Surface Modification of Polyetheretherketone by Helium/nitrogen and Nitrous Oxide Plasma Enhanced Chemical Vapour Deposition

2014 ◽  
Vol 33 (2) ◽  
pp. 147-153
Author(s):  
Stanisława Kluska ◽  
Elżbieta Pamuła ◽  
Stanisława Jonas ◽  
Zbigniew Grzesik
Keyword(s):  
Free Energy ◽  
Surface Free Energy ◽  
Photoelectron Spectroscopy ◽  
Sessile Drop ◽  
Chemical Vapour ◽  
Chemical Vapor ◽  
Morphological Characterization ◽  
Polar Component ◽  
Force Microscopy ◽  
Atomic Force

AbstractThe surface of the polyetheretherketone (PEEK) samples was modified by the plasma enhanced chemical vapor deposition (PECVD) in the mixture of He and N2 as well as in the N2O atmosphere. Morphological characterization of the PEEK as well as its surface roughness, chemical structure, and surface free energy were investigated by atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and sessile drop technique, respectively. The highest increase in the polar component of the total surface energy was observed for PEEK modified by He+N2 plasma, which correlated with significant increase in the concentration of oxygen and nitrogen-containing chemical functionalities as revealed by XPS. For PEEK submitted to N2O plasma treatment significant changes in surface topography and increase in roughness were observed, but changes in surface chemistry and surface free energy were mild.

INFLUENCE OF SURFACE FREE ENERGY ON ADHESION OF CrN THIN FILM DEPOSITED BY AIP METHOD

2012 ◽  
Vol 06 ◽  
pp. 509-514 ◽  
Author(s):  
HIKARU NOUDA ◽  
HIROATSU ODA ◽  
DAISUKE YONEKURA ◽  
RI-ICHI MURAKAMI
Keyword(s):  
Thin Film ◽  
Free Energy ◽  
Surface Free Energy ◽  
High Speed ◽  
Gas Flow ◽  
Sessile Drop ◽  
Ion Bombardment ◽  
Polar Component ◽  
Scratch Testing ◽  
The Relationship

The purpose of this study is to examine the relationship between adhesion of CrN thin film and the surface free energy of substrate. CrN film was deposited on JIS SKH2 high speed tool steel by arc ion plating (AIP) method. The surface free energy of the substrate was measured with/without ion bombardment process using nitrogen and argon gas under various gas flow rate before CrN deposition. The surface free energy was measured by the sessile drop method using distilled water and methylene iodide. The adhesion was evaluated by scratch testing and the relationship between a critical load and the surface free energy in each ion bombardment condition was discussed. As a result, it was found that the adhesion increased with decreasing the surface free energy, in particular the polar component strongly affects the adhesion.

Biopolymer Blends as Potential Biomaterials and Cosmetic Materials

2013 ◽  
Vol 583 ◽  
pp. 95-100 ◽  
Author(s):  
Alina Sionkowska ◽  
Katarzyna Lewandowska ◽  
A. Planecka ◽  
P. Szarszewska ◽  
K. Krasinska ◽  
...  
Keyword(s):  
Contact Angle ◽  
Free Energy ◽  
Surface Free Energy ◽  
Silk Fibroin ◽  
High Surface ◽  
Force Microscopy ◽  
Angle Measurements ◽  
Atomic Force ◽  
Polymeric Blends ◽  
Contact Angle Measurements

Blends of two polymer, namely chitosan with silk fibroin or partially hydrolysed polyacrylamide (HPAM) were prepared. The surface properties of chitosan/silk fibroin and chitosan/HPAM blended films were investigated using the technique of Atomic Force Microscopy (AFM) and by means of contact angle measurements allowing the calculation of surface free energy. Measurements of the contact angle for diiodomethane (D), and glycerol (G) on the surface of chitosan films and chitosan/silk fibroin films were made and surface free energy was calculated. It was found that chitosan/silk fibroin blend surface is enriched in high surface energy component i.e. silk fibroin. The surface roughness of chitosan, silk fibroin, HPAM, chitosan/silk fibroin and chitosan/HPAM blended films differs with the composition of the blend. Film-forming polymeric blends can be potentially used as biomaterials and cosmetic materials.

