scholarly journals Ti–Cu Coatings Deposited by a Combination of HiPIMS and DC Magnetron Sputtering: The Role of Vacuum Annealing on Cu Diffusion, Microstructure, and Corrosion Resistance

Coatings ◽  
2020 ◽  
Vol 10 (11) ◽  
pp. 1064
Author(s):  
Lina Qin ◽  
Donglin Ma ◽  
Yantao Li ◽  
Peipei Jing ◽  
Bin Huang ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Photoelectron Spectroscopy ◽  
Vacuum Annealing ◽  
Copper Ions ◽  
Corrosion Performance ◽  
Dc Magnetron Sputtering ◽  
Ion Release ◽  
Cross Sectional ◽  
X Ray

Titanium-copper (Ti–Cu) coatings have attracted extensive attention in the surface modification of industrial and biomedical materials due to their excellent physical and chemical properties and biocompatibility. Here, Ti–Cu coatings are fabricated using a combination of high-power pulsed magnetron sputtering (HPPMS; also known as high power impulse magnetron sputtering (HiPIMS)) and DC magnetron sputtering followed by vacuum annealing at varied temperatures (300, 400, and 500 °C). X-ray diffraction (XRD), transmission electron microscopy (TEM), and X-ray photoelectron spectroscopy (XPS) data showed that Ti, Cu, and CuTi3 are mainly formed in the coatings before annealing, while Ti3O, Cu2O, and CuTi3 are the main compounds present in the annealed coatings. The cross-sectional TEM micrographs and corresponding EDS results provided evidence that Ti is mainly present on the surface and interfaces of the silicon substrate and the Ti–Cu coatings annealed at 500 °C, while the bulk of the coatings is enriched with Cu. The resistivity of the coatings decreased with increasing the annealing temperature from 300 to 500 °C. Based on self-corrosion current density data, the Ti–Cu coating annealed at 300 °C showed similar corrosion performance compared to the as-deposited Ti–Cu coating, while the corrosion rate increased for the Ti–Cu coatings annealed at 400 and 500 °C. Stable release of copper ions in PBS (cumulative released concentration of 0.8–1.0 μM) for up to 30 days was achieved for all the annealed coatings. Altogether, the results demonstrate that vacuum annealing is a simple and viable approach to tune the Cu diffusion and microstructure of the Ti–Cu coatings, thereby modulating their electrical resistivity, corrosion performance, and Cu ion release behavior.

scholarly journals The Effects of Annealing Temperature on the Structural Properties of ZrB2 Films Deposited via Pulsed DC Magnetron Sputtering

Coatings ◽  
2019 ◽  
Vol 9 (4) ◽  
pp. 253 ◽  
Author(s):  
Wei-Chun Chen ◽  
Chao-Te Lee ◽  
James Su ◽  
Hung-Pin Chen
Keyword(s):  
Electron Microscopy ◽  
Magnetron Sputtering ◽  
Structural Properties ◽  
Photoelectron Spectroscopy ◽  
Annealing Temperature ◽  
High Vacuum ◽  
Film Structure ◽  
Dc Magnetron Sputtering ◽  
Cross Sectional ◽  
X Ray

Zirconium diboride (ZrB2) thin films were deposited on a Si(100) substrate using pulsed direct current (dc) magnetron sputtering and then annealed in high vacuum. In addition, we discussed the effects of the vacuum annealing temperature in the range of 750 to 870 °C with flowing N2 on the physical properties of ZrB2 films. The structural properties of ZrB2 films were investigated with X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), transmission electron microscopy (TEM), atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS). The XRD patterns indicated that the ZrB2 films annealed at various temperatures exhibited a highly preferred orientation along the [0001] direction and that the residual stress could be relaxed by increasing the annealing temperature at 870 °C in a vacuum. The surface morphology was smooth, and the surface roughness slightly decreased with increasing annealing temperature. Cross-sectional TEM images of the ZrB2/Si(100) film annealed at 870 °C reveals the films were highly oriented in the direction of the c-axis of the Si substrate and the film structure was nearly stoichiometric in composition. The XPS results show the film surfaces slightly contain oxygen, which corresponds to the binding energy of Zr–O. Therefore, the obtained ZrB2 film seems to be quite suitable as a buffer layer for III-nitride growth.

