0.12 µm Gate Length T-Shaped AlGaAs/InGaAs/GaAs Pseudomorphic High-Electron-Mobility Transistors Fabricated Using a Plasma-Enhanced Chemical Vapor Deposited Silicon–Nitride-Assisted Process
2004 ◽
Vol 43
(12)
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pp. 7934-7938
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2007 ◽
Vol 46
(4B)
◽
pp. 2341-2343
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1992 ◽
Vol 10
(6)
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pp. 2949
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2009 ◽
Vol 41
(8)
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pp. 1517-1521
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2011 ◽
Vol 29
(3)
◽
pp. 031211
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2018 ◽
Vol 13
(8)
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pp. 1123-1127
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2014 ◽
Vol 14
(8)
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pp. 6243-6246
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2006 ◽
Vol 45
(1A)
◽
pp. 13-17
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