scholarly journals Electroless deposition of Ni-P on a silicon surface

2017 ◽  
Vol 6 (4) ◽  
pp. 117-124
Author(s):  
Hassan El Grini ◽  
Khadija Rahou ◽  
Mohammed Cherkaoui ◽  
Jean-Noël Chazalviel ◽  
François Ozanam ◽  
...  

The present article concerns the metallization of silicon substrates by deposition of the nickelphosphorus alloy produced by an autocatalytic chemical process. The deposition electrolyte is composed of a metal salt, a reducing agent (sodium hypophosphite), a complexing agent (sodium citrate) and a buffer (ammonium acetate). The deposition could only be carried out after activation of the silicon by fixing catalytic species on its surface. The immersion of the silicon samples in palladium chloride made it possible to produce relatively thick and regular Ni-P coatings. The immersion time was optimized. The activation of Si was characterized by XPS and the Ni-P coating by XPS and SEM. The electrochemical study did not show any real mechanism changes compared to the Ni-P deposition on a conductive surface.

2014 ◽  
Vol 2014 ◽  
pp. 1-10 ◽  
Author(s):  
Olawale Olarewaju Ajibola ◽  
Daniel T. Oloruntoba ◽  
Benjamin O. Adewuyi

This work examined effects of hard surface polishing grits and activation on electroless-nickel (EN) plating on cast aluminium alloy substrates in sodium hypophosphite baths. As-received aluminium alloy sample sourced from automobile hydraulic brake master cylinder piston was melted in electric furnace and sand cast into rod. The cast samples were polished using different grits (60 μm–1200 μm) before plating. The effects on adhesion, appearance, and quantity of EN deposits on substrates were studied. Observation shows that the quantity of EN deposit is partly dependent on the alloy type and roughness of the surface of the substrates, whereas the adhesion and brightness are not solely controlled by the degree of surface polishing. The best yield in terms of adhesion and appearance was obtained from the activation in zincate and palladium chloride solutions. Higher plating rates (g/mm2/min) of 3.01E-05, 2.41E-05, and 2.90E-05 were obtained from chromate, zincate, and chloride than 8.49E-06, 8.86E-06, and 1.69E-05 as obtained from HCl etched, NaOH, and H2O activated surfaces, respectively.


2020 ◽  
Vol 32 (6) ◽  
pp. 1384-1392
Author(s):  
N. M'hanni ◽  
M. Galai ◽  
T. Anik ◽  
M. Ebn Touhami ◽  
E.H. Rifi ◽  
...  

The autocatalytic nickel bath uses sodium hypophosphite as a reducing agent, sodium citrate as a complexing agent and sodium acetate as an accelerator. The effect of calix[4]arene molecule type H4L named (dicarboxylic acid p-tert-butylcalix[4]arene) was studied and used at various concentrations of 10-3 to 10-6 M to improve the microstructure, the microhadness and properties of nickel deposit obtained. The effect of varying the concentration of H4L, on the deposition rate, the composition, the microstructure and morphology of chemical deposition was studied. The results showed that depending on the concentration of calix[4]arene, the deposition rate decreases from 11, to 7.75 μm/h. The microstructure and microhardness improves significantly at a concentration of 10-6 M of additive. It was also shown that the coating obtained is adherent and compact and the chemical bath has become more stable in the presence of calix[4]arenic additives. Indeed, in both cases, the nickel content decreased with the addition of concentration. This decrease of nickel content might be related to the increase of deposition rate depending on the concentration. The X-ray diffraction analysis revealed peak intensification in the {111} orientation of plane in the presence of a concentration of 10-6 M; this may be in agreement with the results of metallographic study which showed that the coatings are adherent and have a good resistance. Hence, the Vickers microhardness of deposited coatings has a better value (376 HV) at the concentration 10-6 M. The corrosion resistance in 3% NaCl solution has been proven at the same concentration as found. Finally, the cyclic voltammetry and electrochemical impedance spectroscopic studies revealed that the additive strongly influences the cathodic process and affects slightly oxidation of hypophosphite.