Multilayer Coatings for Focusing Hard X-ray Telescopes

1998 ◽  
Vol 551 ◽  
Author(s):  
A. Ivan ◽  
R. Bruni ◽  
K. Byun ◽  
J. Everett ◽  
P. Gorenstein ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Single Layer ◽  
Multilayer Coatings ◽  
Dc Magnetron Sputtering ◽  
Film Properties ◽  
Auger Analysis ◽  
Cross Sectional ◽  
X Ray ◽  
Specular Reflectivity

AbstractSeveral multilayer test coatings for hard X-ray telescopes were fabricated using DC magnetron sputtering. The process parameters were selected from a series of trials of single layer depositions. The samples were characterized using X-ray specular reflectivity scans, AFM, and cross-sectional TEM. Additional measurements (stylus profilometry, RBS, and Auger analysis) were used in the optimization of the deposition rate and of the thin film properties (density, composition, surface/interface microroughness). The X-ray reflectivity scans showed that the combinations of reflector and spacer materials tested so far (W/Si and W/C) are suited for graded d-spacing multilayer coatings that present a constant reflectivity bandpass up to 70 keV.

Thin Film growth and characterization of Ti doped ZnO by RF/DC magnetron sputtering

2015 ◽  
Vol 1731 ◽  
Author(s):  
M. Baseer Haider ◽  
Mohammad F. Al-Kuhaili ◽  
S. M. A. Durrani ◽  
Venkatesh Singaravelu ◽  
Iman Roqan
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Photoelectron Spectroscopy ◽  
Film Growth ◽  
Chemical Study ◽  
Secondary Phases ◽  
Dc Magnetron Sputtering ◽  
X Ray ◽  
Force Microscopy ◽  
Doped Zno

ABSTRACTThin film Ti doped ZnO (Ti-ZnO) film were grown on sapphire (0001) substrate by RF and DC magnetron sputtering. Films were grown at a substrate temperature of 250 °C with different Ti/Zn concentration. Surface chemical study of the samples was performed by X-ray photoelectron spectroscopy to determine the stoichiometry and Ti/Zn ratio for all samples. Surface morphology of the samples were studied by atomic force microscopy. X-ray diffraction was carried out to determine the crystallinity of the film. No secondary phases of TixOy was observed. We observed a slight increase in the lattice constant with the increase in Ti concentration in ZnO. No ferromagnetic signal was observed for any of the samples. However, some samples showed super-paramagnetic phase.

Crystal structures and magnetic properties of Fe–N thin films deposited by dc magnetron sputtering

2004 ◽  
Vol 19 (4) ◽  
pp. 352-355 ◽  
Author(s):  
Wei Tao Zheng ◽  
Xin Wang ◽  
Xianggui Kong ◽  
Hongwei Tian ◽  
Shansheng Yu ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Magnetron Sputtering ◽  
Crystal Structures ◽  
Photoelectron Spectroscopy ◽  
Quantum Interference ◽  
Flow Ratio ◽  
Dc Magnetron Sputtering ◽  
X Ray ◽  
Glass Substrates

Fe–N thin films were deposited on glass substrates by dc magnetron sputtering under various Ar∕N2 discharge conditions. Crystal structures and elemental compositions of the films were characterized by X-ray diffraction and X-ray photoelectron spectroscopy. Magnetic properties of the films were measured using a superconducting quantum interference device magnetometer. Films deposited at different N2∕(Ar+N2) flow ratios were found to have different crystal structures and different nitrogen contents. When the flow ratios were 60%, 50%, and 30%, a nonmagnetic single-phase FeN was formed in the films. At the flow ratio of 10%, two crystal phases of γ′-Fe4N and ε-Fe3N were detected. When the flow ratio reduced to 5%, a mixture of α-Fe, ε-Fe3N, FeN0.056, and α″-Fe16N2 phases was obtained. The value of saturation magnetization for the mixture was found to be larger than that of pure Fe.

