Optical and Tribological Properties of Silicon Carbide Thin Films Grown by Reactive DC Magnetron Sputtering

2011 ◽  
Vol 484 ◽  
pp. 145-151 ◽  
Author(s):  
Tolga Tavşanoğlu ◽  
Erdem Baskurt ◽  
Yücel Onüralp
Keyword(s):  
Magnetron Sputtering ◽  
High Speed ◽  
High Speed Steel ◽  
Gas Mixture ◽  
Microstructural Properties ◽  
Dc Magnetron Sputtering ◽  
Cross Sectional ◽  
X Ray ◽  
Sic Coatings ◽  
Sic Films

In this study, SiC films were deposited by reactive DC magnetron sputtering of high purity (99.999%) Si target in Ar/CH4 gas mixture. Three types of substrates, AISI M2 grade high speed steel, glass, and Si (100) were used in each deposition. Films were grown with different compositions at 50 oC and 250 oC by varying (0–50 %) CH4/Ar processing gas ratios. Microstructural properties of SiC films were characterized by cross-sectional FE–SEM (Field–Emission Scanning Electron Microscope) observations. XRD (X–Ray Diffractometer) results indicated that films were amorphous. Friction coefficients as low as 0.1 were obtained from SiC coatings against Al2O3 balls, according to the tribological tests. Optical investigations showed that the transparency and opacity of SiC films could easily be tailored by modifying Si and C concentrations in the coatings.

Effect of Methane Flow Rate on the Microstructural and Mechanical Properties of Silicon Carbide Thin Films Deposited by Reactive DC Magnetron Sputtering

2010 ◽  
Vol 66 ◽  
pp. 35-40 ◽  
Author(s):  
Erdem Baskurt ◽  
Tolga Tavşanoğlu ◽  
Yücel Onüralp
Keyword(s):  
Magnetron Sputtering ◽  
High Speed ◽  
Profile Analysis ◽  
High Speed Steel ◽  
X Ray Diffraction ◽  
Dc Magnetron Sputtering ◽  
Cross Sectional ◽  
Methane Flow Rate ◽  
Surface Morphologies ◽  
Sic Films

SiC films were deposited by reactive DC magnetron sputtering of high purity (99.999%) Si target. 3 types of substrates, AISI M2 grade high speed steel, glass and Si (100) wafer were used in each deposition. The effect of different CH4 flow rates on the microstructural properties and surface morphologies were characterized by cross-sectional FE-SEM (Field-Emission Scanning Electron Microscope) observations. SIMS (Secondary Ion Mass Spectrometer) depth profile analysis showed that the elemental film composition was constant over the whole film depth. XRD (X-Ray Diffraction) results indicated that films were amorphous. Nanomechanical properties of SiC films were also investigated.

scholarly journals The Effects of Annealing Temperature on the Structural Properties of ZrB2 Films Deposited via Pulsed DC Magnetron Sputtering

Coatings ◽  
2019 ◽  
Vol 9 (4) ◽  
pp. 253 ◽  
Author(s):  
Wei-Chun Chen ◽  
Chao-Te Lee ◽  
James Su ◽  
Hung-Pin Chen
Keyword(s):  
Electron Microscopy ◽  
Magnetron Sputtering ◽  
Structural Properties ◽  
Photoelectron Spectroscopy ◽  
Annealing Temperature ◽  
High Vacuum ◽  
Film Structure ◽  
Dc Magnetron Sputtering ◽  
Cross Sectional ◽  
X Ray

Zirconium diboride (ZrB2) thin films were deposited on a Si(100) substrate using pulsed direct current (dc) magnetron sputtering and then annealed in high vacuum. In addition, we discussed the effects of the vacuum annealing temperature in the range of 750 to 870 °C with flowing N2 on the physical properties of ZrB2 films. The structural properties of ZrB2 films were investigated with X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), transmission electron microscopy (TEM), atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS). The XRD patterns indicated that the ZrB2 films annealed at various temperatures exhibited a highly preferred orientation along the [0001] direction and that the residual stress could be relaxed by increasing the annealing temperature at 870 °C in a vacuum. The surface morphology was smooth, and the surface roughness slightly decreased with increasing annealing temperature. Cross-sectional TEM images of the ZrB2/Si(100) film annealed at 870 °C reveals the films were highly oriented in the direction of the c-axis of the Si substrate and the film structure was nearly stoichiometric in composition. The XPS results show the film surfaces slightly contain oxygen, which corresponds to the binding energy of Zr–O. Therefore, the obtained ZrB2 film seems to be quite suitable as a buffer layer for III-nitride growth.