2019 ◽  
Vol 97 (5) ◽  
pp. 230-236
Author(s):  
G. P. da Silva ◽  
R. N. de Lima ◽  
F. J. N. Santos ◽  
F. P. S. de Menezes ◽  
L. P. L. Morais ◽  
...  

2018 ◽  
Vol 72 (8) ◽  
pp. 1881-1888
Author(s):  
Mihaela Dochia ◽  
Monica Pustianu ◽  
Cristian Moisă ◽  
Dorina Chambre ◽  
Simona Gavrilaş

2011 ◽  
Vol 233-235 ◽  
pp. 2739-2742
Author(s):  
C.G. Zhang ◽  
Zheng Fang Shi ◽  
J. Miao

There were carried on experiment in zinc sulfate and selenite sodium electrolyte solution. To further studying the influence of the ZnSe films ingredient and the appearance influence of electrochemical formation ZnSe thin films, the deposition parameters, which are the pH, Zn2+/SeO32- molar ratio, complexing agent sodium citrate, bath temperature and current density, are studied by the orthogonal experiment, the influence on Zn of the parameters from strong to weak are attained.


2015 ◽  
Vol 2015 ◽  
pp. 1-17 ◽  
Author(s):  
Galip Akay ◽  
Burak Calkan

Monolithic nanostructured metallic porous structures with a hierarchy of pore size ranging from ca. 10 μm to 1 nm are processed for use as microreactors. The technique is based on flow induced electroless deposition of metals on a porous template known as PolyHIPE Polymer. The process is conducted in a purpose built flow reactor using a processing protocol to allow uniform and efficient metal deposition under flow. Nickel chloride and sodium hypophosphite were used as the metal and reducing agent, respectively. Electroless deposition occurs in the form of grains with a composition ofNixPyin which the grain size range was ca. 20–0.2 μm depending on the composition of the metal deposition solution. Structure formation in the monoliths starts with heat treatment above 600°C resulting in the formation of a 3-dimensional network of capillary-like porous structures which form the walls of large arterial pores. These monoliths have a dense but porous surface providing mechanical strength for the monolith. The porous capillary-like arterial pore walls provide a large surface area for any catalytic activity. The mechanisms of metal deposition and nanostructure formation are evaluated using scanning electron microscopy, energy dispersive X-ray analysis, XRD, BET-surface area, and mercury intrusion porosimetry.


2013 ◽  
Vol 537 ◽  
pp. 265-268
Author(s):  
Zhao An ◽  
Ming Ya Li ◽  
Nian Hao Ge ◽  
Xiao Ying Li ◽  
Qiu Fan Li ◽  
...  

In this paper, the method of electroless deposition of nickel-phosphorous composite coating on the sample surface is employed. The effect of the complexing agent ratio on the surface morphology and phase composition of nickel-phosphorus coating when the main salt and reducing agent concentration unchanged has been studied. The influence of heat treatment on properties and microstructure of coatings are also investigated. Experimental results show that in the case of salt and reducing agent concentration unchanged, complexing agent concentration has strong effect on the morphology of the coatings and the crystal structure of the composite coating. During heat treatment, the morphology of the composite coating changed significantly, and the hardness was improved a certain degree for all the samples, which is related to the precipitation of Ni3P.


2014 ◽  
Vol 953-954 ◽  
pp. 1045-1048
Author(s):  
Guo Feng Ma ◽  
Heng Ye ◽  
Hong Lin Zhang ◽  
Chun Lin He ◽  
Li Na Sun

The Ag-assisted electroless etching of p-type silicon substrate in HF/H2O2solution at room temperature was investigated. In this work, the effects of HF, H2O2and their volume ratio on morphology and growth of p-type silicon substrate surface by using metal assisted etching were investigated in order to produce a highly efficient antireflecting structure. The Ag metal particles were deposited onto Si wafer by electroless deposition from a metal salt solution including HF. The experimental results show that the growth rate and morphology of the pores formed on the Ag metalized Si surfaces are strongly dependent on the volume ratio of HF and H2O2.


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