scholarly journals Electrospun Biodegradable Nanofibers Coated Homogenously by Cu Magnetron Sputtering Exhibit Fast Ion Release. Computational and Experimental Study

Membranes ◽  
2021 ◽  
Vol 11 (12) ◽  
pp. 965
Author(s):  
Anton M. Manakhov ◽  
Natalya A. Sitnikova ◽  
Alphiya R. Tsygankova ◽  
Alexander Yu. Alekseev ◽  
Lyubov S. Adamenko ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Photoelectron Spectroscopy ◽  
Large Scale ◽  
Copper Ions ◽  
Wound Dressings ◽  
Dynamics Simulation ◽  
Temperature Sensitive ◽  
Ion Release ◽  
Plasma Polymers ◽  
First Time

Copper-coated nanofibrous materials are desirable for catalysis, electrochemistry, sensing, and biomedical use. The preparation of copper or copper-coated nanofibers can be pretty challenging, requiring many chemical steps that we eliminated in our robust approach, where for the first time, Cu was deposited by magnetron sputtering onto temperature-sensitive polymer nanofibers. For the first time, the large-scale modeling of PCL films irradiation by molecular dynamics simulation was performed and allowed to predict the ions penetration depth and tune the deposition conditions. The Cu-coated polycaprolactone (PCL) nanofibers were thoroughly characterized and tested as antibacterial agents for various Gram-positive and Gram-negative bacteria. Fast release of Cu2+ ions (concentration up to 3.4 µg/mL) led to significant suppression of E. coli and S. aureus colonies but was insufficient against S. typhimurium and Ps. aeruginosa. The effect of Cu layer oxidation upon contact with liquid media was investigated by X-ray photoelectron spectroscopy revealing that, after two hours, 55% of Cu atoms are in form of CuO or Cu(OH)2. The Cu-coated nanofibers will be great candidates for wound dressings thanks to an interesting synergistic effect: on the one hand, the rapid release of copper ions kills bacteria, while on the other hand, it stimulates the regeneration with the activation of immune cells. Indeed, copper ions are necessary for the bacteriostatic action of cells of the immune system. The reactive CO2/C2H4 plasma polymers deposited onto PCL-Cu nanofibers can be applied to grafting of viable proteins, peptides, or drugs, and it further explores the versatility of developed nanofibers for biomedical applications use.

Effect of titanium suboxide on the formation of anatase and rutile phases during annealing of C-Doped Ti–O thin film deposited by DC magnetron sputtering

2020 ◽  
Vol 13 (05) ◽  
pp. 2051021
Author(s):  
Xiaodan Zuo ◽  
Qiaoyuan Deng ◽  
Tao Yang ◽  
Jiaqi Liu ◽  
Huatang Cao ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Photoelectron Spectroscopy ◽  
Anatase Phase ◽  
Methyl Orange Solution ◽  
Xenon Lamp ◽  
Dc Magnetron Sputtering ◽  
X Ray ◽  
Vis Spectroscopy ◽  
Titanium Suboxide

C-doped Ti–O films with different titanium suboxide contents are prepared by DC magnetron sputtering deposition at different sputtering powers. The films with different phases are formed after annealing at 873[Formula: see text]K in air. The structure of the films is characterized by X-ray diffraction, Raman spectroscopy and X-ray photoelectron spectroscopy. The optical properties and surface roughness of the films are investigated by UV–vis spectroscopy and atomic force microscopy, respectively. Photocatalytic activity of the thin films is studied by degrading the methyl orange solution under xenon lamp (300[Formula: see text]W) irradiation. The results show that the C-doped Ti–O thin films with higher titanium suboxide contents ([Formula: see text]%) tend to form the rutile phase after annealing, whereas the films with a lower titanate content ([Formula: see text]%) are easy to form anatase phase by annealing.

