scholarly journals Low-temperature technology and physical processes in green thin-film phosphor Zn2GeO4-Mn

2001 ◽  
Vol 667 ◽  
Author(s):  
V. Bondar ◽  
S. Popovich ◽  
T. Felter ◽  
J. Wager
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Low Temperature ◽  
Esr Spectra ◽  
Photoluminescence Excitation ◽  
Manganese Ions ◽  
Physical Processes ◽  
Excitation Spectra ◽  
Lower Temperature ◽  
Electro Luminescence

ABSTRACTThin-film Zn2GeO4:Mn phosphors with lower temperature of crystallization and potentially compatible with industrial technologies were investigated. The technology of thin films synthesis has been developed and their structure and crystal parameters have been investigated. Photoluminescence excitation spectra, photoconductivity, temperature dependencies and ESR-spectra of manganese ions were studied. A mechanism for luminescence in this phosphor has been proposed. Results are presented of cathodo- and electro-luminescence of thin film structures of Zn2GeO4:Mn.

The Relation of Thin Film Electroluminescence and Photoluminescence Excitation Spectra

1989 ◽  
pp. 105-108
Author(s):  
Zhilin Zhang ◽  
Zhuotong Li ◽  
Biao Mei ◽  
Xueyin Jiang ◽  
Peifang Wu ◽  
...  
Keyword(s):  
Thin Film ◽  
Photoluminescence Excitation ◽  
Excitation Spectra

Thermodynamic Analysis of Physical Vapor Deposition (PVD) Inorganic Thin Films on Low Temperature Cofired Ceramic (LTCC)

2016 ◽  
Vol 2016 (CICMT) ◽  
pp. 000175-000182
Author(s):  
Carol Putman ◽  
Rachel Cramm Horn ◽  
Ambrose Wolf ◽  
Daniel Krueger
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
High Reliability ◽  
Interface Energy ◽  
Molecular Stability ◽  
Thin Film Adhesion ◽  
Inorganic Thin Films

Abstract Low temperature cofired ceramic (LTCC) has been established as an excellent packaging technology for high reliability, high density microelectronics. The functionality and robustness of rework has been increased through the incorporation of a Physical Vapor Deposition (PVD) thin film Ti/Cu/Pt/Au metallization. PVD metallization is suitable for RF (Radio Frequency) applications as well as digital systems. Adhesion of the Ti “adhesion layer” to the LTCC as-fired surface is not well understood. While past work has established extrinsic parameters for delamination mechanisms of thin films on LTCC substrates, there is incomplete information regarding the intrinsic (i.e. thermodynamic) parameters in literature. This paper analyzes the thermodynamic favorability of adhesion between Ti, Cr, and their oxides coatings on LTCC (assumed as amorphous silica glass and Al2O3). Computational molecular calculations are used to determine interface energy as an indication of molecular stability over a range of temperatures. The end result will expand the understanding of thin film adhesion to LTCC surfaces and assist in increasing the long-term reliability of the interface bonding on RF microelectronic layers.

Thermodynamic Analysis of Physical Vapor Deposited Inorganic Thin Films on Low Temperature Cofired Ceramic

2016 ◽  
Vol 13 (3) ◽  
pp. 95-101 ◽  
Author(s):  
Carol Putman ◽  
Rachel Cramm Horn ◽  
J. Ambrose Wolf ◽  
Daniel Krueger
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Low Temperature ◽  
Physical Vapor Deposition ◽  
High Reliability ◽  
Interface Energy ◽  
Film Adhesion ◽  
Molecular Stability ◽  
Thin Film Adhesion ◽  
Inorganic Thin Films

Low temperature cofired ceramic (LTCC) has been established as an excellent packaging technology for high-reliability, high-density microelectronics. The functionality and robustness of rework have been increased through the incorporation of a physical vapor deposition (PVD) thin film Ti/Cu/Pt/Au metallization. PVD metallization is suitable for radio frequency (RF) applications as well as digital systems. Adhesion of the Ti “adhesion layer” to the LTCC as-fired surface is not well understood. Although previous work has established extrinsic parameters for delamination mechanisms of thin films on LTCC substrates, there is incomplete information regarding the intrinsic (i.e., thermodynamic) parameters in the literature. This article analyzes the thermodynamic favorability of adhesion between Ti, Cr, and their oxide coatings on LTCC (assumed as amorphous silica glass and Al2O3). Computational molecular calculations are used to determine interface energy as an indication of molecular stability between pair of materials at specific temperature. The end result will expand the understanding of thin film adhesion to LTCC surfaces and assist in increasing the long-term reliability of the interface bonding on RF microelectronic layers.

scholarly journals Highly conductive low-temperature combustion-derived transparent indium tin oxide thin film

2021 ◽  
Author(s):  
Longfei Song ◽  
Tony Schenk ◽  
Emmanuel Defay ◽  
Sebastjan Glinsek
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Low Temperature ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Thin Film ◽  
Low Temperature Combustion ◽  
Transparent Electronics ◽  
Temperature Combustion ◽  
Ito Thin Films

Highly conductive (conductivity 620 S cm−1) and transparent ITO thin films are achieved at low temperature (350 °C) through effective combustion solution processing via multistep coating. The properties show potential for next generation flexible and transparent electronics.

scholarly journals Comparison of Arc Erosive and Laser Beam Trimming of Thin Film Resistors

1977 ◽  
Vol 4 (3-4) ◽  
pp. 179-183 ◽  
Author(s):  
Zs. Illyefalvi-Vitéz
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Beam ◽  
Measuring Method ◽  
Optimal Conditions ◽  
Current Generator ◽  
Physical Processes ◽  
Laser Beam Machining ◽  
Arc Erosion ◽  
Thin Film Resistors

The physical processes of arc erosive micromachining and the influence of trimming on the parameters of resistors have been examined, and thin film resistors without trimming are compared with those trimmed by arc erosion and laser beam machining.In the paper a theoretical model for arc erosion of thin films is proposed. The optimal conditions of arc erosive trimming are determined. The shape of the cuts are recorded and examined. The applicability of arc erosive trimming with respect to stability is proved. A measuring method is introduced for resistors trimmed by arc erosion using a direct current generator.