Multilayer Coatings for Focusing Hard X-ray Telescopes

1998 ◽  
Vol 551 ◽  
Author(s):  
A. Ivan ◽  
R. Bruni ◽  
K. Byun ◽  
J. Everett ◽  
P. Gorenstein ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Single Layer ◽  
Multilayer Coatings ◽  
Dc Magnetron Sputtering ◽  
Film Properties ◽  
Auger Analysis ◽  
Cross Sectional ◽  
X Ray ◽  
Specular Reflectivity

AbstractSeveral multilayer test coatings for hard X-ray telescopes were fabricated using DC magnetron sputtering. The process parameters were selected from a series of trials of single layer depositions. The samples were characterized using X-ray specular reflectivity scans, AFM, and cross-sectional TEM. Additional measurements (stylus profilometry, RBS, and Auger analysis) were used in the optimization of the deposition rate and of the thin film properties (density, composition, surface/interface microroughness). The X-ray reflectivity scans showed that the combinations of reflector and spacer materials tested so far (W/Si and W/C) are suited for graded d-spacing multilayer coatings that present a constant reflectivity bandpass up to 70 keV.

Effects of Tungsten Addition on Mechanical and Tribological Properties of Carbon Nitride Prepared by DC Magnetron Sputtering

2015 ◽  
Vol 642 ◽  
pp. 24-29 ◽  
Author(s):  
Yan Liang Su ◽  
Yue Feng Lin ◽  
Sun Hui Yao ◽  
Chia Jui Hsu
Keyword(s):  
Magnetron Sputtering ◽  
Tribological Properties ◽  
High Speed ◽  
Carbon Nitride ◽  
Indentation Test ◽  
High Speed Steel ◽  
Xrd Analysis ◽  
Tungsten Content ◽  
Dc Magnetron Sputtering ◽  
Glow Discharge Spectroscopy

Carbon nitride coatings doped with tungsten were deposited on high speed steel disks by unbalanced DC magnetron sputtering using nitrogen-argon mixture gas. The coatings were deposited on three different types of interlayer (Ti, Ti/TiN and Ti/TiC), and the tungsten target current was varied from 0 to 0.9 A. Surface morphology of the coatings were measured by roughness testing and scanning electron microscopy (SEM). In addition, the chemical composition and depth profile were analyzed by X-ray Diffraction (XRD) analysis, Raman spectroscopy, and glow discharge spectroscopy (GDS). Finally, the hardness (H) and elasticity (E) were measured by nanoindentation and a Rockwell indentation test, while the tribological properties were tested using a pin-on-disk tribometer. After all, the coatings were measured by cutting testing of tuning inserts and micro-drillers. It is found that all of the coatings are amorphous and have a thickness of approximately 1.5 μm. Moreover, the nitrogen content is around 30 at%, while the tungsten content varies in the range of 0-9 at%. In addition, the hardness values are in the range of 15-20 GPa and the elasticity varies from 236 to 274 GPa. A good correlation is observed between the wear resistance and the indentation adhesion level. Furthermore, it is found that the hardness is not significantly correlated to the tungsten content and the coatings deposited on the Ti/TiC interlayer have greater adhesion. Finally, the coatings generally have a very low coefficient of friction (0.01-0.3) and a wear coefficient as low as 10-6 mm3/Nm, and the CN/TiC coating reduced 41% and 43% of flank wear in the cutting testing of turning inserts and micro-drillers respectively.

The Effect of Magnetron Co-Sputtering Parameters on the Microhardness of TiZrN Thin Films

2013 ◽  
Vol 791-793 ◽  
pp. 407-410
Author(s):  
Xin Zhao ◽  
Wei Qin ◽  
Guo Dong Zhao
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
High Speed ◽  
High Speed Steel ◽  
Mixed Crystals ◽  
X Ray Diffraction ◽  
Doping Amount ◽  
X Ray

TiZrN thin films have been prepared on high speed steel by using magnetron sputtering. Doping amounts of Zr were adjusted by changing the sputtering time of the Zr target. X-ray diffraction analyses show that TiZrN coatings consist of mixed crystals of TiN, TiZrN phases. The film microhardness first increases and then decreases with the increasing of Zr doping amount. With the same Zr doping amount, the microhardness of the samples will improve with the increasing of doping times.

