Failure Analysis Methodology on Circular Patch Functional Failure Due to Device Parametric Drift

Author(s):  
A.C.T. Quah ◽  
C.Q. Chen ◽  
G.B Ang ◽  
D. Nagalingam ◽  
H.P. Ng ◽  
...  

Abstract This paper describes the debug and analysis process of a challenging case study from wafer foundry which involved a circular patch functional leakage failure that was induced from device parametric drift due to thicker gate oxide with no detection signal from inline monitoring vehicles. It highlights the need for failure analyst to always be inquisitive and to deep dive into the failure symptoms to value-add the fab in discovering the root cause of the failure in challenging situation where information is limited.

Author(s):  
Z. G. Song ◽  
S. B. Ippolito ◽  
P. J. McGinnis ◽  
A. Shore ◽  
B. Paulucci ◽  
...  

Abstract It is generally accepted that the fault isolation of Vdd short and leakage can be globally addressed by liquid crystal analysis (LCA), photoemission analysis and/or laser stimulating techniques such as OBIRCH or TIVA. However, the hot spot detected by these techniques may be a secondary effect, rather than the exact physical defect location. Further electrical probing with knowledge of the circuit schematic and layout may still be required to pinpoint the exact physical defect location, so that a suitable physical analysis methodology can be chosen to identify the root cause of the failure. This paper has described a thorough analysis process for Vdd leakage failure by a combination of various failure analysis techniques and finally the root cause of the Vdd leakage was identified.


2018 ◽  
Author(s):  
Sneta Mishra ◽  
Daniel R. Bockelman
Keyword(s):  

Abstract A case study is presented of a core CPU product where FA/FI debug is performed for an ESD-related pin leakage issue on an IO family to root cause and qualify the product. A Powered TIVA technique is used to localize the damage to the termination resistor circuitry of the affected IO block when the pin is tristated using a device tester. Failure characterization shows a gate to drain short on the transistor, with nanoprobing confirming a solid short on gate to drain and TEM finding a short at the location indicated by the TIVA hits.


Author(s):  
Y. H. Park ◽  
Michael Cournoyer

The Nuclear Materials Technology (NMT) Division has the largest inventory of glovebox gloves at Los Alamos National Laboratory (LANL). Consequently, the minimization of unplanned breaches of the glove material, typically resulting in glove failures, is a significant safety concern in the daily operations in NMT Division facilities. To investigate processes and procedures that minimize unplanned breaches in the glovebox, information on glovebox glove failures has been compiled from formal records and analyzed using statistical methods. Based on these research results, the next step of the research is to identify root causes of glove failures and the actions adequate to prevent recurrence. In this paper, root cause analysis was conducted for a cleanup breach case study to demonstrate the computerized root cause analysis process. Based on analysis results, effective recommendations were generated.


Author(s):  
Shirleen Horley ◽  
Joseph Rascon

Abstract The longer defective units are in the manufacturing pipeline before they are detected, the more expensive it becomes. Economic pressures drive the requirement to capture failures and perform root cause analysis further upstream in the product manufacturing cycle. This places greater emphasis on the ability to identify failures and perform value add analysis to drive product improvements as early as possible. This paper describes the method used to develop a reliable Unified Data Stream (UDS) that feeds the failure analysis process which in turn provides actionable information to product development teams in the Personal Computer (PC) environment. This manuscript describes the development and implementation of the Unified Data Stream designed to replace ambiguity and uncertainty with a defect trend and symptom pareto that drives action upstream. Focus will be on the output of UDS enabling the prioritization of product defects that feed the failure analysis system. Additionally, this paper will touch on the application of the UDS system for different types of pc components. The future of UDS is without bounds as it can also be applied to a wide range of products.


Author(s):  
Ghim Boon Ang ◽  
Changqing Chen ◽  
Hui Peng Ng ◽  
Alfred Quah ◽  
Angela Teo ◽  
...  

Abstract This paper places a strong emphasis on the importance of applying Systematic Problem Solving approach and use of appropriate FA methods and tools to understand the “real” failure root cause. A case of wafer center cluster RAM fail due to systematic missing Cu was studied. It was through a strong “inquisitive” mindset coupled with deep dive problem solving that lead to uncover the actual root cause of large Cu voids. The missing Cu was due to large Cu void induced by galvanic effects from the faster removal rate during Cu CMP and subsequently resulted in missing Cu. This highlights that the FA analyst’s mission is not simply to find defects but also play a catalyst role in root cause/failure mechanism understanding by providing supporting FA evidence (electrically/ physically) to Fab.


