Temperature Dependence of the Photoinduced Degradation and Annealing in a-Si:H
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ABSTRACTWe investigated the temperature dependence of the production and annealing kinetics of the light induced defect states in a:Si:H by electron spin resonance (ESR). At low temperatures (T ∼ 25 K) the silicon dangling bond production is about half as efficient as it is at 300 K. Defects, which are created below about 100 K, almost entirely anneal at room temperature. A sample of a-Si:H, which is subjected to several photo-excitation and annealing cycles, shows a very slow increase of both the degraded and annealed defect densities. The difference in the spin densities between the annealed and degraded states decreases with an increasing number of degradation/annealing cycles.
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1961 ◽
Vol 262
(1309)
◽
pp. 207-218
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1993 ◽
Vol 8
(9)
◽
pp. 2282-2287
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