Fullerene-Derivative Nanocomposite Resist for Nanometer Pattern Fabrication

A new side-chain C60-fullerene functionalized thiophene copolymer bearing tributylphosphine-substituted hexylic lateral groups was successfully synthesized by means of a fast and effective post-polymerization reaction on a regioregular ω-alkylbrominated polymeric precursor. The growth of the polymeric intermediate was followed by NMR spectrometry in order to determine the most convenient reaction time. The obtained copolymer was soluble in water and polar solvents and was used as a photoactive layer in single-material organic photovoltaic (OPV) solar cells. The copolymer photovoltaic efficiency was compared with that of an OPV cell containing a water-soluble polythiophenic homopolymer, functionalized with the same tributylphosphine-substituted hexylic side chains, in a blend with a water-soluble C60-fullerene derivative. The use of a water-soluble double-cable copolymer made it possible to enhance the control on the nanomorphology of the active blend, thus reducing phase-segregation phenomena, as well as the macroscale separation between the electron acceptor and donor components. Indeed, the power conversion efficiency of OPV cells based on a single material was higher than that obtained with the classical architecture, involving the presence of two distinct ED and EA materials (PCE: 3.11% vs. 2.29%, respectively). Moreover, the synthetic procedure adopted to obtain single material-based cells is more straightforward and easier than that used for the preparation of the homopolymer-based BHJ solar cell, thus making it possible to completely avoid the long synthetic pathway which is required to prepare water-soluble fullerene derivatives.

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Surface modification of PMMA polymer and its composites with PC61BM fullerene derivative using an atmospheric pressure microwave argon plasma sheet

Scientific Reports ◽

10.1038/s41598-021-88553-5 ◽

2021 ◽

Vol 11 (1) ◽

Author(s):

Andrzej Sikora ◽

Dariusz Czylkowski ◽

Bartosz Hrycak ◽

Magdalena Moczała-Dusanowska ◽

Marcin Łapiński ◽

...

Keyword(s):

Contact Angle ◽

Surface Modification ◽

Chemical Composition ◽

Water Contact Angle ◽

Plasma Sheet ◽

Atmospheric Pressure ◽

Argon Plasma ◽

Fullerene Derivative ◽

Water Contact ◽

Pmma Polymer

AbstractThis paper presents the results of experimental investigations of the plasma surface modification of a poly(methyl methacrylate) (PMMA) polymer and PMMA composites with a [6,6]-phenyl-C61-butyric acid methyl ester fullerene derivative (PC61BM). An atmospheric pressure microwave (2.45 GHz) argon plasma sheet was used. The experimental parameters were: an argon (Ar) flow rate (up to 20 NL/min), microwave power (up to 530 W), number of plasma scans (up to 3) and, the kind of treated material. In order to assess the plasma effect, the possible changes in the wettability, roughness, chemical composition, and mechanical properties of the plasma-treated samples’ surfaces were evaluated by water contact angle goniometry (WCA), atomic force microscopy (AFM), attenuated total reflectance Fourier transform infrared spectroscopy (ATR-FTIR) and X-ray photoelectron spectroscopy (XPS). The best result concerning the water contact angle reduction was from 83° to 29.7° for the PMMA material. The ageing studies of the PMMA plasma-modified surface showed long term (100 h) improved wettability. As a result of plasma treating, changes in the samples surface roughness parameters were observed, however their dependence on the number of plasma scans is irregular. The ATR-FTIR spectra of the PMMA plasma-treated surfaces showed only slight changes in comparison with the spectra of an untreated sample. The more significant differences were demonstrated by XPS measurements indicating the surface chemical composition changes after plasma treatment and revealing the oxygen to carbon ratio increase from 0.1 to 0.4.

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Pyridine-functionalized fullerene additive enabling coordination interactions with CH3NH3PbI3 perovskite towards highly efficient bulk heterojunction solar cells

Journal of Materials Chemistry A ◽

10.1039/c8ta12206g ◽

2019 ◽

Vol 7 (6) ◽

pp. 2754-2763 ◽

Cited By ~ 23

Author(s):

Jieming Zhen ◽

Weiran Zhou ◽

Muqing Chen ◽

Bairu Li ◽

Lingbo Jia ◽

...

Keyword(s):

Solar Cells ◽

Power Conversion Efficiency ◽

Conversion Efficiency ◽

Bulk Heterojunction ◽

Power Conversion ◽

Fullerene Derivative ◽

Heterojunction Solar Cells ◽

Bulk Heterojunction Solar Cells ◽

Highly Efficient

A novel pyridine-functionalized fullerene derivative (C60-PyP) as an additive in regular bulk heterojunction perovskite (CH3NH3Pbl3) solar cells (PSCs) enables a power conversion efficiency of 19.82% with markedly suppressed hysteresis.

