scholarly journals Deterministic control of thin film thickness in physical vapor deposition systems using a multi-aperture mask

2005 ◽  
Vol 13 (7) ◽  
pp. 2731 ◽  
Author(s):  
John Arkwright ◽  
Ian Underhill ◽  
Nathan Pereira ◽  
Mark Gross
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Thin Film Thickness ◽  
Deterministic Control

scholarly journals Simulation and Optimization of Film Thickness Uniformity in Physical Vapor Deposition

Coatings ◽  
2018 ◽  
Vol 8 (9) ◽  
pp. 325 ◽  
Author(s):  
Ben Wang ◽  
Xiuhua Fu ◽  
Shigeng Song ◽  
Hin Chu ◽  
Desmond Gibson ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Thickness Distribution ◽  
Large Area ◽  
Thickness Uniformity ◽  
Simulation And Optimization ◽  
Material Sources ◽  
Good Agreement

Optimization of thin film uniformity is an important aspect for large-area coatings, particularly for optical coatings where error tolerances can be of the order of nanometers. Physical vapor deposition is a widely used technique for producing thin films. Applications include anti-reflection coatings, photovoltaics etc. This paper reviews the methods and simulations used for improving thin film uniformity in physical vapor deposition (both evaporation and sputtering), covering characteristic aspects of emission from material sources, projection/mask effects on film thickness distribution, as well as geometric and rotational influences from apparatus configurations. Following the review, a new program for modelling and simulating thin film uniformity for physical vapor deposition was developed using MathCAD. Results from the program were then compared with both known theoretical analytical equations of thickness distribution and experimental data, and found to be in good agreement. A mask for optimizing thin film thickness distribution designed using the program was shown to improve thickness uniformity from ±4% to ±0.56%.

Organic thin film thickness-dependent photocurrents polarity in graphene heterojunction phototransistor

Carbon ◽  
2021 ◽  
Vol 178 ◽  
pp. 506-514
Author(s):  
Meiyu He ◽  
Jiayue Han ◽  
Xingwei Han ◽  
Jun Gou ◽  
Ming Yang ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Organic Thin Film ◽  
Thin Film Thickness

scholarly journals Precise control of Jeff=12 magnetic properties in Sr2IrO4 epitaxial thin films by variation of strain and thin film thickness

2020 ◽  
Vol 102 (21) ◽  
Author(s):  
Stephan Geprägs ◽  
Björn Erik Skovdal ◽  
Monika Scheufele ◽  
Matthias Opel ◽  
Didier Wermeille ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetic Properties ◽  
Film Thickness ◽  
Epitaxial Thin Films ◽  
Thin Film Thickness ◽  
Precise Control

scholarly journals Optimization of Fiber Bragg Gratings Inscribed in Thin Films Deposited on D-Shaped Optical Fibers

Sensors ◽  
2021 ◽  
Vol 21 (12) ◽  
pp. 4056
Author(s):  
José Javier Imas ◽  
Carlos R. Zamarreño ◽  
Ignacio del Villar ◽  
Ignacio R. Matías
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Optical Fibers ◽  
Flat Surface ◽  
Sno2 Thin Film ◽  
Thin Film Thickness ◽  
A Value ◽  
Surrounding Refractive Index ◽  
Reflected Power ◽  
Fabrication Parameters

A fiber Bragg grating patterned on a SnO2 thin film deposited on the flat surface of a D-shaped polished optical fiber is studied in this work. The fabrication parameters of this structure were optimized to achieve a trade-off among reflected power, full width half maximum (FWHM), sensitivity to the surrounding refractive index (SRI), and figure of merit (FOM). In the first place, the influence of the thin film thickness, the cladding thickness between the core and the flat surface of the D-shaped fiber (neck), and the length of the D-shaped zone over the reflected power and the FWHM were assessed. Reflected peak powers in the range from −2 dB to −10 dB can be easily achieved with FWHM below 100 pm. In the second place, the sensitivity to the SRI, the FWHM, and the FOM were analyzed for variations of the SRI in the 1.33–1.4 range, the neck, and the thin-film thickness. The best sensitivities theoretically achieved for this device are next to 40 nm/RIU, while the best FOM has a value of 114 RIU−1.

Influence of ion beam parameters onto two-dimensional optical thin film thickness distributions deposited by ion beam sputtering

2019 ◽  
Vol 682 ◽  
pp. 109-120 ◽  
Author(s):  
Wjatscheslaw Sakiew ◽  
Stefan Schrameyer ◽  
Marco Jupé ◽  
Philippe Schwerdtner ◽  
Nick Erhart ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Ion Beam ◽  
Two Dimensional ◽  
Ion Beam Sputtering ◽  
Thin Film Thickness ◽  
Optical Thin Film ◽  
Beam Sputtering ◽  
Beam Parameters

Effect of Film Thickness on Fatigue Strength of TiAl Alloy Coated with TiAlN Film at Elevated Temperature

2005 ◽  
Vol 297-300 ◽  
pp. 1446-1451 ◽  
Author(s):  
Takeshi Kasuya ◽  
Hideto Suzuki
Keyword(s):  
Thin Film ◽  
Fatigue Strength ◽  
Film Thickness ◽  
Thick Film ◽  
Physical Vapor Deposition ◽  
Tial Alloy ◽  
Testing Machine ◽  
Intermetallic Alloy ◽  
Fracture Control ◽  
The Difference

The fatigue strength of TiAl intermetallic alloy coated with TiAlN film was studied in vacuum at 1073K using a SEM-servo testing machine. In addition, three kinds of TiAlN films were given by physical vapor deposition (1, 3, and 10μ m). The fatigue strength of 3μ m was highest. Also, the fatigue strength of 1μ m was lowest. From this result, existence of optimum film thickness was suggested because the difference of fatigue strength arose in each film thickness. The justification for existence of optimum film thickness is competition of 45-degree crack and 90-degree crack. The 45-degree crack is phenomenon seen in the thin film (1μ m), and is caused by plastic deformation of TiAl substrate. The 45-degree crack is the factor of the fatigue strength fall by the side of thin film. In contrast, the 90-degree crack is phenomenon in the thick film (10μ m), and is caused as result of reaction against load to film. The 90-degree crack is the factor of the fatigue strength fall by the side of thick film. In conclusion, the optimum film thickness can perform meso fracture control, and improves fatigue strength.

scholarly journals CVD and PVD coating process modelling by using artificial neural networks

2012 ◽  
Vol 1 (1) ◽  
pp. 46 ◽  
Author(s):  
Amir Mahyar Khorasani ◽  
Mohammad Reza Solymany yazdi ◽  
Mehdi Faraji ◽  
Alex Kootsookos
Keyword(s):  
Thin Film ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Chemical Vapor ◽  
Film Coating ◽  
Deposition Process ◽  
Thin Film Coating ◽  
Mlp Neural Network ◽  
Titanium Thin Film ◽  
Pvd Coating

Thin-film coating plays a prominent role on the manufacture of many industrial devices. Coating can increase material performance due to the deposition process. Having adequate and precise model that can predict the hardness of PVD and CVD processes is so helpful for manufacturers and engineers to choose suitable parameters in order to obtain the best hardness and decreasing cost and time of industrial productions. This paper proposes the estimation of hardness of titanium thin-film layers as protective industrial tools by using multi-layer perceptron (MLP) neural network. Based on the experimental data that was obtained during the process of chemical vapor deposition (CVD) and physical vapor deposition (PVD), the modeling of the coating variables for predicting hardness of titanium thin-film layers, is performed. Then, the obtained results are experimentally verified and very accurate outcomes had been attained.

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