Characterization of Titanium and Niobium Doped DLC Films Grown by Pulsed DC PVD: Closed Field Unbalanced Magnetron Sputtering (CFUBMS) Method

2007 ◽  
Author(s):  
Deniz Ugur ◽  
Ihsan Efeoglu ◽  
Sabri Altintas
Keyword(s):  
Magnetron Sputtering ◽  
High Speed ◽  
High Speed Steel ◽  
Closed Field ◽  
X Ray ◽  
Unbalanced Magnetron Sputtering ◽  
Pulsed Dc ◽  
Unbalanced Magnetron ◽  
Scratch Tests

In this research, structural, tribological and mechanical characterization of Nb and Ti doped diamond like carbon (DLC) films was carried out. Films were grown on M2 high speed steel (HSS), glass and silicon wafer substrates by pulsed DC physical vapor deposition – closed field unbalanced magnetron sputtering (PVD-CFUBMS) method. Structural characterization of the coatings was done by using Scanning Electron Microscopy (SEM), X-ray diffraction (XRD) and X-Ray Photoelectron Spectroscopy (XPS) tests. Tribological characterization was completed by conducting pin on disk tests, scratch tests and surface profilometry analyses on wear scars. Hardness measurements were done with nanoindentation tests. It was noted that there existed excellent adhesion between the coating and the substrate, which is evidenced by the high critical loads reached in scratch tests.

scholarly journals Ti–Cu Coatings Deposited by a Combination of HiPIMS and DC Magnetron Sputtering: The Role of Vacuum Annealing on Cu Diffusion, Microstructure, and Corrosion Resistance

Coatings ◽  
2020 ◽  
Vol 10 (11) ◽  
pp. 1064
Author(s):  
Lina Qin ◽  
Donglin Ma ◽  
Yantao Li ◽  
Peipei Jing ◽  
Bin Huang ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Photoelectron Spectroscopy ◽  
Vacuum Annealing ◽  
Copper Ions ◽  
Corrosion Performance ◽  
Dc Magnetron Sputtering ◽  
Ion Release ◽  
Cross Sectional ◽  
X Ray

Titanium-copper (Ti–Cu) coatings have attracted extensive attention in the surface modification of industrial and biomedical materials due to their excellent physical and chemical properties and biocompatibility. Here, Ti–Cu coatings are fabricated using a combination of high-power pulsed magnetron sputtering (HPPMS; also known as high power impulse magnetron sputtering (HiPIMS)) and DC magnetron sputtering followed by vacuum annealing at varied temperatures (300, 400, and 500 °C). X-ray diffraction (XRD), transmission electron microscopy (TEM), and X-ray photoelectron spectroscopy (XPS) data showed that Ti, Cu, and CuTi3 are mainly formed in the coatings before annealing, while Ti3O, Cu2O, and CuTi3 are the main compounds present in the annealed coatings. The cross-sectional TEM micrographs and corresponding EDS results provided evidence that Ti is mainly present on the surface and interfaces of the silicon substrate and the Ti–Cu coatings annealed at 500 °C, while the bulk of the coatings is enriched with Cu. The resistivity of the coatings decreased with increasing the annealing temperature from 300 to 500 °C. Based on self-corrosion current density data, the Ti–Cu coating annealed at 300 °C showed similar corrosion performance compared to the as-deposited Ti–Cu coating, while the corrosion rate increased for the Ti–Cu coatings annealed at 400 and 500 °C. Stable release of copper ions in PBS (cumulative released concentration of 0.8–1.0 μM) for up to 30 days was achieved for all the annealed coatings. Altogether, the results demonstrate that vacuum annealing is a simple and viable approach to tune the Cu diffusion and microstructure of the Ti–Cu coatings, thereby modulating their electrical resistivity, corrosion performance, and Cu ion release behavior.

The Structure and Adhesion of Zr/TiAlN Coatings on High-Speed Steel and Cemented Carbide Substrates

2013 ◽  
Vol 459 ◽  
pp. 46-50 ◽  
Author(s):  
Guang Xian ◽  
Hai Bo Zhao ◽  
Hong Yuan Fan ◽  
Hao Du
Keyword(s):  
High Speed ◽  
High Speed Steel ◽  
Columnar Structure ◽  
Diffraction Peak ◽  
Cemented Carbide ◽  
X Ray Diffraction ◽  
Medium Frequency ◽  
Cross Sectional ◽  
X Ray ◽  
Main Diffraction Peak

