PMN-PT thin films: Electromechanical behaviour, polarisability and microstructure

2002 ◽  
Vol 748 ◽  
Author(s):  
N. J. Donnelly ◽  
G. Catalan ◽  
C. Morros ◽  
R. M. Bowman ◽  
J. M. Gregg ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Sol Gel ◽  
X Ray Diffraction ◽  
Lower Electrode ◽  
Three Point Bending ◽  
Force Microscopy ◽  
Atomic Force ◽  
Pt Films

ABSTRACTThin film capacitor structures of Pb(Mg1/3Nb2/3)O3 (PMN) - PbTiO3 (PT) were fabricated using pulsed laser deposition (PLD) on MgO{100} substrates using (La1/2,Sr1/2)CoO3 (LSCO) as a lower electrode. Crystallographic and dielectric characterisation confirmed perovskite relaxor-like behaviour. Measurements of the electrostrictive coefficients by in-situ X-ray diffraction, piezo-response atomic force microscopy and three point bending experiments showed both Q11 and Q13 to be comparable to accepted values for single crystals. However, for a given field, the electric field-induced strain in the thin films was much less than that of single crystal. This was clearly intimately linked to poor thin film polarisability. Previous work had shown sol-gel PMN-PT films to have significantly greater permittivities than PLD films, and a TEM investigation was undertaken to see if functional differences could be related to differences in microstructure, and hence if the functional and electromechanical properties of PLD films could be improved by attempting to replicate sol-gel microstructures.

scholarly journals Structural and magnetic properties of La0.7Sr0.3MnO3 ferromagnetic thin film grown on PMN-PT by sol–gel method

2017 ◽  
Vol 07 (04) ◽  
pp. 1750029 ◽  
Author(s):  
Jing Zhang ◽  
Peng Shi ◽  
Mingmin Zhu ◽  
Ming Liu ◽  
Wei Ren ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetic Properties ◽  
Physical Property Measurement System ◽  
Sol Gel ◽  
Physical Property ◽  
X Ray Diffraction ◽  
Force Microscopy ◽  
Atomic Force ◽  
Lower Temperature

We report the preparation of epitaxial La[Formula: see text]Sr[Formula: see text]MnO3 thin films grown on (001)-oriented 0.72Pb(Mg[Formula: see text]Nb[Formula: see text]O3-0.28PbTiO3 substrates by the sol–gel technique. The phase structure, magnetic properties and magnetoresistance of the samples are investigated by using high solution X-ray diffraction, atomic force microscopy, physical property measurement system, respectively. The La[Formula: see text]Sr[Formula: see text]MnO3 thin films display a well-defined hysteresis loop and typical ferromagnetism behavior at lower temperature. High magnetoresistance at 5[Formula: see text]T of 42% appears at 227[Formula: see text]K for La[Formula: see text]Sr[Formula: see text]MnO3 thin film.

Dielectric Properties of Sol-Gel Derived MgAl2O4 Thin Films

2012 ◽  
Vol 151 ◽  
pp. 314-318
Author(s):  
Ching Fang Tseng ◽  
Cheng Hsing Hsu ◽  
Chun Hung Lai
Keyword(s):  
Thin Films ◽  
Annealing Temperature ◽  
Sol Gel ◽  
Dissipation Factor ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Preheating Temperature ◽  
Surface Morphologies

This paper describes microstructure characteristics of MgAl2O4 thin films were deposited by sol-gel method with various preheating temperatures and annealing temperatures. Particular attention will be paid to the effects of a thermal treatment in air ambient on the physical properties. The annealed films were characterized using X-ray diffraction. The surface morphologies of treatment film were examined by scanning electron microscopy and atomic force microscopy. At a preheating temperature of 300oC and an annealing temperature of 700oC, the MgAl2O4 films with 9 μm thickness possess a dielectric constant of 9 at 1 kHz and a dissipation factor of 0.18 at 1 kHz.

