Sequential Nano-Patterning Using Electron and Laser Beams: A Numerical Methodology

2006 ◽  
Vol 3 (2) ◽  
pp. 219-230 ◽  
Author(s):  
Basil T. Wong ◽  
M. Pinar Mengüç ◽  
R. Ryan Vallance
Keyword(s):  
Monte Carlo ◽  
Electron Beam ◽  
Ray Tracing ◽  
Electron Scattering ◽  
Gold Film ◽  
Quartz Substrate ◽  
Experimental Studies ◽  
Machining Processes ◽  
Laser Propagation ◽  
The One

A methodology is presented for nanometer-size patterning of a workpiece using both an electron-beam and a laser. A Monte Carlo/Ray Tracing technique is used in modeling the electron-beam propagation inside a thin gold film. This approach is identical to that of a typical Monte Carlo simulation in radiative transfer except that proper electron scattering properties are employed. The laser propagation within the one-dimensional, non-scattering film on top of a quartz substrate is modeled using a ray-tracing approach and reflections at the boundaries are accounted for with the Fresnel-expressions. The temperature distribution inside a gold film is then predicted using the Fourier law of heat conduction, after evaluating the accuracy of the model for the range considered. A sequential nano-pattern is created using these coupled numerical simulations. The procedure we present here is the first to outline the sequential nano-machining processes and likely to guide the experimental studies to success with less trial-and-error attempts.

Lithography below 100 nm

1983 ◽  
Vol 41 ◽  
pp. 96-99
Author(s):  
L. D. Jackel
Keyword(s):  
Spatial Distribution ◽  
Electron Beam ◽  
Electron Scattering ◽  
Electron Beam Lithography ◽  
Substrate Material ◽  
Local Electron ◽  
Electron Dose ◽  
Positive Resist ◽  
Exposure Process

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.

Quantitation in thin Sections Within the Electron Microscope

1976 ◽  
Vol 34 ◽  
pp. 336-337
Author(s):  
J. Edie
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Electron Scattering ◽  
Volume Density ◽  
Thin Sections ◽  
Faraday Cage ◽  
Local Mass ◽  
Physical Measurements ◽  
Mass Volume ◽  
Varying Mass

In TEM image formation, the observed contrast variations within thin sections result from differential electron scattering within microregions of varying mass thickness. It is possible to utilize these electron scattering properties to obtain objective information regarding various specimen parameters (1, 2, 3).A pragmatic, empirical approach is described which enables a microscopist to perform physical measurements of thickness of thin sections and estimates of local mass, volume, density and, possibly, molecular configurations within thin sections directly in the microscope. A Faraday cage monitors the transmitted electron beam and permits measurements of electron beam intensities.

Electron Scattering in Solids

1990 ◽  
Vol 48 (2) ◽  
pp. 4-5
Author(s):  
Ryuichi Shimizu ◽  
Ze-Jun Ding
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Angular Distribution ◽  
Elastic Scattering ◽  
Electron Scattering ◽  
Cross Sections ◽  
Expansion Method ◽  
Electron Excitation ◽  
Partial Wave Expansion ◽  
Backscattered Electrons

Monte Carlo simulation has been becoming most powerful tool to describe the electron scattering in solids, leading to more comprehensive understanding of the complicated mechanism of generation of various types of signals for microbeam analysis.The present paper proposes a practical model for the Monte Carlo simulation of scattering processes of a penetrating electron and the generation of the slow secondaries in solids. The model is based on the combined use of Gryzinski’s inner-shell electron excitation function and the dielectric function for taking into account the valence electron contribution in inelastic scattering processes, while the cross-sections derived by partial wave expansion method are used for describing elastic scattering processes. An improvement of the use of this elastic scattering cross-section can be seen in the success to describe the anisotropy of angular distribution of elastically backscattered electrons from Au in low energy region, shown in Fig.l. Fig.l(a) shows the elastic cross-sections of 600 eV electron for single Au-atom, clearly indicating that the angular distribution is no more smooth as expected from Rutherford scattering formula, but has the socalled lobes appearing at the large scattering angle.