Characterization of polycrystalline VO2 thin film with low phase transition temperature fabricated by high power impulse magnetron sputtering

2016 ◽  
Vol 09 (02) ◽  
pp. 1650033 ◽  
Author(s):  
Tiegui Lin ◽  
Langping Wang ◽  
Xiaofeng Wang ◽  
Yufen Zhang
Keyword(s):  
Thin Film ◽  
Phase Transition ◽  
Transition Temperature ◽  
Magnetron Sputtering ◽  
Phase Transition Temperature ◽  
High Power ◽  
Photoelectron Spectroscopy ◽  
Lattice Distortion ◽  
Smart Windows ◽  
X Ray

VO2 is a unique material that undergoes a reversible phase transformation around 68[Formula: see text]C. Currently, applications of VO2 on smart windows are limited by its high transition temperature. In order to reduce the temperature, VO2 thin film was fabricated on quartz glass substrate by high power impulse magnetron sputtering with a modulated pulsed power. The phase transition temperature has been reduced to as low as 32[Formula: see text]C. In addition, the VO2 film possesses a typical metal–insulator transition. X-ray diffraction and selected area electron diffraction patterns reveal that an obvious lattice distortion has been formed in the as-deposited polycrystalline VO2 thin film. X-ray photoelectron spectroscopy proves that oxygen vacancies have been formed in the as-deposited thin film, which will induce a lattice distortion in the VO2 thin film.

Morphology of Tantalum Nitride Thin Films Grown on Fused Quartz by Reactive High Power Impulse Magnetron Sputtering (HiPIMS)

2015 ◽  
Vol 1803 ◽  
Author(s):  
D. O. Thorsteinsson ◽  
T. K. Tryggvason ◽  
J. T. Gudmundsson
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Tantalum Nitride ◽  
X Ray Diffraction ◽  
Dc Magnetron Sputtering ◽  
Film Properties ◽  
X Ray ◽  
Fused Quartz ◽  
The Magnetic Field ◽  
Dense Films

ABSTRACTThin tantalum nitride films were grown on fused quartz by reactive high power impulse magnetron sputtering (HiPIMS) while varying the fractional N2 flow rate at fixed substrate temperature of 400°C. The film properties were compared to films grown by conventional dc magnetron sputtering (dcMS) at similar conditions. Structural characterization was carried out using X-ray diffraction and reflection methods. The HiPIMS process produces slightly less dense films than does dcMS and the surface roughness is similar for both the HiPIMS and dcMS grown films. The deposition rate for HiPIMS is up to 80 % lower than for dcMS but it can be roughly doubled by lowering the magnetic field strength by 30 %.

Optical and Tribological Properties of Silicon Carbide Thin Films Grown by Reactive DC Magnetron Sputtering

2011 ◽  
Vol 484 ◽  
pp. 145-151 ◽  
Author(s):  
Tolga Tavşanoğlu ◽  
Erdem Baskurt ◽  
Yücel Onüralp
Keyword(s):  
Magnetron Sputtering ◽  
High Speed ◽  
High Speed Steel ◽  
Gas Mixture ◽  
Microstructural Properties ◽  
Dc Magnetron Sputtering ◽  
Cross Sectional ◽  
X Ray ◽  
Sic Coatings ◽  
Sic Films

In this study, SiC films were deposited by reactive DC magnetron sputtering of high purity (99.999%) Si target in Ar/CH4 gas mixture. Three types of substrates, AISI M2 grade high speed steel, glass, and Si (100) were used in each deposition. Films were grown with different compositions at 50 oC and 250 oC by varying (0–50 %) CH4/Ar processing gas ratios. Microstructural properties of SiC films were characterized by cross-sectional FE–SEM (Field–Emission Scanning Electron Microscope) observations. XRD (X–Ray Diffractometer) results indicated that films were amorphous. Friction coefficients as low as 0.1 were obtained from SiC coatings against Al2O3 balls, according to the tribological tests. Optical investigations showed that the transparency and opacity of SiC films could easily be tailored by modifying Si and C concentrations in the coatings.

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