Preparation and Characterization of Li4/3Ti5/3O4 Thin Films by Sol-gel Method

2006 ◽  
Vol 972 ◽  
Author(s):  
C. Hu ◽  
W. Zhang ◽  
H. Hao ◽  
M. H. Cao ◽  
S. J. Lai ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Sol Gel ◽  
High Capacity ◽  
X Ray Diffraction ◽  
Gel Method ◽  
Sol Gel Method ◽  
Atomic Force ◽  
Good Crystallinity

AbstractIn the study Li4/3Ti5/3O4 thin films were deposited on Pt substrates by sol-gel method using a spin coator. The coated films are dried at 310-360 °C, and then annealed at 500-800 °C for 30min. The prepared films were characterized by X-ray diffraction, atomic force microscope and scanning electron microscope. The results indicated that the prepared film belonged to a spinel structure and had a uniform morphology. Electrochemical properties of the prepared electrode films were evaluated by using a discharge and charge test. From these results, it can be showed that the thin film electrode annealed at 700 °C exhibited good crystallinity, smooth surface morphology, high capacity, and good rechargeability. Therefore, This film was therefore suitable for use as an anode for thin-film microbatteries.

Surface Structural Characterization and Mechanical Testing by Nanoindentation Measurements of Hybrid Polymer/clay Nanostructured Multilayer Films

2002 ◽  
Vol 17 (7) ◽  
pp. 1622-1633 ◽  
Author(s):  
Xiaowu Fan ◽  
Mi-Kyoung Park ◽  
Chuanjun Xia ◽  
Rigoberto Advincula
Keyword(s):  
Thin Films ◽  
Quartz Crystal ◽  
Ex Situ ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Diallyldimethylammonium Chloride

Nanostructured montmorillonite/poly(diallyldimethylammonium chloride) multilayer thin films were fabricated up to 100 layers thick by stepwise alternating polyelectrolyte and clay deposition from solution. The structure and morphology of the films were characterized by x-ray diffraction, ellipsometry, atomic force microscopy, and quartz crystal microbalance ex situ and in situ measurements. The mechanical properties were tested by nanoindentation. The hardness of the multilayer thin film was 0.46 GPa. The thin film's modulus was correlated to its ordering and anisotropic structure. Both hardness and modulus of this composite film were higher than those of several other types of polymer thin films.

scholarly journals Preparation of (Pb,Ba)TiO3 powders and highly oriented thin films by a sol-gel process

2004 ◽  
Vol 19 (5) ◽  
pp. 1492-1498 ◽  
Author(s):  
Stacey W. Boland ◽  
Suresh C. Pillai ◽  
Wein-Duo Yang ◽  
Sossina M. Haile
Keyword(s):  
Thin Films ◽  
Sol Gel ◽  
Chelating Agent ◽  
Titanium Isopropoxide ◽  
X Ray Diffraction ◽  
Scanning Calorimetry ◽  
Force Microscopy ◽  
Molar Ratios ◽  
Atomic Force ◽  
Sol Gel Process

Solid solution Pb1-xBaxTiO3, with particular emphasis on Pb0.5Ba0.5TiO3, was prepared using a sol-gel process incorporating lead acetate trihydrate, barium acetate, and titanium isopropoxide as precursors, acetylacetone (2,4 pentanedione) as a chelating agent, and ethylene glycol as a solvent. The synthesis procedure was optimized by systematically varying acetylacetone: Ti and H2O:Ti molar ratios and calcination temperature. The resulting effects on sol and powder properties were studied using thermogravimetric analysis/differential scanning calorimetry, Fourier transform infrared spectroscopy, Brunauer-Emmett-Teller analysis, and x-ray diffraction (XRD). Crystallization of the perovskite structure occurred at a temperature as low as 450 °C. Thin films were prepared by spin coating on (100) MgO. Pyrolysis temperature and heating rate were varied, and the resultant film properties investigated using field-emission scanning electron microscopy, atomic force microscopy, and XRD. Under optimized conditions, highly oriented films were obtained at a crystallization temperature of 600 °C.