The use of an energy-filtering electron microscope to reduce chromatic aberration in images of thick biological specimens

1986 ◽  
Vol 44 ◽  
pp. 88-91
Author(s):  
L. D. Peachey ◽  
J. P. Heath ◽  
G. Lamprecht
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Electron Beam ◽  
Cross Section ◽  
Electron Scattering ◽  
Chromatic Aberration ◽  
Image Resolution ◽  
Incident Electron Energy ◽  
Energy Filtering ◽  
Transmission Electron

Biological specimens of cells and tissues generally are considerably thicker than ideal for high resolution transmission electron microscopy. Actual image resolution achieved is limited by chromatic aberration in the image forming electron lenses combined with significant energy loss in the electron beam due to inelastic scattering in the specimen. Increased accelerating voltages (HVEM, IVEM) have been used to reduce the adverse effects of chromatic aberration by decreasing the electron scattering cross-section of the elements in the specimen and by increasing the incident electron energy.

A Relativistic Newtonian Mechanics Predicts with Precision the Results of Recent Neutrino-Velocity Experiments

2014 ◽  
Vol 6 (1) ◽  
pp. 1032-1035 ◽  
Author(s):  
Ramzi Suleiman
Keyword(s):  
Null Hypothesis ◽  
Experimental Studies ◽  
Theoretical Models ◽  
Newtonian Mechanics ◽  
Speed Of Light ◽  
Symmetry Principle ◽  
Proposed Model ◽  
Significant Difference ◽  
The One ◽  
Complete Collapse

The research on quasi-luminal neutrinos has sparked several experimental studies for testing the "speed of light limit" hypothesis. Until today, the overall evidence favors the "null" hypothesis, stating that there is no significant difference between the observed velocities of light and neutrinos. Despite numerous theoretical models proposed to explain the neutrinos behavior, no attempt has been undertaken to predict the experimentally produced results. This paper presents a simple novel extension of Newton's mechanics to the domain of relativistic velocities. For a typical neutrino-velocity experiment, the proposed model is utilized to derive a general expression for . Comparison of the model's prediction with results of six neutrino-velocity experiments, conducted by five collaborations, reveals that the model predicts all the reported results with striking accuracy. Because in the proposed model, the direction of the neutrino flight matters, the model's impressive success in accounting for all the tested data, indicates a complete collapse of the Lorentz symmetry principle in situation involving quasi-luminal particles, moving in two opposite directions. This conclusion is support by previous findings, showing that an identical Sagnac effect to the one documented for radial motion, occurs also in linear motion.

Porous Aluminophosphates as Adsorbents for the Separation of CO2/CH4 and CH4/N2 Mixtures – a Monte Carlo Simulation Study

2018 ◽  
Author(s):  
Michael Fischer
Keyword(s):  
Monte Carlo ◽  
Landfill Gas ◽  
Experimental Studies ◽  
Chem Phys ◽  
Monte Carlo Simulation Study ◽  
Mixture Adsorption ◽  
Vacuum Swing Adsorption ◽  
Separation Of Co2 ◽  
Pressure Swing ◽  
Gcmc Simulations