Low-Temperature, Nontoxic Water-Induced Metal-Oxide Thin Films and Their Application in Thin-Film Transistors

2015 ◽  
Vol 25 (17) ◽  
pp. 2564-2572 ◽  
Author(s):  
Guoxia Liu ◽  
Ao Liu ◽  
Huihui Zhu ◽  
Byoungchul Shin ◽  
Elvira Fortunato ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Low Temperature ◽  
Metal Oxide ◽  
Thin Film Transistors ◽  
Oxide Thin Films ◽  
Metal Oxide Thin Films

Significant blue-shift in photoluminescence excitation spectra of Nd3+:LaF3 potential laser medium at low-temperature

2015 ◽  
Vol 47 ◽  
pp. 462-464 ◽  
Author(s):  
Ren Arita ◽  
Yuki Minami ◽  
Marilou Cadatal-Raduban ◽  
Minh Hong Pham ◽  
Melvin John Fernandez Empizo ◽  
...  
Keyword(s):  
Low Temperature ◽  
Blue Shift ◽  
Laser Medium ◽  
Photoluminescence Excitation ◽  
Excitation Spectra ◽  
Significant Blue Shift

Conductivity of Yittria-Stabilized Zirconia Nanostructure Electrolyte for Solid Oxide Fuel Cell Application by Using RF Magnetron Sputtering

2017 ◽  
Vol 268 ◽  
pp. 352-357
Author(s):  
S.Y. Jaffar ◽  
Yussof Wahab ◽  
Rosnita Muhammad ◽  
Z. Othaman ◽  
Zuhairi Ibrahim ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Stabilized Zirconia ◽  
Deposition Parameter ◽  
Deposition Parameters ◽  
Ysz Thin Film ◽  
Temperature Rate ◽  
Lower Temperature

Yttria-stabilized zirconia (YSZ) thin films were deposited successfully using RF magnetron sputtering. The substrate had been used are sapphire glass. A pure ceramic of Zr-Y is synthesized and processed into a planar magnetron target which is reactively sputtered with an Argon-Oxygen gas mixture to form Zr-Y-O nanostructure. The aim of this research is to study the conductivity and roughness YSZ thin film by using RF magnetron sputtering by varying the temperature deposition parameter. By lowering the YSZ thin film into nanostructure would enable for SOFC to be operate at lower temperature below 400°C. The YSZ nanostructure were controlled by varying the deposition parameters, including the deposition temperature and the substrate used. The crystalline of YSZ structure at 100W and temperature 300°C. The surface morphology of the films proved that at 300°C temperature rate deposition showed optimum growth morphology and density of YSZ thin films. Besides, the high deposition subtrate temperature affected the thickness of YSZ thin film at 80nm by using surface profiler. A higher rate of deposition is achievable when the sputtering mode of the Zr-Y target is metallic as opposed to oxide. YSZ is synthesizing to obtain the optimum thin film for SOFC application.

Facile patterning of amorphous indium oxide thin films based on a gel-like aqueous precursor for low-temperature, high performance thin-film transistors

2016 ◽  
Vol 4 (10) ◽  
pp. 2072-2078 ◽  
Author(s):  
Yuzhi Li ◽  
Linfeng Lan ◽  
Peng Xiao ◽  
Zhenguo Lin ◽  
Sheng Sun ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Low Temperature ◽  
Indium Oxide ◽  
Thin Film Transistors ◽  
High Performance ◽  
Oxide Thin Film ◽  
Oxide Thin Films ◽  
Indium Oxide Thin Film

Facile patterning of chloride-based precursor films for low-temperature, high performance indium oxide thin-film transistors.

Radiative Recombination in the Cu(In,Ga)Se2 Thin Films Irradiated with Hydrogen Ions

2019 ◽  
Vol 18 (03n04) ◽  
pp. 1940033
Author(s):  
O. Borodavchenko ◽  
V. Zhivulko ◽  
M. Yakushev ◽  
M. Sulimov
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Solid Solutions ◽  
Radiative Recombination ◽  
Energy Levels ◽  
Hydrogen Ions ◽  
Photoluminescence Excitation ◽  
Photoluminescence Spectra ◽  
Induced Defects ◽  
Irradiation Induced Defects

The irradiation-induced effects in Cu(In,Ca)Se2 thin films after irradiation with hydrogen ions with dose of [Formula: see text][Formula: see text]cm[Formula: see text] and different energies in the range of 2.5–10[Formula: see text]keV were studied. Irradiated and nonirradiated thin films were investigated by low-temperature (4.2[Formula: see text]K) photoluminescence and photoluminescence excitation methods. The appearance of intense bands at [Formula: see text][Formula: see text]eV and 0.77[Formula: see text]eV in the photoluminescence spectra may be related to radiative recombination on the irradiation-induced defects with deep energy levels in the bandgap of Cu(In,Ca)Se2 solid solutions. A possible nature of these defects and process of radiative recombination are discussed.

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