Ferroelectricity of Lanthanum-Modified Lead-Titanate Thin Films Deposited on Nickel Alloy Electrodes

1991 ◽  
Vol 243 ◽  
Author(s):  
Toshio Ogawa ◽  
Satoshi Shindou ◽  
Atsuo Senda ◽  
Tohru Kasanami
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Nickel Alloy ◽  
Lead Titanate ◽  
Crystal Orientation ◽  
Rf Magnetron Sputtering ◽  
Alloy Electrode ◽  
Thin Film Layer ◽  
Film Layer

AbstractLanthanum-modified lead-titanate (Pbo.85Lao.1Ti03) thin films were fabricated by rf magnetron sputtering on various kinds of substrates such as single-crystal MgO (100), r-plane sapphire and SI (100) with an MgO thin film layer. All the films were able to be evaluated using nickel alloy electrodes which possess low reactivity with PbO, excellent heat-resistance and oxidation-resistance. The quality of these films was affected by the kind of substrate and crystal orientation of nickel alloy electrode used. Furthermore, by controlling the crystal orientation of the alloy electrode, films on Si (100) with an MgO (100) layer showed good ferroelectricity.

Electrical and Optical Properties of ZnO:Ag Thin-Films Depend on Lamination Formation by DC Magnetron Sputtering

2015 ◽  
Vol 1110 ◽  
pp. 211-217
Author(s):  
Jin Woo Lee ◽  
Yun Hae Kim ◽  
Chang Wook Park
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Stacking Sequence ◽  
Flat Panel Displays ◽  
Oxide Systems ◽  
Thin Film Layer ◽  
Tin Oxides ◽  
Impurity Doped ◽  
Indium Oxides ◽  
Film Layer

Transparent conductive oxides such as Impurity doped indium oxides, tin oxides, zinc oxide systems are widely used in the field of optoelectronics such as Photo voltaic solar cells, Flat panel displays. Recently in case of the ZnO / Ag Multilayer thin films, doping Ag films on the ZnO layer and ZnO deposited on top of it a way that has been used. However, if thin film applied to the semiconductor, because of lamination of various forms, characteristics of stacking sequence and thin film layer is a need for research. In this study, using DC magnetron sputteirng how the stacking sequence of the film and the transparent operation of various process variables, the possibility of the application to electronic devices was confirmed.

PZT Thin Films Deposited by RF Magnetron Sputtering

2013 ◽  
Vol 302 ◽  
pp. 8-13
Author(s):  
Shun Fa Hwang ◽  
Wen Bin Li
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Annealing Temperature ◽  
Bottom Electrode ◽  
Rf Sputtering ◽  
Rf Magnetron Sputtering ◽  
Pzt Thin Films ◽  
Pzt Film ◽  
Pzt Thin Film

PZT thin film was fabricated by using RF-sputtering process, and platinum was used as bottom electrodes. The sputtering gases were Ar：O2＝25：0 sccm, Ar：O2＝20：5 sccm, or Ar：O2＝15：10 sccm. After sputtering, the PZT film was annealed for 5 minutes under O2 gas environment and at the temperature of 600 0C, 650 0C, 700 0C or 750 0C. To judge the quality of the deposited PZT film, its physical properties and electric properties were evaluated. The results indicate that the best crystallization temperature of PZT thin film is about 700 0C. Also, the roughness of the PZT thin film becomes larger with the increasing of annealing temperature. By adding more oxygen in the sputtering gas, one could have better crystallization of the PZT film. As for the electrical properties, the leakage current of PZT thin film increases with the increasing of annealing temperature. Furthermore, the ferroelectric property is affected by the crystallization amount of perovskite, the thickness of PZT thin film, and the diffusion situation between the bottom electrode and the PZT film.

Electrical Properties Dependence on Substrate Temperature of Sputtered ZnO Nanoparticles Thin Films on Teflon Substrates

2013 ◽  
Vol 795 ◽  
pp. 403-406 ◽  
Author(s):  
Nur Sa’adah Muhamad Sauki ◽  
Sukreen Hana Herman ◽  
Mohd Hanafi Ani ◽  
Mohamad Rusop
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Substrate Temperature ◽  
Rf Magnetron Sputtering ◽  
Zno Thin Films ◽  
Zno Thin Film ◽  
X Ray Diffraction ◽  
X Ray ◽  
Current Voltage

Zinc oxide (ZnO) thin films were deposited on teflon substrates by RF magnetron sputtering at different substrate temperature. The effect of substrate temperature on ZnO thin films electrical and structural properties were examined using current-voltage (I-V) measurement, and x-ray diffraction (XRD) It was found that the electrical conductivity and resistivity of the ZnO thin film deposited at 40°C was the highest and lowest intensity accordingly. This was supported by the crystalline quality of the films from the x-ray diffraction (XRD) results. The XRD pattern showed that the ZnO thin film deposited at 40°C has the highest intensity with the narrowest full-width-at-half-maximum indicating that the film has the highest quality compared to other thin film.

scholarly journals Potentiostat Electro-Deposited Cuprous Oxide and Cupric Oxide Thin Films for Photovoltaic Use

2019 ◽  
Vol 16 (2) ◽  
pp. 6624-6633
Author(s):  
T. P. Plateau ◽  
M. T. Islam ◽  
N. Islam``
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Cuprous Oxide ◽  
Cupric Oxide ◽  
Potential Difference ◽  
Solution Temperature ◽  
Good Efficiency ◽  
Thin Film Layer ◽  
Film Layer ◽  
Cu2o Thin Film

