0.12 µm Gate Length T-Shaped AlGaAs/InGaAs/GaAs Pseudomorphic High-Electron-Mobility Transistors Fabricated Using a Plasma-Enhanced Chemical Vapor Deposited Silicon–Nitride-Assisted Process

2004 ◽  
Vol 43 (12) ◽  
pp. 7934-7938 ◽  
Author(s):  
Jong-Won Lim ◽  
Ho-Kyun Ahn ◽  
Hong-Gu Ji ◽  
Woo-Jin Chang ◽  
Jae-Kyoung Mun ◽  
...  
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