samples revealed the presence of homo charge; charges trapped at the surface are due to dissipation of space charges thus, the depolarization current is observed to have the same polarity as that of the polarization current. Hetero-charge persists at high temperatures due to the bulk polarization formed because of the electric field created by the homo-charge. Hence, the depolarization current observed in the present study was observed to be of opposite polarity as that of polarization current. The above discussed polymeric layered structure was found to be a source of charge trapping which was identified and confirmed by various calculated parameters.


1948 ◽  
Vol 74 (2) ◽  
pp. 232-233 ◽  
Author(s):  
W. Shockley ◽  
G. L. Pearson
Keyword(s):  

Author(s):  
L.J. Chen ◽  
Y.F. Hsieh

One measure of the maturity of a device technology is the ease and reliability of applying contact metallurgy. Compared to metal contact of silicon, the status of GaAs metallization is still at its primitive stage. With the advent of GaAs MESFET and integrated circuits, very stringent requirements were placed on their metal contacts. During the past few years, extensive researches have been conducted in the area of Au-Ge-Ni in order to lower contact resistances and improve uniformity. In this paper, we report the results of TEM study of interfacial reactions between Ni and GaAs as part of the attempt to understand the role of nickel in Au-Ge-Ni contact of GaAs.N-type, Si-doped, (001) oriented GaAs wafers, 15 mil in thickness, were grown by gradient-freeze method. Nickel thin films, 300Å in thickness, were e-gun deposited on GaAs wafers. The samples were then annealed in dry N2 in a 3-zone diffusion furnace at temperatures 200°C - 600°C for 5-180 minutes. Thin foils for TEM examinations were prepared by chemical polishing from the GaA.s side. TEM investigations were performed with JE0L- 100B and JE0L-200CX electron microscopes.


Author(s):  
R. C. Moretz ◽  
G. G. Hausner ◽  
D. F. Parsons

Use of the electron microscope to examine wet objects is possible due to the small mass thickness of the equilibrium pressure of water vapor at room temperature. Previous attempts to examine hydrated biological objects and water itself used a chamber consisting of two small apertures sealed by two thin films. Extensive work in our laboratory showed that such films have an 80% failure rate when wet. Using the principle of differential pumping of the microscope column, we can use open apertures in place of thin film windows.Fig. 1 shows the modified Siemens la specimen chamber with the connections to the water supply and the auxiliary pumping station. A mechanical pump is connected to the vapor supply via a 100μ aperture to maintain steady-state conditions.


Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.


Author(s):  
Klaus-Ruediger Peters ◽  
Samuel A. Green

High magnification imaging of macromolecules on metal coated biological specimens is limited only by wet preparation procedures since recently obtained instrumental resolution allows visualization of topographic structures as smal l as 1-2 nm. Details of such dimensions may be visualized if continuous metal films with a thickness of 2 nm or less are applied. Such thin films give sufficient contrast in TEM as well as in SEM (SE-I image mode). The requisite increase in electrical conductivity for SEM of biological specimens is achieved through the use of ligand mediated wet osmiuum impregnation of the specimen before critical point (CP) drying. A commonly used ligand is thiocarbohvdrazide (TCH), first introduced to TEM for en block staining of lipids and glvcomacromolecules with osmium black. Now TCH is also used for SEM. However, after ligand mediated osinification nonspecific osmium black precipitates were often found obscuring surface details with large diffuse aggregates or with dense particular deposits, 2-20 nm in size. Thus, only low magnification work was considered possible after TCH appl ication.


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