scholarly journals Pulsed Magnetron Sputtering of Strongly Thermochromic VO2-Based Coatings with a Transition Temperature of 22 °C onto Ultrathin Flexible Glass

Coatings ◽  
2020 ◽  
Vol 10 (12) ◽  
pp. 1258
Author(s):  
Tomáš Bárta ◽  
Jaroslav Vlček ◽  
Jiří Houška ◽  
Stanislav Haviar ◽  
Radomír Čerstvý ◽  
...  

The reversible semiconductor-to-metal transition of vanadium dioxide (VO2) makes VO2-based coatings a promising candidate for thermochromic smart windows, reducing the energy consumption of buildings. This paper deals with maximizing the application potential of these coatings in terms of their performance, an industry-friendly preparation technique, and an industrially relevant substrate. We present a scalable sputter deposition technique for the preparation of strongly thermochromic ZrO2/V0.984W0.016O2/ZrO2 coatings on ultrathin flexible glass and standard glass at a relatively low substrate surface temperature (330 °C) and without any substrate bias voltage. The V0.984W0.016O2 layers were deposited by a controlled high-power impulse magnetron sputtering of a V target, combined with a simultaneous pulsed dc magnetron sputtering of a W target. We explain the fundamental principles of this technique using the discharge characteristics measured for both discharges. We characterize the coating structure (X-ray diffraction) and a wide range of optical properties (spectrophotometry and spectroscopic ellipsometry). We find that the coatings combine a transition temperature of 22 °C, a luminous transmittance approaching 50%, a modulation of the solar energy transmittance over 10% and a temperature-independent color. The results in general, and the successful transfer from a standard glass to the ultrathin flexible glass in particular, are crucial for future applications of the coatings on smart windows.

2013 ◽  
Vol 385-386 ◽  
pp. 3-6
Author(s):  
Jing Xu

LaB6 films are deposited by magnetron sputtering deposition. ZrO2 glass is used as substrate. Bias voltage and substrate temperature are adjusted. Morphology of films that deposited at different parameters is characterized by AFM. Results of AFM shows that grains diameter on surface of LaB6 films is nanoscale, and roughness of the surface is less than 20nm. LaB6 crystallites are seen to cover substrate surface entirely. Structure of films is smooth and compactness, and there is no obviously default is found. Bias-voltage influences morphologies of films more obviously than substrate. The best bias voltage is-100V. Structure of film that deposited at 450°C is more compactness than others, and roughness of the film is least.


2016 ◽  
Vol 09 (02) ◽  
pp. 1650033 ◽  
Author(s):  
Tiegui Lin ◽  
Langping Wang ◽  
Xiaofeng Wang ◽  
Yufen Zhang

VO2 is a unique material that undergoes a reversible phase transformation around 68[Formula: see text]C. Currently, applications of VO2 on smart windows are limited by its high transition temperature. In order to reduce the temperature, VO2 thin film was fabricated on quartz glass substrate by high power impulse magnetron sputtering with a modulated pulsed power. The phase transition temperature has been reduced to as low as 32[Formula: see text]C. In addition, the VO2 film possesses a typical metal–insulator transition. X-ray diffraction and selected area electron diffraction patterns reveal that an obvious lattice distortion has been formed in the as-deposited polycrystalline VO2 thin film. X-ray photoelectron spectroscopy proves that oxygen vacancies have been formed in the as-deposited thin film, which will induce a lattice distortion in the VO2 thin film.


Author(s):  
Ihab Nabeel Safi ◽  
Basima Mohammed Ali Hussein ◽  
Hikmat J. Aljudy ◽  
Mustafa S. Tukmachi

Abstract Objectives Dental implant is a revolution in dentistry; some shortages are still a focus of research. This study use long duration of radiofrequency (RF)–magnetron sputtering to coat titanium (Ti) implant with hydroxyapatite (HA) to obtain a uniform, strongly adhered in a few micrometers in thickness. Materials and Methods Two types of substrates: discs and root form cylinders were prepared using a grade 1 commercially pure (CP) Ti rod. A RF–magnetron sputtering device was used to coat specimens with HA. Magnetron sputtering was set at 150 W for 22 hours at 100°C under continuous argon gas flow and substrate rotation at 10 rpm. Coat properties were evaluated via field emission scanning electron microscopy (FESEM), scanning electron microscopy–energy dispersive X-ray (EDX) analysis, atomic force microscopy, and Vickers hardness (VH). Student’s t-test was used. Results All FESEM images showed a homogeneous, continuous, and crack-free HA coat with a rough surface. EDX analysis revealed inclusion of HA particles within the substrate surface in a calcium (Ca)/phosphorus (P) ratio (16.58/11.31) close to that of HA. Elemental and EDX analyses showed Ca, Ti, P, and oxygen within Ti. The FESEM views at a cross-section of the substrate showed an average of 7 µm coat thickness. Moreover, these images revealed a dense, compact, and uniform continuous adhesion between the coat layer and the substrate. Roughness result indicated highly significant difference between uncoated Ti and HA coat (p-value < 0.05). A significant improvement in the VH value was observed when coat hardness was compared with the Ti substrate hardness (p-value < 0.05). Conclusion Prolonged magnetron sputtering successfully coat Ti dental implants with HA in micrometers thickness which is well adhered essentially in excellent osseointegration.


Vacuum ◽  
2021 ◽  
Vol 188 ◽  
pp. 110200
Author(s):  
Sihui Wang ◽  
Wei Wei ◽  
Yonghao Gao ◽  
Haibin Pan ◽  
Yong Wang

2020 ◽  
Vol 403 ◽  
pp. 126373 ◽  
Author(s):  
Ph.V. Kiryukhantsev-Korneev ◽  
A.D. Sytchenko ◽  
A.Yu. Potanin ◽  
S.A. Vorotilo ◽  
E.A. Levashov

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