scholarly journals Interaction of Small Hydrocarbons with Fusion Relevant Beryllium Thin Films

2021 ◽  
Vol 40 (3) ◽  
pp. 539-544
Author(s):  
Bilal Rasul ◽  
Aroog G.
Keyword(s):  
Thin Films ◽  
Incident Energy ◽  
High Vacuum ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Ultra High Vacuum ◽  
Vacuum Arc ◽  
Stainless Steel Surface ◽  
Primary Role ◽  
Product Ions

Ion-surface collision studies are carried out with small deuterated hydrocarbon cations i.e. CDx + with x = 2-4 colliding with fusion relevant Beryllium (Be) thin films with ions incident energy as low as 0 eV and as high as Ein = 100 eV. Be films are coated on stainless steel surface by the technique of Thermionic Vacuum Arc (TVA); a novel thin film deposition method with primary as well distinguished characteristic of control of ion flux and respective dose towards the substrate. Prior to scattering, methane-d4 99 atom % D is ionized by electron impact and ions are mass and energy analyzed. Ionization and collisions are performed in ultra high vacuum conditions. In these kinds of collision experiments, we have recorded secondary ion mass spectra and plotted respective incident energy resolved abundances of secondary product ions. Relative abundances in percentage of total secondary ions are plotted and it is observed that such beryllium films can accumulate charged hydrocarbon layers as surface adsorbates. These self assembled layers play a primary role in surface-scattering of primary ions. Moreover, it is seen that bond dissociation energy in lighter hydrocarbons is higher than that for heavier species and shows primarily that the deuterium atoms are loosely bounded to carbon atoms in heavier hydrocarbons than in lighter ones.

Reverse Engineering of Thin Films to Nanoparticles by Thermal Deposition for Large-Scale Production of Nanometals

2020 ◽  
Vol 61 ◽  
pp. 42-50
Author(s):  
Karthik Paneer Selvam ◽  
Zaw Lin ◽  
Inoue Hirotaka ◽  
Marui Tatsuki ◽  
Takeshi Nishikawa ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Reverse Engineering ◽  
High Vacuum ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Scale Production ◽  
Simple Method ◽  
Thermal Deposition ◽  
Vacuum Thermal Deposition

A simple method to synthesize metal nanoparticles (Nps) has been proposed using high vacuum thermal deposition (HVTD) by reverse engineering of thin films to Nps. Metal Nps synthesized by this technique corresponds to the top-down approach of nanomaterial synthesis from bulk metals of silver and copper wires to metal Nps. A high-vacuum thermal deposition is a commonly used technique for thin-film deposition in many applications. Synthesis of metal Nps by HVTD is simple, efficient, and can provide particle of about few tens of nanometers is effortless. A precoated thin layer of polyethylene glycol (PEG) on a glass substrate (Petri dish), is allowed deposit with a metallic thin film by thermionically evaporating bulk metal wires in high vacuum. The deposited metal thin film is removed along with the PEG coating into a liquid medium and subjected to sonication, stirring, and deoxidation. Obtaining the particle size in tens of nanometer range in one step is one projecting factor by HVTD technique. Also, providing the feasibility of reusing large particles as precursors after synthesis is a unique vantage point. The Nps were analyzed by various characterizations tools to evaluate the underlying properties.

scholarly journals Mass spectra and incident energy resolved spectra after collisions of hydrocarbon ions with fusion-plasma tungsten thin films

2020 ◽  
Vol 39 (3) ◽  
pp. 517-523
Author(s):  
Bilal Rasul ◽  
Hira Naz
Keyword(s):  
Thin Films ◽  
Stainless Steel ◽  
Incident Energy ◽  
Mass Spectra ◽  
Ion Beam ◽  
High Vacuum ◽  
Molecular Ions ◽  
Small Sample ◽  
Ultra High Vacuum ◽  
Fragmentation Pattern