<div>Aluminophosphates with zeolite-like topologies (AlPOs) have received considerable attention as potential adsorbents for use in the separation of methane-containing gas mixtures. Such separations, especially the removal of carbon dioxide and nitrogen from methane, are of great technological relevance in the context of the “upgrade” of natural gas, landfill gas, and biogas. While more than 50 zeolite frameworks have been synthesised in aluminophosphate composition or as heteroatom substituted AlPO derivatives, only a few of them have been characterised experimentally with regard to their adsorption and separation behaviour. In order to predict the potential of a variety of AlPO frameworks for applications in CO<sub>2</sub>/CH<sub>4</sub> and CH<sub>4</sub>/N<sub>2</sub> separations, atomistic grand-canonical Monte Carlo (GCMC) simulations were performed for 53 different structures. Building on previous work, which studied CO<sub>2</sub>/N<sub>2</sub> mixture adsorption in AlPOs (M. Fischer, <i>Phys. Chem. Chem. Phys.</i>, 2017, <b>19</b>, 22801–22812), force field parameters for methane adsorption in AlPOs were validated through a comparison to available experimental adsorption data. Afterwards, CO<sub>2</sub>/CH<sub>4</sub> and CH<sub>4</sub>/N<sub>2</sub> mixture isotherms were computed for all 53 frameworks for room temperature and total pressures up to 1000 kPa (10 bar), allowing the prediction of selectivities and working capacities for conditions that are relevant for pressure swing adsorption (PSA) and vacuum swing adsorption (VSA). For CO<sub>2</sub>/CH<sub>4 </sub>mixtures, the <b>GIS</b>, <b>SIV</b>, and <b>ATT</b> frameworks were found to have the highest selectivities and CO<sub>2 </sub>working capacities under VSA conditions, whereas several frameworks, among them <b>AFY</b>, <b>KFI</b>, <b>AEI</b>, and <b>LTA</b>, show higher working capacities under PSA conditions. For CH<sub>4</sub>/N<sub>2</sub> mixtures, all frameworks are moderately selective for methane over nitrogen, with <b>ATV</b> exhibiting a significantly higher selectivity than all other frameworks. While some of the most promising topologies are either not available in pure-AlPO<sub>4</sub> composition or collapse upon calcination, others can be synthesised and activated, rendering them interesting candidates for future experimental studies. In addition to predictions of mixture adsorption isotherms, further simulations were performed for four selected systems in order to investigate the microscopic origins of the macroscopic adsorption behaviour, <i>e.g. </i>with regard to the very high CH<sub>4</sub>/N<sub>2</sub> selectivity of <b>ATV</b> and the loading-dependent evolution of the heat of CO<sub>2</sub> adsorption and CO<sub>2</sub>/CH<sub>4</sub> selectivity of <b>AEI</b> and GME.</div>

COMPUTATIONAL AND EXPERIMENTAL STUDIES OF A LOW-EMISSION BURNER FOR A PERSPECTIVE TURBOJET ENGINE WITH THE COMPRESSION RATIO EXCEEDING 40

2020 ◽  
Author(s):  
M. A. Danilov ◽  
◽  
M. V. Drobysh ◽  
A. N. Dubovitsky ◽  
F. G. Markov ◽  
...  
Keyword(s):  
Compression Ratio ◽  
Experimental Studies ◽  
The Other ◽  
Aircraft Engines ◽  
Engine Efficiency ◽  
Other Hand ◽  
Turbojet Engine ◽  
Low Emission ◽  
Civil Aircraft ◽  
The One

Restrictions of emissions for civil aircraft engines, on the one hand, and the need in increasing the engine efficiency, on the other hand, cause difficulties during development of low-emission combustors for such engines.

scholarly journals A fractional generalization of the dirichlet distribution and related distributions

2021 ◽  
Vol 24 (1) ◽  
pp. 112-136
Author(s):  
Elvira Di Nardo ◽  
Federico Polito ◽  
Enrico Scalas
Keyword(s):  
Monte Carlo ◽  
Probability Density Function ◽  
Monte Carlo Simulations ◽  
Probability Density ◽  
Dirichlet Distribution ◽  
One Dimensional ◽  
Reasonable Approximation ◽  
Generalized Dirichlet Distribution ◽  
The One ◽  
Generalized Dirichlet

Abstract This paper is devoted to a fractional generalization of the Dirichlet distribution. The form of the multivariate distribution is derived assuming that the n partitions of the interval [0, Wn ] are independent and identically distributed random variables following the generalized Mittag-Leffler distribution. The expected value and variance of the one-dimensional marginal are derived as well as the form of its probability density function. A related generalized Dirichlet distribution is studied that provides a reasonable approximation for some values of the parameters. The relation between this distribution and other generalizations of the Dirichlet distribution is discussed. Monte Carlo simulations of the one-dimensional marginals for both distributions are presented.

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