scholarly journals Plasma Temperature and Electron Density of Dry µ-EDM on Stainless Steel and Silicon: A Comparison

2011 ◽  
Vol 5 (1) ◽  
pp. 45-51 ◽  
Author(s):  
Kanmani Subbu Subbian ◽  
◽  
Ramkumar Janakarajan ◽  
Dhamodaran Santhanagopalan ◽  
Keyword(s):  
Stainless Steel ◽  
Electron Density ◽  
Plasma Temperature ◽  
Optical Emission ◽  
Machining Process ◽  
Lead Times ◽  
Line Pair ◽  
Plasma Parameters ◽  
Pair Method ◽  
2D And 3D

Fabricating micro/nano-features in devices and largescale production with short lead times is challenging, and many individual and hybrid processes have been developed to meet this challenge. Among nonconventional processes, micro-electric discharge machining (µ-EDM) has many advantages due to the possibility of precise and accurate 2D and 3D machining of complex shapes. Dry µ-EDM is used to process assembled or semi-assembled products. Attempts are being made to improve the µ-EDM process, and further improvement is possible through better understanding the role of discharge plasma in the machining process. We studied plasma and crater characteristics during dry µ-EDM, calculating plasma parameters for different discharge energies using optical emission spectroscopy. Line pair method and modified Saha equations are used to calculate plasma temperature and electron density respectively. Craters were morphologically analyzed using scanning electron microscopy (SEM), and plasma and crater characteristics on stainless steel and silicon were compared.

Single Discharge of Dry µ-EDM on Silicon: Crater and Plasma Temperature Measurement

2011 ◽  
Vol 299-300 ◽  
pp. 1334-1337 ◽  
Author(s):  
S. Kanmani Subbu ◽  
Janakarajan Ramkumar ◽  
S. Dhamodaran
Keyword(s):  
Optical Emission Spectroscopy ◽  
Plasma Temperature ◽  
Optical Emission ◽  
Energy Conditions ◽  
Line Pair ◽  
Electric Discharge Machining ◽  
Single Discharge ◽  
Pair Method ◽  
Crater Morphology ◽  
Edm Process

To improve the performance of the Electric discharge machining (EDM) process it is of interest to characterize the plasma involved. Plasma temperature needs to be measured as an initial phase of plasma characterization. Non-contact optical emission spectroscopy has been used to measure the plasma temperature. The plasma temperature and crater morphology has been investigated for different energy conditions on Silicon in dry µ-EDM condition. The plasma temperature is calculated using line pair method and crater morphology analyzed by scanning electron microscope (SEM) and profilometer.

scholarly journals Machine Learning Prediction of Electron Density and Temperature from Optical Emission Spectroscopy in Nitrogen Plasma

Coatings ◽  
2021 ◽  
Vol 11 (10) ◽  
pp. 1221
Author(s):  
Jun-Hyoung Park ◽  
Ji-Ho Cho ◽  
Jung-Sik Yoon ◽  
Jung-Ho Song
Keyword(s):  
Machine Learning ◽  
Electron Temperature ◽  
Real Time ◽  
Electron Density ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Plasma Parameters ◽  
Plasma Nitridation

We present a non-invasive approach for monitoring plasma parameters such as the electron temperature and density inside a radio-frequency (RF) plasma nitridation device using optical emission spectroscopy (OES) in conjunction with multivariate data analysis. Instead of relying on a theoretical model of the plasma emission to extract plasma parameters from the OES, an empirical correlation was established on the basis of simultaneous OES and other diagnostics. Additionally, we developed a machine learning (ML)-based virtual metrology model for real-time Te and ne monitoring in plasma nitridation processes using an in situ OES sensor. The results showed that the prediction accuracy of electron density was 97% and that of electron temperature was 90%. This method is especially useful in plasma processing because it provides in-situ and real-time analysis without disturbing the plasma or interfering with the process.