Symmetry ◽  
2019 ◽  
Vol 11 (4) ◽  
pp. 491 ◽  
Author(s):  
Schon Liang Cheng ◽  
Rosa Arnaldo Valdés ◽  
Victor Gómez Comendador ◽  
Francisco Sáez Nieto

This paper aims to present the application of a fishbone sequential diagram in air traffic management (ATM) incident investigations performing as a key connection between safety occurrence analysis methodology (SOAM) and accident/incident data reporting (ADREP) approaches. SOAM analysis is focused on organizational cause detection; nevertheless, this detection of individual causes from a complete incident scenario presents a complex analysis, and even more, the chronological relationship between causes, which is lacking in SOAM, should be tracked for post-investigation analysis. The conventional fishbone diagram is useful for failure cause classification; however, we consider that this technique can also show its potential to establish temporal dependencies between causes, which are categorized and registered with ADREP taxonomy for future database creation. A loss of separation incident that occurred in the Edmonton area (Canada) is used as a case study to illustrate this methodology as well as the whole analysis process.


Author(s):  
H. Preu ◽  
W. Mack ◽  
T. Kilger ◽  
B. Seidl ◽  
J. Walter ◽  
...  

Abstract One challenge in failure analysis of microelectronic devices is the localization and root cause finding of leakage currents in passives. In this case study we present a successful approach for failure analysis of a diode leakage failure. An analytical flow will be introduced, which contains standard techniques as well as SQUID (superconducting quantum interference device) scanning magnetic microscopy and ToFSIMS as key methods for localization and root cause identification. [1]


Author(s):  
K. Li ◽  
P. Liu ◽  
J. Teong ◽  
M. Lee ◽  
H. L. Yap

Abstract This paper presents a case study on via high resistance issue. A logical failure analysis process EDCA (Effect, Defect, Cause, and Action) is successfully applied to find out the failure mechanism, pinpoint the root cause and solve the problem. It sets up a very good example of how to do tough failure analysis in a controllable way.


Author(s):  
Ghim Boon Ang ◽  
Chen Changqing ◽  
Hui Peng Ng ◽  
Alfred Quah ◽  
Nagalingam Dayanand ◽  
...  

Abstract This paper placed a strong emphasis on the importance of applying Systematic Problem Solving approach, deep dive and use of right/appropriate FA approach/tools that are essentially critical to FA analysts to understand the “real” root cause. A case of low yield with polar failing pattern was seen and matched well with the Al Pad etch E chuck configuration. Customer also reported of passivation crack issue at the solder bumps. All these evidences suggested the root cause was related to wafer fabrication issue. However, it was through a strong “inquisitive” mindset coupled with the essence of such strong problem solving approach that led to uncover the actual root cause. Although customer test condition was not able to be duplicated due to limited information available in foundry industry, a four point probing alternative method was engaged to overcome this limitation. Unlike typical case, the AlOx thickness was comparable for bad and good dies. Further in depth analysis subsequently revealed the higher O content in the AlOx for the bad dies that was the real culprit for the higher bump resistance. This paper highlights the job of FA analyst is not simply finding defect but also plays a catalyst role in root cause/failure mechanism understanding by providing supporting FA evidence (electrically / physically) to Fab. It would serve as a good reference to wafer Fab that encountered such issue.


2014 ◽  
Vol 2014 (1) ◽  
pp. 000493-000499
Author(s):  
Gwen Schulz

The screening and detection of failures in high reliability electronics is crucial to mission success. The governing standards for microelectronic components prescribe effective screens to address known failure modes during the manufacture of the components. When failures are detected outside of the normal component screening process such as in the next higher assemblies, the analysis of such failures to root cause is even more crucial. Effective root cause analysis requires collaboration among personnel having expertise in many areas, both technical and organizational. Too often, the analysis stops at the ‘how’ a part failed, rather than the ‘why’ and true root cause determination. Failures may not only represent defects in the technical aspects of the design, materials or application of the hardware, but may also be related to human organizational factors such as the competing interests of time, quality and cost. The analysis must extend beyond the forensic data into the human organization and the interaction between people, process and hardware. In this paper, the author illustrates an effective root cause corrective action (RCCA) analysis process through the discussion of a microelectronics packaging case study. The case involved failure of high reliability hybrid microelectronic components at the next higher assembly level. The case study provides insights into the root cause analysis process as well as awareness that component level high reliability screening is not impervious. It is critical for the next level user to have the expertise in their organization to understand both the how and the why of such failures. The case study describes a failure related to loose metal particles inside a hermetically sealed multilayer ceramic package which had passed Particle Impact Noise Detection (PIND) screening at the supplier. Root cause analysis determined the cause for the screening escape as well as the cause of the metal particles, and effective corrective actions were implemented at both the component supplier and Honeywell. Technical causes include improper package design, weld schedule and screening methods. Organizational causes include inadequate documentation, lack of training and failure to react to prior failures. The root cause investigation team was a multi-discipline group from Honeywell, our customer, and the component supplier, with additional consulting input from other suppliers, equipment manufacturers and industry experts.


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