scholarly journals Cleaning of graphene surfaces by low-pressure air plasma

2018 ◽  
Vol 5 (5) ◽  
pp. 172395 ◽  
Author(s):  
Phuong Viet Pham
Keyword(s):  
Photoelectron Spectroscopy ◽  
Graphene Film ◽  
Chemical Vapour ◽  
Optical Microscope ◽  
Pristine Graphene ◽  
Air Plasma ◽  
Graphene Surface ◽  
Force Microscopy ◽  
Atomic Force ◽  
The One

The polymer residues still present on a chemical vapour-deposited graphene surface after its wet transfer by the poly(methyl methacrylate) method to the arbitrary substrates, tend to cause problems such as electrical degradation and unwanted intentional doping. In this study, by using an effective cleaning method for the graphene surface by air-assisted plasma, the graphene surface was cleaned significantly without damaging the graphene network, which resulted in the reduction (approx. 71.11%) of polymer residues on its surface. The analysis reveals that this approach reduced the D-band (impurities, polymer residues) formation while maintaining the π-bonding of the graphene, which affects conductivity. By characterizations of the optical microscope, Raman spectroscopy and atomic force microscopy, we obtained a significantly cleaner graphene surface (roughness of 4.1 nm) compared to pristine graphene (roughness of 1.2 nm) on a SiO 2 substrate. In addition, X-ray photoelectron spectroscopy data revealed that the C1s peak of the air-assisted graphene film was higher than the one of a pristine graphene film, indicating that a cleaner graphene surface was obtained.

Wettability of plasma-polymerized vinyltriethoxysilane film

2009 ◽  
Vol 63 (4) ◽  
Author(s):  
Soňa Lichovníková ◽  
Jan Studýnka ◽  
Vladimír Čech
Keyword(s):  
Free Energy ◽  
Surface Free Energy ◽  
Sessile Drop ◽  
Geometric Mean ◽  
Polar Component ◽  
Hydroxyl Groups ◽  
Sessile Drop Technique ◽  
Plasma Polymers ◽  
Drop Technique ◽  
Deposition Conditions

AbstractPlasma-polymerized films of vinyltriethoxysilane were surface characterized using the sessile drop technique. The surface free energy and its components were evaluated using the Owens-Wendt-Kaelble geometric mean method, Wu harmonic mean method, and van Oss, Chaudhury, and Good acid-base theory. Influence of deposition conditions on the surface free energy was demonstrated in the study. Improved wettability of the films was related to the diminished concentration of apolar methyl groups in plasma polymers. An increased concentration of carbonyl and hydroxyl groups resulted in a very small improvement of the polar component.

Measurement of the Surface Free Energy of Streptavidin Crystals by Atomic Force Microscopy

Langmuir ◽  
2003 ◽  
Vol 19 (7) ◽  
pp. 2908-2912 ◽  
Author(s):  
Annalisa Relini ◽  
Silvia Sottini ◽  
Simone Zuccotti ◽  
Martino Bolognesi ◽  
Alessandra Gliozzi ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Free Energy ◽  
Surface Free Energy ◽  
Force Microscopy ◽  
Atomic Force

The effects of humidity and surface free energy on adhesion force between atomic force microscopy tip and a silane self-assembled monolayer film

2010 ◽  
Vol 25 (3) ◽  
pp. 556-562 ◽  
Author(s):  
Chien-Chao Huang ◽  
Lijiang Chen ◽  
Xiaohong Gu ◽  
Minhua Zhao ◽  
Tinh Nguyen ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Free Energy ◽  
Surface Free Energy ◽  
Adhesion Force ◽  
Capillary Condensation ◽  
Self Assembled Monolayer ◽  
Force Microscopy ◽  
Atomic Force ◽  
Rate Of Increase ◽  
Self Assembled

The relationship between atomic force microscopy probe-sample adhesion force and relative humidity (RH) at five different levels of surface free energy (γs) of an organic self-assembled monolayer (SAM) has been investigated. Different γs levels were achieved by exposing a patterned SiO2/CH3-terminated octyldimethylchlorosilane SAM sample to an ultraviolet (UV)/ozone atmosphere. A model consisting of the Laplace-Kelvin theory for capillary condensation for nanosized probe and probe-sample molecular interaction was derived to describe the adhesion force as a function of RH from 25 to 90% for different SAM γs values. The equations were solved analytically by using an equivalent curvature of the probe tip shape. Experimental results show that the adhesion force increases slightly with RH for nonpolar SAM. However, for polar SAM surfaces, it increases at first, reaches a maximum, and then decreases. Both the rate of increase and the maximum of the adhesion force with humidity are γs-dependent, which is in good agreement with theoretical prediction. The large rise in the adhesion force in this RH range is due to the capillary force.