scholarly journals SPECTROSCOPIC STUDY OF RF MAGNETRON SPUTTERING PLASMA FOR DEPOSITION TI6AL4V THIN FILM

2021 ◽  
Vol 03 (03) ◽  
pp. 103-110
Author(s):  
Dawood S. ALI ◽  
Omar M. DAWOOD
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Gas Flow ◽  
Plasma Temperature ◽  
Optical Emission ◽  
Rf Magnetron Sputtering ◽  
Plasma Parameters ◽  
Working Pressure ◽  
Standard Data ◽  
Sputtering Power

In this work, RF magnetron sputtering plasma for the deposition of Ti6Al4V thin film has been investigated by using optical emission spectroscopy at argon working pressure of 5×10-3 mbar. The emission lines intensity of the plasma were measured using a spectrometer, and the identify peaks within the selective range of patterns and matched with the standard data from the NIST website to measure the plasma parameters. Since the sputtering power plays an important role to the growth of thin film, so the effect of sputtering power of 50, 75, 100, 125 and 150Watt has been studied on produced plasma parameters. The size of Ti6Al4V sputtering target was 50mm in diameter. The argon gas flow was 40 s ccm. One can observe that the lines intensities increased with increasing the sputtering power. The plasma temperature increases from 1.86 to 2.15 eV, while its density increased from 2.69 ×1018 to 2.94 ×1018 cm-3with increasing the rf power from 50 to 150 W, which effect on sputtering rate.

scholarly journals COMPOSITE Cu-Cr MATERIALS UNDER THERMAL ACTION OF ELECTRIC ARC DISCHARGE PLASMA

2021 ◽  
pp. 98-101
Author(s):  
A. Murmantsev ◽  
A. Veklich ◽  
V. Boretskij ◽  
M. Bartlová ◽  
L. Dostál ◽  
...  
Keyword(s):  
Discharge Plasma ◽  
Arc Discharge ◽  
Plasma Temperature ◽  
Thermal Action ◽  
Optical Emission ◽  
Electric Arc ◽  
Composite Electrodes ◽  
Plasma Parameters ◽  
Arc Discharges ◽  
The Impact

The results of optical emission spectroscopy (OES) investigation of plasma of electric arc discharges in steadystate mode between Cu-Cr composite electrodes, manufactured at different sintered temperatures: 750, 850, 950 or 1050 °C, is presented. In particular, the impact of sintering temperature on erosion resistanceof such composite materials, which was determined in indirect manner by estimation of metal vapours content in the midsection of discharge gaps, is studied by the analysis of plasma parameters. These contents were calculated in assumption of local thermodynamic equilibrium (LTE) on the base of experimentally obtained radial distributions of plasma temperature and electron density.

DIAGNOSTICS OF LASER INDUCED GRAPHITE PLASMA UNDER VARIOUS PRESSURES OF AIR, HELIUM AND ARGON

2016 ◽  
Vol 78 (3) ◽  
Author(s):  
Zuhaib Haider ◽  
Kashif Chaudhary ◽  
Sufi Roslan ◽  
Jalil Ali ◽  
Yusof Munajat
Keyword(s):  
Electron Density ◽  
Laser Energy ◽  
Ambient Pressure ◽  
Plasma Temperature ◽  
Sample Surface ◽  
Ambient Atmosphere ◽  
Plasma Parameters ◽  
Saha Equation ◽  
Laser Induced Plasma ◽  
Spectroscopic Information

Laser induced plasma provides information about the elemental composition of sample surface and through spectroscopy vital information about plasma dynamics can be obtained. In this paper we present the diagnostics of laser induced plasma at various pressures of Air, Helium and Argon gases. Graphite sample was ablated with Q-smart 850 laser while spectra were captured  Plasma parameters have been calculated by using well known methods based on Saha and Boltzmann equations. Plasma temperature was calculated relative intensity of ionic carbon lines CII 251.21 nm and CII 426.73 nm while the electron density was determined by using spectroscopic information of CI 247.85 nm and CII 426.73 nm emission lines in Saha equation. Plasma temperature and electron density were found to be dependent upon nature and pressure of the ambient atmosphere. Higher temperatures and electron densities were obtained in the presence of Air as ambient environment that is attributed to electrical and physical properties of the Air. Keeping into consideration the plasma expansion in various environments the selection of a suitable ambient pressure can be made on the basis of spectral diagnostics of plasma for a particular laser energy to obtain desirable plasma temperature and electron density suited for certain applications.