We have performed surface-induced dissociation studies of small deuterated hydrocarbon cations i.e. CDx+ with x=2-4, colliding with two types of tungsten-coated surfaces, in the incident energy range between Ein = 0 eV approximately, up to Ein = 100 eV. A 34 nm thick W layer deposited on stainless steel using the Thermionic Vacuum Arc (TVA) method and a small sample of a tile cut from ASDEX-Upgrade tiles, consisting of PlasmaSprayed (PS) tungsten on carbon, are exposed to ion flux in these experiments. A double-focussing reverse geometry BE mass spectrometer, is used under ultra high vacuum conditions. Mass spectra of secondary charged particles are recorded via time-of-flight mass analyser. For comparison, we have performed equivalent study on polished stainless steel under experimental status explained in Section 2 below. At very low energies i.e. below 10 eV, only surface reflected projectiles are seen, whereas most of them are neutralized by surface micro charges. We observed that the fragmentation pattern of the small molecular ions at a given energy is strongly dependent on the surface. The roughness of both of the said thin films and their reflectivity for the projectile ion beam is studied by analysis of the ion yields of the reaction products

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

TEM sample preparation of wear-tested room-temperature pulsed-laser-deposited thin films of MoS2 by ultramicrotomy

1993 ◽  
Vol 51 ◽  
pp. 1118-1119
Author(s):  
Pamela F. Lloyd ◽  
Scott D. Walck
Keyword(s):  
Thin Films ◽  
Sample Preparation ◽  
Room Temperature ◽  
High Vacuum ◽  
Pulsed Laser ◽  
Ultra High Vacuum ◽  
Wear Testing ◽  
Preparation Technique ◽  
Cross Sectional ◽  
Aerospace Applications

Pulsed laser deposition (PLD) is a novel technique for the deposition of tribological thin films. MoS2 is the archetypical solid lubricant material for aerospace applications. It provides a low coefficient of friction from cryogenic temperatures to about 350°C and can be used in ultra high vacuum environments. The TEM is ideally suited for studying the microstructural and tribo-chemical changes that occur during wear. The normal cross sectional TEM sample preparation method does not work well because the material’s lubricity causes the sandwich to separate. Walck et al. deposited MoS2 through a mesh mask which gave suitable results for as-deposited films, but the discontinuous nature of the film is unsuitable for wear-testing. To investigate wear-tested, room temperature (RT) PLD MoS2 films, the sample preparation technique of Heuer and Howitt was adapted.Two 300 run thick films were deposited on single crystal NaCl substrates. One was wear-tested on a ball-on-disk tribometer using a 30 gm load at 150 rpm for one minute, and subsequently coated with a heavy layer of evaporated gold.

Two-dimensional BN-doped ZnO thin-film deposition by a thermionic vacuum arc system

2020 ◽  
Vol 31 (9) ◽  
pp. 6948-6955
Author(s):  
Mustafa Özgür ◽  
Suat Pat ◽  
Reza Mohammadigharehbagh ◽  
Uğur Demirkol ◽  
Nihan Akkurt ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Vacuum Arc ◽  
Zno Thin Film ◽  
Two Dimensional ◽  
Doped Zno ◽  
Thermionic Vacuum Arc

scholarly journals The Growth of Semiconductor Thin Films Studied by RHEED

1990 ◽  
Vol 43 (5) ◽  
pp. 583
Author(s):  
GL Price
Keyword(s):  
Thin Films ◽  
Surface Science ◽  
High Vacuum ◽  
High Energy ◽  
Ultra High Vacuum ◽  
Large Area ◽  
Growth Modes ◽  
Semiconductor Thin Films ◽  
Wide Range ◽  
Recent Developments