Blue/White Emission from Hydrogenated Amorphous Silicon Carbide Films Prepared by PECVD

2009 ◽  
Vol 1153 ◽  
Author(s):  
Volodymyr Ivashchenko ◽  
Andrey Vasin ◽  
L. A. Ivashchenko ◽  
P. L. Skrynskyy
Keyword(s):  
Silicon Carbide ◽  
Photoelectron Spectroscopy ◽  
Chemical Vapor ◽  
Substrate Bias ◽  
Double Peak ◽  
Hydrogenated Silicon ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
The One

AbstractPhotoluminescence (PL) from hydrogenated silicon carbide (SiC:H) films is studied at room temperature. The films were deposited by plasma-enhanced chemical vapor (PECVD) technique with and without substrate bias using methyltrichlorosilane as a main precursor. After the deposition the samples were annealed at various temperatures in vacuum. The films were characterized by atomic force microscopy (AFM), Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD). The samples deposited without substrate bias (series A) were amorphous, whereas the samples deposited with negative substrate bias -100V (series B) were nanocrystalline. The one-peak (470 nm) and double-peak (415 and 437 nm) PL structures of the as-deposited samples A and B were observed, respectively. Annealing strongly enhanced intensity of PL of the samples B and trandformed PL spectrum from double-peak into broad featureless band with intensity at about 470 nm. The blue PL in as-deposited films B is supposed to be assigned to the radiative recombination in the sites located at the nanocrystallite surface, whereas the photo excitation of carries mostly occurs in nanocrystallite cores. A further increase in annealing temperature causes hydrogen effusion, which leads to an increase of the concentration of non-raidative recombination centers associated with dangling-bonds and as a result, to the quenching of PL.

Surface chemical composition and roughness as factors affecting the wettability of thermo-mechanically modified oak (Quercus robur L.)

Holzforschung ◽  
2018 ◽  
Vol 72 (11) ◽  
pp. 993-1000 ◽  
Author(s):  
Agnieszka Laskowska ◽  
Janusz W. Sobczak
Keyword(s):  
Free Energy ◽  
Surface Free Energy ◽  
Photoelectron Spectroscopy ◽  
Sessile Drop ◽  
Glassy Polymers ◽  
Work Of Adhesion ◽  
Densified Wood ◽  
Factors Affecting ◽  
X Ray ◽  
Densification Temperature

AbstractEuropean oak wood (W) was thermo-mechanically modified (TM) via densifying at 100 and 150°C and the surface properties of the TMW were investigated. The contact angle (CA) of the wood with the reference liquids water and diiodomethane was determined using the sessile drop method. The surface free energy of the TMW on tangential sections within the first 60 s after applying a drop was analyzed. The roughness parameters Ra and Rz parallel (‖) and perpendicular (⊥) to the grain were investigated. The wettability analysis showed that densified wood had a higher CA and lower work of adhesion and surface free energy than non-densified wood. An X-ray photoelectron spectroscopy [XPS or electron spectroscopy for chemical analysis (ESCA)] analysis showed that the oxygen to carbon atoms ratio (O/C ratio) of densified wood surface was lower than that of non-densified wood. The carbon C1-C2 atoms ratio (C1/C2 ratio) increased with increasing TM temperature. The results were interpreted as being that extractives migrate to the surface and amorphous and glassy polymers, i.e. lignin and hemicelluloses, in wood are rearranged. Increasing densification temperature makes TMW surfaces more hydrophobic.

Determination of the Surface Free Energy of Crystalline and Amorphous Lactose by Atomic Force Microscopy Adhesion Measurement

2006 ◽  
Vol 23 (2) ◽  
pp. 401-407 ◽  
Author(s):  
Jianxin Zhang ◽  
Stephen Ebbens ◽  
Xinyong Chen ◽  
Zheng Jin ◽  
Shen Luk ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Free Energy ◽  
Surface Free Energy ◽  
Force Microscopy ◽  
Atomic Force ◽  
Adhesion Measurement ◽  
Amorphous Lactose
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