Dielectric and Electromechanical Behaviour of Relaxor [(1−x)Pb(Mg1/3Nb2/3)O3 -xPbTiO3] Thin Films

2001 ◽  
Vol 688 ◽  
Author(s):  
N.J. Donnelly ◽  
G. Catalan ◽  
C. Morros ◽  
R.M. Bowman ◽  
J.M. Gregg
Keyword(s):  
Thin Films ◽  
Single Crystal ◽  
Plane Strain ◽  
X Ray Diffraction ◽  
Force Microscopy ◽  
Bulk Ceramic ◽  
Atomic Force ◽  
Out Of Plane ◽  
Order Of Magnitude

AbstractThin film capacitor structures of Au / (1−x)Pb(Mg1/3Nb2/3)O3 - xPbTiO3 /(La1/2Sr1/2)CoO3 were fabricated by pulsed laser deposition on single crystal {001} MgO substrates. Films were found to be perovskite dominated and highly {001} oriented. Dielectrically, films displayed relaxorlike features, though maximum permittivity was low compared to single crystal or bulk ceramic (∼1400 at peak @1kHz, for x=0.07, 0.1 & 0.2). A field induced piezoelectric coefficient d33 was measured by piezoresponse atomic force microscopy for specific compositions x =0, × =0.07, and x =0.1 and found to be disappointingly low - indicating poor electric field induced strain. Despite this macroscopic electrostrictive coefficients Q33 were found to be (3.6 ± 0.6) ×10−2C−2m4, (2.6 ± 0.2) ×10−2C−2m4, and (0.9 ± 0.3) ×10−2C−2m4 respectively. Crystallographic electrostrictive coefficients were determined by in-situ x-ray diffraction and found to be (4.9 ± 0.2) ×10−2C−2m4 for PMN-(0.07)PT and (1.9 ± 0.1) ×10−2C−2m4 for PMN-(0.1)PT. Considering that all these Q33 values are of the same order of magnitude as found in single crystal experiments (2.5 – 3.8 ×10−2C−2m4), it is suggested that low out-of-plane strain is entirely a result of reduced polarisability rather than reduced electrostrictive coefficients in thin films relative to bulk ceramic or single crystal. An estimate was also made of the Q13 electrostrictive coefficient for PMN and PMN-(0.07)PT by measuring permittivity as a function of applied in-plane strain. The values obtained were -1.31 ×10−2C−2m4 and -0.46 ×10−2C−2m4 respectively.

Comparison between the optical and surface properties of TiO2 and Ag/TiO2 thin films prepared by sol-gel process

2011 ◽  
Vol 1352 ◽  
Author(s):  
Marcelo M. Viana ◽  
Nelcy D. S. Mohallem
Keyword(s):  
Thin Films ◽  
Sol Gel ◽  
Refraction Index ◽  
Titanium Isopropoxide ◽  
X Ray Diffraction ◽  
Tio2 Thin Films ◽  
Force Microscopy ◽  
Atomic Force ◽  
Vis Spectroscopy ◽  
Sol Gel Process

ABSTRACTColloidal precursor solutions, obtained from a mixture of titanium isopropoxide, isopropyl alcohol and silver nitrate, were used to fabricate amorphous TiO2 and Ag/TiO2 thin films by sol-gel process. The films were deposited on borosilicate substrates, which were heated at 400 °C for 30 minutes and cooled rapidly to the formation of amorphous coatings. The films were investigated by X-ray diffraction, scanning electron microscopy, atomic force microscopy and UV-vis spectroscopy. The thickness, roughness, refraction index, and particle size of the TiO2 and Ag/TiO2 films were determined and compared. Finally, hydrophobic-hydrophilic property was evaluated to the thin films produced.