Recent developments in the growth of semiconductor thin films are reviewed. The emphasis is on growth by molecular beam epitaxy (MBE). Results obtained by reflection high energy electron diffraction (RHEED) are employed to describe the different kinds of growth processes and the types of materials which can be constructed. MBE is routinely capable of heterostructure growth to atomic precision with a wide range of materials including III-V, IV, II-VI semiconductors, metals, ceramics such as high Tc materials and organics. As the growth proceeds in ultra high vacuum, MBE can take advantage of surface science techniques such as Auger, RHEED and SIMS. RHEED is the essential in-situ probe since the final crystal quality is strongly dependent on the surface reconstruction during growth. RHEED can also be used to calibrate the growth rate, monitor growth kinetics, and distinguish between various growth modes. A major new area is lattice mismatched growth where attempts are being made to construct heterostructures between materials of different lattice constants such as GaAs on Si. Also described are the new techniques of migration enhanced epitaxy and tilted superlattice growth. Finally some comments are given On the means of preparing large area, thin samples for analysis by other techniques from MBE grown films using capping, etching and liftoff.

scholarly journals Strain-Relief Patterns and Kagome Lattice in Self-Assembled C60 Thin Films Grown on Cd(0001)

2021 ◽  
Vol 22 (13) ◽  
pp. 6880
Author(s):  
Zilong Wang ◽  
Minlong Tao ◽  
Daxiao Yang ◽  
Zuo Li ◽  
Mingxia Shi ◽  
...  
Keyword(s):  
Thin Films ◽  
Self Assembly ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Scanning Tunneling ◽  
Kagome Lattice ◽  
Tunneling Microscopy ◽  
Kagomé Lattice ◽  
Temperature Scanning ◽  
C60 Films

We report an ultra-high vacuum low-temperature scanning tunneling microscopy (STM) study of the C60 monolayer grown on Cd(0001). Individual C60 molecules adsorbed on Cd(0001) may exhibit a bright or dim contrast in STM images. When deposited at low temperatures close to 100 K, C60 thin films present a curved structure to release strain due to dominant molecule–substrate interactions. Moreover, edge dislocation appears when two different wavy structures encounter each other, which has seldomly been observed in molecular self-assembly. When growth temperature rose, we found two forms of symmetric kagome lattice superstructures, 2 × 2 and 4 × 4, at room temperature (RT) and 310 K, respectively. The results provide new insight into the growth behavior of C60 films.

Phenethylammonium bismuth halides: from single crystals to bulky-organic cation promoted thin-film deposition for potential optoelectronic applications

2019 ◽  
Vol 7 (36) ◽  
pp. 20733-20741 ◽  
Author(s):  
Mehri Ghasemi ◽  
Miaoqiang Lyu ◽  
Md Roknuzzaman ◽  
Jung-Ho Yun ◽  
Mengmeng Hao ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Surface Roughness ◽  
Single Crystals ◽  
Organic Cation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Optoelectronic Applications ◽  
Excellent Stability

The phenethylammonium cation significantly promotes the formation of fully-covered thin-films of hybrid bismuth organohalides with low surface roughness and excellent stability.

AlN thin films fabricated by ultra-high vacuum electron-beam evaporation with ammonia for silicon-on-insulator application

2005 ◽  
Vol 239 (3-4) ◽  
pp. 327-334 ◽  
Author(s):  
Ming Zhu ◽  
Peng Chen ◽  
Ricky K.Y. Fu ◽  
Weili Liu ◽  
Chenglu Lin ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
High Vacuum ◽  
Electron Beam Evaporation ◽  
Silicon On Insulator ◽  
Ultra High Vacuum

INK JET PRINTED THIN FILMS ON GLASS AND POLYIMIDE SUBSTRATES

2013 ◽  
Vol 37 (3) ◽  
pp. 873-883 ◽  
Author(s):  
Tsai-Cheng Li ◽  
Rwei-Ching Chang ◽  
Yen-Choung Li
Keyword(s):  
Thin Films ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Electric Resistance ◽  
Ink Jet Printing ◽  
Sputtered Films ◽  
Ink Jet ◽  
Jet Printing ◽  
Conductive Thin Films

Silver conductive thin films deposited on glass and polyimide substrates by using ink jet printing are studied in this work. Characterization of the printed thin films and comparison with sputtered films are investigated. The micro texture, residual stress, adhesion, hardness, optical reflectance, and electric resistance of the thin films are discussed. The result shows that the ink jet printing has the possibility to replace sputtering in thin film deposition, especially for the polymer substrates.

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