Effect of Current on Plasma Parameters Resulting from the Wires-Exploding Technique of Copper Material

2020 ◽  
pp. 110-113
Keyword(s):  
Electron Temperature ◽  
Electron Density ◽  
Optical Emission ◽  
Plasma Electron ◽  
Stark Broadening ◽  
Number Density ◽  
Hydrogen Atoms ◽  
Plasma Parameters ◽  
Optical Emission Spectrum ◽  
Copper Material

In this research the diagnostic of optical emission spectroscopy from exploding copper wires have done for different current. By using Boltzman plot can be calculated the plasma electron temperature , and by using Stark broadening can be evaluated the electron density for different current of (75, 100 and 150)A with diameter 0.25 mm in deionized water. It was observed that the electron density decrease with an increasing the current from 75 A to 150 A while the electron temperatures increase for the same current. The plasma has a peak 652 nm corresponding to Hα line for .hydrogen .atoms which obtained from .optical emission spectrum (OES), the peaks belong to atomic copper lines. The plasma electron temperature related with emission line intensity and number .density with the formed copper nanoparticles size was studied.

scholarly journals Analysis of the enhanced negative correlation between electron density and electron temperature related to earthquakes

2015 ◽  
Vol 33 (4) ◽  
pp. 471-479 ◽  
Author(s):  
X. H. Shen ◽  
X. Zhang ◽  
J. Liu ◽  
S. F. Zhao ◽  
G. P. Yuan
Keyword(s):  
Electric Field ◽  
Electron Density ◽  
Negative Correlation ◽  
Plasma Temperature ◽  
Lower Latitude ◽  
Coupling Mechanism ◽  
Plasma Parameters ◽  
Low Latitudes ◽  
Before And After ◽  
Large Earthquakes

Abstract. Ionospheric perturbations in plasma parameters have been observed before large earthquakes, but the correlation between different parameters has been less studied in previous research. The present study is focused on the relationship between electron density (Ne) and temperature (Te) observed by the DEMETER (Detection of Electro-Magnetic Emissions Transmitted from Earthquake Regions) satellite during local nighttime, in which a positive correlation has been revealed near the equator and a weak correlation at mid- and low latitudes over both hemispheres. Based on this normal background analysis, the negative correlation with the lowest percent in all Ne and Te points is studied before and after large earthquakes at mid- and low latitudes. The multiparameter observations exhibited typical synchronous disturbances before the Chile M8.8 earthquake in 2010 and the Pu'er M6.4 in 2007, and Te varied inversely with Ne over the epicentral areas. Moreover, statistical analysis has been done by selecting the orbits at a distance of 1000 km and ±7 days before and after the global earthquakes. Enhanced negative correlation coefficients lower than −0.5 between Ne and Te are found in 42% of points to be connected with earthquakes. The correlation median values at different seismic levels show a clear decrease with earthquakes larger than 7. Finally, the electric-field-coupling model is discussed; furthermore, a digital simulation has been carried out by SAMI2 (Sami2 is Another Model of the Ionosphere), which illustrates that the external electric field in the ionosphere can strengthen the negative correlation in Ne and Te at a lower latitude relative to the disturbed source due to the effects of the geomagnetic field. Although seismic activity is not the only source to cause the inverse Ne–Te variations, the present results demonstrate one possibly useful tool in seismo-electromagnetic anomaly differentiation, and a comprehensive analysis with multiple parameters helps to further understand the seismo–ionospheric coupling mechanism. \\keywords{Ionosphere (plasma temperature and density)}

scholarly journals Studies on the ns-IR-Laser-Induced Plasma Parameters in the Vanadium Oxide