Preparation and Characterization of BiFeO3 Film via Sol-Gel Spin-Coating Process

2011 ◽  
Vol 492 ◽  
pp. 202-205 ◽  
Author(s):  
Xi Wei Qi ◽  
Xiao Yan Zhang ◽  
Xuan Wang ◽  
Hai Bin Sun ◽  
Jian Quan Qi
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Indium Tin Oxide ◽  
Sol Gel ◽  
Secondary Phases ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force ◽  
Ito Glass

BiFeO3 thin films were spin-coated on conductive indium tin oxide (ITO)/glass substrates by a simple sol-gel possess annealed at 470-590°C. The crystal structure of as-prepared BiFeO3 thin films annealed at different temperature was determined to be rhombohedral of R3m space and free of secondary phases was also confirmed. Cross section scanning electron microscope (SEM) pictures revealed that the thickness of BiFeO3 thin film was about 320 nm. The double remanent polarization 2Pr of BiFeO3 thin film annealed at 500°C is 2.5 μC/cm2 without applied field at room temperature. Image of atomic force microscopy indicated that the root-mean-square surface roughness value of BiFeO3 thin film was 6.13 nm.

UNDERLAYER ROUGHNESS INFLUENCE ON THE PROPERTIES OF Ag THIN FILM

2008 ◽  
Vol 15 (06) ◽  
pp. 787-791
Author(s):  
PEI ZHAO ◽  
RENG WANG ◽  
DINGQUAN LIU ◽  
FENGSHAN ZHANG ◽  
WEITAO SU ◽  
...  
Keyword(s):  
Thin Film ◽  
Crystal Structure ◽  
Thin Films ◽  
Optical Constants ◽  
Reflectance Spectrum ◽  
Optical And Electrical Properties ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force

The effects of the roughness of ZnS underlayer on the microstructure, optical, and electrical properties of nanometer Ag thin film have been investigated in this paper. Nanometer Ag thin films in glass/ ZnS /7.5 nm Ag /30 nm ZnS stacks have been deposited and analyzed. In the stacks, the underlayers of ZnS have been sputtered with various thicknesses to generate various surface roughnesses. The X-ray diffraction (XRD) has been used to study the crystal structure of Ag films. The surface topography and the roughness of ZnS underlayer have been analyzed by atomic force microscopy. The sheet resistant will become larger as the increasing of the roughness. The optical constants can be derived by fitting the transmission and reflectance spectrum. From optical constants comparison of Ag films, with the surface of the stack becoming rougher, it was found that the refractive index will increase but the extinction coefficient will decrease.

Structural and Optical Properties of Cu2MnSnS4 Thin Film Fabricated by Sol-Gel Technique

2015 ◽  
Vol 814 ◽  
pp. 39-43 ◽  
Author(s):  
Lei Lei Chen ◽  
Hong Mei Deng ◽  
Ke Zhi Zhang ◽  
Ling Huang ◽  
Jian Liu ◽  
...  
Keyword(s):  
Thin Film ◽  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Sol Gel ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Gel Technique ◽  
Scanning Electron

Cu2MnSnS4 thin film was successfully prepared by a sol-gel technique on soda lime glass substrate from metal salts and thiourea. The structural and morphological properties of the fabricated film were characterized by X-ray diffraction, Raman spectroscopy, scanning electron microscopy and atomic force microscopy. The combination of the X-ray diffraction results and Raman spectroscopy reveal that this obtained layer is composed by Cu2MnSnS4 phase and has a stannite structure with preferential orientation along the (112) direction. The scanning electron microscopy and atomic force microscopy results show that the synthesized thin film is smooth and compact without any visible cracks or pores. The band gap of the Cu2MnSnS4 thin film is about 1.29 eV determined by the UV-vis-NIR absorption spectra measurement, which indicates it has potential applications in solar cells.

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