To withstand the rising demand for energy while fuel and chemical energy are becoming rare, the development in the production of solar energy has become a necessity. There is a variety of solar cells; among them, thin-film photovoltaics is more popular because of low-cost production and good-efficiency. Nowadays, copper oxide has become popular to make thin film layers like CZTS, CIGS, etc. Unfortunately, the efficiency of these thin films is less than 20%. In order to obtain better efficacy, an investigation of the layers of thin films is needed. This research discussed the properties of copper and its oxides. In case of making the thin film layers, potentiostat electro-deposition was the chosen method where bath composition of CuSO4.5H2O solution, temperature, time, potential difference were the variable parameters. The best-deposited layers were obtained in 0.2 M concentration, 40 minutes, -0.5 V potential difference and 65oC. Hence, physical properties like thickness and hardness, and characterisation properties like X-ray diffractometry (XRD), scanning electron microscopy (SEM), UV-Vis spectrometry are observed to compare cupric oxide (CuO) and cuprous oxide (Cu2O) thin films. CuO thin film shows better stability and rigidity than the Cu2O thin film. But the thin film layer of cuprous oxide illustrates good homogeneity and nodular form. From the test mentioned above data, band gap has been measured for each deposited film, and the CuO thin film layer is raked out having a better band energy gap than the Cu2O thin film layer.

Measurements of Residual Stress in the Layers of Thin Film Micro-Gas Sensors

2000 ◽  
Vol 657 ◽  
Author(s):  
Youngman Kim ◽  
Sung-Ho Choo
Keyword(s):  
Thin Film ◽  
Mechanical Properties ◽  
Residual Stress ◽  
Gas Sensor ◽  
Gas Sensors ◽  
Micro Gas Sensor ◽  
Thin Film Layer ◽  
Film Layer ◽  
The Difference ◽  
Stress States

ABSTRACTThe mechanical properties of thin film materials are known to be different from those of bulk materials, which are generally overlooked in practice. The difference in mechanical properties can be misleading in the estimation of residual stress states in micro-gas sensors with multi-layer structures during manufacturing and in service.In this study the residual stress of each film layer in a micro-gas sensor was measured according to the five difference sets of film stacking structure used for the sensor. The Pt thin film layer was found to have the highest tensile residual stress, which may affect the reliability of the micro-gas sensor. For the Pt layer the changes in residual stress were measured as a function of processing variables and thermal cycling.

Dependence of Film Thickness on Properties of Al Doped ZnO Thin Films

2011 ◽  
Vol 194-196 ◽  
pp. 2305-2311
Author(s):  
Ying Ge Yang ◽  
Dong Mei Zeng ◽  
Hai Zhou ◽  
Wen Ran Feng ◽  
Shan Lu ◽  
...  
Keyword(s):  
Thin Films ◽  
Film Thickness ◽  
Electrical Parameter ◽  
Substrate Surface ◽  
Rf Magnetron Sputtering ◽  
Thickness Effect ◽  
Visible Range ◽  
Glass Substrates ◽  
Doped Zno

In this study high quality of Al doped ZnO (ZAO) thin films were prepared by RF magnetron sputtering on glass substrates at room temperature in order to study the thickness effect upon their structure, electrical and optical properties. XRD results show that the films are polycrystalline and with strongly preferred (002) orientation perpendicular to substrate surface whatever the thickness is. The crystallite size was calculated by Williamson-Hall method, while it increases as the film thickness increased. The lattice stress is mainly caused by the growth process. Hall measurements revealed electrical parameter very dependent upon thickness when the thickness of ZAO film is lower than 700 nm. The resistivity decreased and the carrier concentration and Hall mobility increases as the film thickness increased. When film thickness becomes larger, only a little change in the above properties was observed. All the films have high transmittance above 90% in visible range. Red shift of the absorption edge was observed as thickness increased. The optical energy bandgap decreased from 3.41eV to 3.30 eV with the increase of film thickness.

PROPERTIES OF ALL-SOLID-STATE LITHIUM-ION RECHARGEABLE BATTERIES DEPOSITED BY RF MAGNETRON SPUTTERING

2013 ◽  
Vol 27 (22) ◽  
pp. 1350156 ◽  
Author(s):  
R. J. ZHU ◽  
Y. REN ◽  
L. Q. GENG ◽  
T. CHEN ◽  
L. X. LI ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Solid State ◽  
Magnetron Sputtering ◽  
Coulombic Efficiency ◽  
Electronic Conductivity ◽  
Lithium Ion ◽  
Rf Magnetron Sputtering ◽  
Rechargeable Batteries ◽  
Voltage Range

Amorphous V 2 O 5, LiPON and Li 2 Mn 2 O 4 thin films were fabricated by RF magnetron sputtering methods and the morphology of thin films were characterized by scanning electron microscopy. Then with these three materials deposited as the anode, solid electrolyte, cathode, and vanadium as current collector, a rocking-chair type of all-solid-state thin-film-type Lithium-ion rechargeable battery was prepared by using the same sputtering parameters on stainless steel substrates. Electrochemical studies show that the thin film battery has a good charge–discharge characteristic in the voltage range of 0.3–3.5 V, and after 30 cycles the cell performance turned to become stabilized with the charge capacity of 9 μAh/cm2, and capacity loss of single-cycle of about 0.2%. At the same time, due to electronic conductivity of the electrolyte film, self-discharge may exist, resulting in approximately 96.6% Coulombic efficiency.

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