2011 ◽  
Vol 2011 ◽  
pp. 1-7 ◽  
Author(s):  
Arnab Sarkar ◽  
Raju V. Shah ◽  
D. Alamelu ◽  
Suresh K. Aggarwal
Keyword(s):  
Vanadium Oxide ◽  
Electron Density ◽  
Plasma Temperature ◽  
Spectroscopic Studies ◽  
Decay Rates ◽  
Plasma Parameters ◽  
Boltzmann Plot ◽  
Saha Equation ◽  
Laser Induced Plasma ◽  
Light Pulses

We report spectroscopic studies of laser-induced plasma (LIP) produced by ns-IR-Nd:YAG laser light pulses of different energies onto four different oxides of vanadium (VO, V2O3, VO2, and V2O5) in air under atmospheric pressure. For each oxide with a different oxidation state of vanadium, both electron density and plasma temperature were calculated for different time delays and laser pulse energies. The plasma temperature was determined from Boltzmann plot method, whereas the electron number density was estimated from the Saha equation. The decay rates for plasma temperature as well as electron density were observed to follow power law and were independent of the nature of vanadium oxide. These investigations provide an insight to optimize various parameters during LIBS analysis of vanadium-based matrices.

scholarly journals Optical emission spectroscopy for studying the exploding copper wire plasma parameters in distilled water

2018 ◽  
Vol 15 (35) ◽  
pp. 142-147
Author(s):  
Hammad R. Humud
Keyword(s):  
Electron Density ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Copper Wire ◽  
Optical Emission ◽  
Plasma Electron ◽  
Distilled Water ◽  
Stark Broadening ◽  
Plasma Parameters ◽  
Nanoparticles Concentration

This work aims to study the exploding copper wire plasma parameters by optical emission spectroscopy. The emission spectra of the copper plasma have been recorded and analyzed The plasma electron temperature (Te), was calculated by Boltzmann plot, and the electron density (ne) calculated by using Stark broadening method for different copper wire diameter (0.18, 0.24 and 0.3 mm) and currentof 75A in distilled water. The hydrogen (Hα line) 656.279 nm was used to calculate the electron density for different wire diameters by Stark broadening. It was found that the electron density ne decrease from 22.4×1016 cm-3 to 17×1016 cm-3 with increasing wire diameter from 0.18 mm to 0.3 mm while the electron temperatures increase from 0.741 to 0.897 eV for the same wire diameters. The optical emission spectrum (OES) emitted from the plasma have Hα line, small peak at 590 nm corresponding to sodium and others peaks belong to Cu I. The relationship between the plasma electron temperature, emission line intensity and number density with the formed copper nanoparticles size and concentration were studied. It was found that the nanoparticles concentration increase with emission line intensity while its size decrease. It can be conclude the existence of a controlled relationship between the plasma parameters and the formed nanoparticles concentration and size.

scholarly journals Optical Emission Spectroscopy of Magnethron Discharge Ar/Cu Plasma

2019 ◽  
Vol 6 (1) ◽  
pp. 87-90
Author(s):  
A. Murmantsev ◽  
A. Veklich ◽  
V. Boretskij ◽  
A. Shapovalov ◽  
A. Kalenyuk
Keyword(s):  
Electron Density ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Argon Plasma ◽  
Optical Emission ◽  
Excitation Temperature ◽  
Plasma Parameters ◽  
Magnetron Discharge ◽  
Deposition Processes ◽  
Switching Devices

Plasma parameters (excitation temperature and electron density) of pulsing magnetron discharge is studied by optical emission spectroscopy. Such discharges are usually used as effective sources in sputtering or deposition processes. Vapor admixtures in argon plasma define mainly the temperature and electron density in such discharges. This is the feature, which is typically takes place in plasma of discharge between contacts/electrodes in switching devices of electric technology circuits.

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