Fabrication and characterization of InN-based metal-semiconductor-metal infrared photodetectors prepared using sol–gel spin coated technique

2021 ◽  
pp. 2151024
Author(s):  
Zhi Yin Lee ◽  
Sha Shiong Ng

We report on the growth and characterization of undoped indium nitride (InN) thin films grown on a silicon substrate. The InN thin films were grown on aluminium nitride (AlN) template with gallium nitride (GaN) nucleation layer using a relatively simple and low-cost sol–gel spin coating method. The crystalline structure and optical properties of the deposited films were investigated. X-ray diffraction and Raman results revealed that InN thin films with wurtzite structure were successfully grown. For InN thin film grown on a substrate with the GaN nucleation layer, its strain and dislocation density are lower than that of the substrate with the AlN nucleation layer. From the ultra-violet-visible diffuse reflectance spectrum analysis, the energy bandgap of the InN thin films with the GaN layer was 1.70 eV. The potential application of the sol–gel spin-coated InN thin films was also explored. Metal–semiconductor–metal (MSM) infrared (IR) photodetectors were fabricated by depositing the platinum contacts using two interdigitated electrodes metal mask on the samples. The finding shows that the device demonstrates good sensitivity and repeatability towards IR excitation at a wavelength of 808 nm. The photodetector characteristics at dark and photocurrent conditions such as Schottky barrier height (SBH) and ideality factor are determined. Upon exposure to the IR source at 3V applied bias, InN/AlN/Si device configuration displays rapid rise time of 0.85 s and decay time of 0.78 s, while InN/GaN/AlNSi demonstrates slow rise time of 7.45 s and decay time of 13.75 s.

1996 ◽  
Vol 459 ◽  
Author(s):  
E. Ching-Prado ◽  
W. Pérez ◽  
A. Reynés-Figueroa ◽  
R. S. Katiyar ◽  
D. Ravichandran ◽  
...  

ABSTRACTThin films of SrBi2Nb2O9 (SBN) with thicknesses of 0.1, 0.2, and 0.4 μ were grown by Sol-gel technique on silicon, and annealed at 650°C. The SBN films were investigated by Raman scatering for the first time. Raman spectra in some of the samples present bands around 60, 167, 196, 222, 302, 451, 560, 771, 837, and 863 cm−1, which correspond to the SBN formation. The study indicates that the films are inhomogeneous, and only in samples with thicknesses 0.4 μ the SBN material was found in some places. The prominent Raman band around 870 cm−1, which is the A1g mode of the orthorhombic symmetry, is assigned to the symmetric stretching of the NbO6 octahedrals. The frequency of this band is found to shift in different places in the same sample, as well as from sample to sample. The frequency shifts and the width of the Raman bands are discussed in term of ions in non-equilibrium positions. FT-IR spectra reveal a sharp peak at 1260 cm−1, and two broad bands around 995 and 772 cm−1. The bandwidths of the latter two bands are believed to be associated with the presence of a high degree of defects in the films. The experimental results of the SBN films are compared with those obtained in SBT (T=Ta) films. X-ray diffraction and SEM techniques are also used for the structural characterization.


2011 ◽  
Vol 239-242 ◽  
pp. 891-894 ◽  
Author(s):  
Tsung Fu Chien ◽  
Jen Hwan Tsai ◽  
Kai Huang Chen ◽  
Chien Min Cheng ◽  
Chia Lin Wu

In this study, thin films of CaBi4Ti4O15with preferential crystal orientation were prepared by the chemical solution deposition (CSD) technique on a SiO2/Si substrate. The films consisted of a crystalline phase of bismuth-layer-structured dielectric. The as-deposited CaBi4Ti4O15thin films were crystallized in a conventional furnace annealing (RTA) under the temperature of 700 to 800°C for 1min. Structural and morphological characterization of the CBT thin films were investigated by X-ray diffraction (XRD) and field-emission scanning electron microscope (FE-SEM). The impedance analyzer HP4294A and HP4156C semiconductor parameters analyzer were used to measurement capacitance voltage (C-V) characteristics and leakage current density of electric field (J-E) characteristics by metal-ferroelectric-insulator- semiconductor (MFIS) structure. By the experimental result the CBT thin film in electrical field 20V, annealing temperature in 750°C the CBT thin film leaks the electric current is 1.88x10-7A/cm2and the memory window is 1.2V. In addition, we found the strongest (119) peak of as-deposited thin films as the annealed temperature of 750°C


2012 ◽  
Vol 2 (1) ◽  
Author(s):  
Marek Nocuń ◽  
Sławomir Kwaśny

AbstractIn our investigation, V doped SiO2/TiO2 thin films were prepared on glass substrates by dip coating sol-gel technique. Chemical composition of the samples was studied by X-ray photoelectron spectroscopy (XPS). Transmittance of the samples was characterized using UV-VIS spectrophotometry. Subsequently band-gap energy (Eg) was estimated for these films. Powders obtained from sols were characterized by FTIR spectroscopy. It was found that vanadium decreases optical band gap of SSiO2/TiO2 films.


2018 ◽  
Vol 766 ◽  
pp. 601-608 ◽  
Author(s):  
Hao Shen ◽  
Yinong Yin ◽  
Kun Tian ◽  
Karthikeyan Baskaran ◽  
Libing Duan ◽  
...  

2011 ◽  
Vol 13 (6) ◽  
pp. 1232-1234 ◽  
Author(s):  
Vaishali Patil ◽  
Arun Patil ◽  
Ji-Won Choi ◽  
Seok-Jin Yoon

1999 ◽  
Author(s):  
Yongxiang Li ◽  
Muralihar K. Ghantasala ◽  
Kosmas Galatsis ◽  
Wojtek Wlodarski

2012 ◽  
Vol 121 (1) ◽  
pp. 217-220 ◽  
Author(s):  
M.S. Kim ◽  
K.G. Yim ◽  
S. Kim ◽  
G. Nam ◽  
D.Y. Lee ◽  
...  

2009 ◽  
Vol 24 (8) ◽  
pp. 2541-2546 ◽  
Author(s):  
Eisuke Yokoyama ◽  
Hironobu Sakata ◽  
Moriaki Wakaki

ZrO2 thin films containing silver nanoparticles were prepared using the sol-gel method with Ag to Zr molar ratios [Ag]/[Zr] = 0.11, 0.25, 0.43, 0.67, 1.00, 1.50, and 2.33. After dip coating on glass substrate, coated films were annealed at 200 and 300 °C in air. X-ray diffraction peaks corresponding to crystalline Ag were observed, but a specific peak corresponding to ZrO2 was not observed. At the molar ratio [Ag]/[Zr] = 0.25, the particle size of Ag distributed broadly centered at 17 nm for an annealing temperature of 200 °C and at 25 nm for 300 °C. The films annealed in air at 200 °C showed an absorption band centered at 450 nm because of the silver surface plasmon resonance, whereas films heated at 300 °C in air caused a red shift of the absorption to 500 nm. The absorption peak was analyzed using the effective dielectric function of Ag-ZrO2 composite films modeled with the Maxwell-Garnett expression.


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