Zr/TiAlN coatings as well as single TiAlN coatings were deposited on high-speed steel and cemented carbide substrates by medium frequency magnetron sputtering. The crystal structure and cross-sectional morphology of coatings were evaluated by X-ray diffraction (XRD) and scanning electron microscopy (SEM), respectively. The adhesion of coatings to substrate was measured by Rockwell indention tests. These investigations show that the main diffraction peak of Zr/TiAlN and TiAlN coatings are corresponding to the TiN phase. The preferred orientation of out TiAlN coatings is obviously affected by Zr interlayer and substrate materials. The TiAlN coatings both on HSS and cemented carbide substrates exhibit a columnar structure. But, the columnar morphology of Zr/TiAlN on cemented carbide substrate becomes ambiguous and this structure of Zr/TiAlN coatings on HSS substrate even changes to isometric. The Rockwell indention results indicate that the adhesion of TiAlN coatings is significantly improved by adding Zr interlayer both on HSS substrate and cemented carbide substrate.

Characteristic properties of AlTiN and TiN coated HSS materials

2015 ◽  
Vol 67 (2) ◽  
pp. 172-180 ◽  
Author(s):  
Mumin Sahin ◽  
Cenk Misirli ◽  
Dervis Özkan
Keyword(s):  
Surface Roughness ◽  
Tensile Strength ◽  
High Speed ◽  
Cutting Tools ◽  
High Speed Steel ◽  
Wear Properties ◽  
Content Type ◽  
X Ray ◽  
Number Of Cycles ◽  
Future Work

Purpose – The purpose of this paper is to examine mechanical and metallurgical properties of AlTiN- and TiN-coates high-speed steel (HSS) materials in detail. Design/methodology/approach – In this study, HSS steel parts have been processed through machining and have been coated with AlTiN and TiN on physical vapour deposition workbench at approximately 6,500°C for 4 hours. Tensile strength, fatigue strength, hardness tests for AlTiN- and TiN-coated HSS samples have been performed; moreover, energy dispersive X-ray spectroscopy and X-ray diffraction analysis and microstructure analysis have been made by scanning electron microscopy. The obtained results have been compared with uncoated HSS components. Findings – It was found that tensile strength of TiAlN- and TiN-coated HSS parts is higher than that of uncoated HSS parts. Highest tensile strength has been obtained from TiN-coated HSS parts. Number of cycles for failure of TiAlN- and TiN-coated HSS parts is higher than that for HSS parts. Particularly TiN-coated HSS parts have the most valuable fatigue results. However, surface roughness of fatigue samples may cause notch effect. For this reason, surface roughness of coated HSS parts is compared with that of uncoated ones. While the average surface roughness (Ra) of the uncoated samples was in the range of 0.40 μm, that of the AlTiN- and TiN-coated samples was in the range of 0.60 and 0.80 μm, respectively. Research limitations/implications – It would be interesting to search different coatings for cutting tools. It could be the good idea for future work to concentrate on wear properties of tool materials. Practical implications – The detailed mechanical and metallurgical results can be used to assess the AlTiN and TiN coating applications in HSS materials. Originality/value – This paper provides information on mechanical and metallurgical behaviour of AlTiN- and TiN-coated HSS materials and offers practical help for researchers and scientists working in the coating area.

Transparent Conductive Cu-In-O Thin Films Deposited by Reactive DC Magnetron Sputtering with Different Targets

2011 ◽  
Vol 239-242 ◽  
pp. 2752-2755
Author(s):  
Fan Ye ◽  
Xing Min Cai ◽  
Fu Ping Dai ◽  
Dong Ping Zhang ◽  
Ping Fan ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Optical Band Gap ◽  
Diffraction Peak ◽  
X Ray Diffraction ◽  
Dc Magnetron Sputtering ◽  
Flow Rates ◽  
X Ray ◽  
Equal Distance ◽  
Transmittance Curve

Transparent conductive Cu-In-O thin films were deposited by reactive DC magnetron sputtering. Two types of targets were used. The first was In target covered with a fan-shaped Cu plate of the same radius and the second was Cu target on which six In grains of 1.5mm was placed with equal distance between each other. The samples were characterized with scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDX), X-ray diffraction (XRD), UV/VIS spectrophotometer, four-probe measurement etc. SEM shows that the surfaces of all the samples are very smooth. EDX shows that the samples contain Cu, In as well as O, and different targets result in different atomic ratios of Cu to In. A diffraction peak related to rhombohedra-centered In2O3(012) is observed in the XRD spectra of all the samples. For both the two targets, the transmittance decreases with the increase of O2flow rates. The direct optical band gap of all the samples is also estimated according to the transmittance curve. For both the two targets, different O2flow rates result in different sheet resistances and conductivities. The target of Cu on In shows more controllability in the composition and properties of Cu-In-O films.

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