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DNA-Origami-Aided Lithography for Sub-10 Nanometer Pattern Printing

Proceedings ◽

10.3390/proceedings1040325 ◽

2017 ◽

Vol 1 (4) ◽

pp. 325 ◽

Cited By ~ 1

Author(s):

Isaac Gállego ◽

Brendan Manning ◽

Joan Daniel Prades ◽

Mònica Mir ◽

Josep Samitier ◽

...

Keyword(s):

Dna Origami ◽

Nanometer Pattern

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Crossover Site-Selectivity in the Adsorption of the Fullerene Derivative PCBM on Au(111)

Angewandte Chemie International Edition ◽

10.1002/anie.200702531 ◽

2007 ◽

Vol 46 (41) ◽

pp. 7874-7877 ◽

Cited By ~ 53

Author(s):

David Écija ◽

Roberto Otero ◽

Luis Sánchez ◽

José María Gallego ◽

Yang Wang ◽

...

Keyword(s):

Fullerene Derivative ◽

Site Selectivity ◽

Crossover Site

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A nano-composite resist system: A new approach to nanometer pattern fabrication

Microelectronic Engineering ◽

10.1016/s0167-9317(96)00167-0 ◽

1997 ◽

Vol 35 (1-4) ◽

pp. 113-116 ◽

Cited By ~ 11

Author(s):

T. Ishii ◽

H. Nozawa ◽

T. Tamamura

Keyword(s):

Nano Composite ◽

New Approach ◽

System A ◽

Nanometer Pattern

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Photoconductivity of Low-Bandgap Polymer and Polymer: Fullerene Bulk Heterojunction Studied by Constant Photocurrent Method

Organic Photonics and Photovoltaics ◽

10.1515/oph-2015-0011 ◽

2015 ◽

Vol 3 (1) ◽

Cited By ~ 2

Author(s):

V. V. Malov ◽

A. R. Tameev ◽

S. V. Novikov ◽

M. V. Khenkin ◽

A. G. Kazanskii ◽

...

Keyword(s):

Molecular Orbital ◽

Bulk Heterojunction ◽

Inorganic Materials ◽

Fullerene Derivative ◽

Approximation Procedure ◽

Photoelectric Properties ◽

Highest Occupied Molecular Orbital ◽

Donor Acceptor ◽

Lowest Unoccupied Molecular Orbital ◽

Doped Polymers

AbstractOptical and photoelectric properties of modern photosensitive polymers are of great interest due to their prospects for photovoltaic applications. In particular, an investigation of absorption and photoconductivity edge of these materials could provide valuable information. For these purpose we applied the constant photocurrent method which has proved its efficiency for inorganic materials. PCDTBT and PTB7 polymers were used as objects for the study as well as their blends with a fullerene derivative PC71BM. The measurements by constant photocurrent method (CPM) show that formation of bulk heterojunction (BHJ) in the blends increases photoconductivity and results in a redshift of the photocurrent edge in the doped polymers compared with that in the neat polymers. Obtained from CPM data, spectral dependences of absorption coefficient were approximated using Gaussian distribution of density-of-states within HOMO (highest occupied molecular orbital) and LUMO (lowest unoccupied molecular orbital) bands. The approximation procedure allowed us to evaluate rather optical than electrical bandgaps for the studied materials. Moreover, spectra of polymer:PC71BM blends were fitted well by the sum of two Gaussian peaks which reveal both the transitions within the polymer and the transitions involving charge transfer states at the donor-acceptor interface in the BHJ.

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Systematic Studies of Fullerene Derivative Electron Beam Resists

MRS Proceedings ◽

10.1557/proc-584-115 ◽

1999 ◽

Vol 584 ◽

Author(s):

A. P. G. Robinson ◽

R. E. Palmer ◽

T. Tada ◽

T. Kanayama ◽

E. J. Shelley ◽

...

Keyword(s):

Electron Beam ◽

Dissolution Rate ◽

Organic Solvents ◽

Spin Coating ◽

Electron Beam Irradiation ◽

Fullerene Derivative ◽

Silicon Substrates ◽

Beam Irradiation ◽

Negative Tone ◽

20 Nm

AbstractWe report systematic studies of the response of C60 derivatives to electron beam irradiation. Films of fourteen different mono, tris and tetra adduct methanofullerene C60 derivatives were produced by spin coating on hydrogen terminated silicon substrates. Exposure of the films to a 20 keV electron beam substantially altered the dissolution rate of the derivative films in organic solvents such as monochlorobenzene. All of the derivatives exhibited negative tone resist behaviour with sensitivities between ∼ 8.5 × 10-4 and ∼ 4 × 10-3 C/cm2 107, much higher than that of C60. Features with widths of ∼ 20 nm were produced using these compounds, and the etch ratios of the compounds were found to be more than twice those of a standard novolac based resist (SAL601).

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