scholarly journals Application-Specific Oxide-Based and Metal–Dielectric Thin-Film Materials Prepared by Radio Frequency Magnetron Sputtering

Materials ◽  
2019 ◽  
Vol 12 (20) ◽  
pp. 3448 ◽  
Author(s):  
Nur-E-Alam ◽  
Lonsdale ◽  
Vasiliev ◽  
Alameh
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
High Performance ◽  
Magnetic Hysteresis ◽  
Rf Sputtering ◽  
Thermal Exposure ◽  
Magnetic Hysteresis Loop ◽  
Saturation State ◽  
Dielectric Thin Film

We report on the development of several different thin-film functional material systems prepared by radio frequency (RF) magnetron sputtering at Edith Cowan University nanofabrication labs. While focusing on the RF sputtering process optimizations for new or the previously underexplored material compositions and multilayer structures, we disclose several unforeseen material properties and behaviours. Among these are an unconventional magnetic hysteresis loop with an intermediate saturation state observed in garnet trilayers, and an ultrasensitive magnetic switching behaviour in garnet-oxide composites (GOC). We also report on the unusually high thermal exposure stability observed in some nanoengineered metal–dielectric multilayers. We communicate research results related to the design, prototyping, and practical fabrication of high-performance magneto-optic (MO) materials, oxide-based sensor components, and heat regulation coatings for advanced construction and solar windows.

scholarly journals Application-Specific Oxide-Based and Metal-Dielectric Thin Film Materials Prepared by RF Magnetron Sputtering

2019 ◽  
Author(s):  
Mohammad Nur E Alam ◽  
Wade Lonsdale ◽  
Mikhail Vasiliev ◽  
Kamal Alameh
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
High Performance ◽  
Rf Magnetron Sputtering ◽  
Functional Material ◽  
Dielectric Thin Film ◽  
Material Systems ◽  
Application Specific ◽  
Magneto Optic

We report on the development of several different thin-film functional material systems prepared by RF magnetron sputtering at Edith Cowan University nanofabrication labs. We conduct research on the design, prototyping, and practical fabrication of high-performance magneto-optic (MO) materials, oxide based sensor components, and heat regulation coatings for advanced construction and solar windows.

scholarly journals Influence of Annealing Temperature on the Characteristics of Ti-Codoped GZO Thin Solid Film

2013 ◽  
Vol 2013 ◽  
pp. 1-6 ◽  
Author(s):  
Tao-Hsing Chen ◽  
Tzu-Yu Liao
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Annealing Temperature ◽  
Rf Sputtering ◽  
Radio Frequency Magnetron ◽  
Radio Frequency Magnetron Sputtering

This study utilizes radio frequency magnetron sputtering (RF sputtering) to deposit GZO transparent conductive film and Ti thin film on the same corning glass substrate and then treats GZO/Ti thin film with rapid thermal annealing. The annealing temperatures are 300°C , 500°C, and 550°C, respectively. Ti:GZO transparent conductive oxide (TCO) thin films are deposited on glass substrates using a radio frequency magnetron sputtering technique. The thin films are then annealed at temperatures of 300°C, 500°C, and 550°C, respectively, for rapid thermal annealing. The effects of the annealing temperature on the optical properties, resistivity, and nanomechanical properties of the Ti:GZO thin films are then systematically explored. The results show that all of the annealed films have excellent transparency (~90%) in the visible light range. Moreover, the resistivity of the Ti:GZO films reduces with an increasing annealing temperature, while the carrier concentration and Hall mobility both increase. Finally, the hardness and Young’s modulus of the Ti:GZO thin films are both found to increase as the annealing temperature is increased.

scholarly journals Application-specific oxide-based and metal-dielectric thin-film materials prepared by RF sputtering

2019 ◽  
Author(s):  
Mohammad Nur E Alam ◽  
Mikhail Vasiliev
Keyword(s):  
Thin Film ◽  
Material Properties ◽  
High Performance ◽  
Rf Sputtering ◽  
Rf Magnetron Sputtering ◽  
Film Material ◽  
Dielectric Thin Film ◽  
Thin Film Material ◽  
Material Systems ◽  
Application Specific

We report on the development of several different thin-film material systems prepared by RF magnetron sputtering at Edith Cowan University nanofabrication labs. While focusing on the RF sputtering process optimizations for new or the previously underexplored material compositions and multilayer structures, we disclose several unforeseen material properties and behaviours. We communicate research results related to the design, prototyping, and practical fabrication of high-performance magneto-optic (MO) materials, oxide based sensor components, and transparent heat regulation coatings for advanced construction and solar windows.

High-resolution scanning electron microscopy of thin-film magnetic media of magnetic recording disk

1992 ◽  
Vol 50 (2) ◽  
pp. 1334-1335
Author(s):  
K. Ogura ◽  
H. Nishioka ◽  
N. Ikeo ◽  
T. Kanazawa ◽  
J. Teshima
Keyword(s):  
Thin Film ◽  
Fine Structure ◽  
High Resolution ◽  
Magnetic Recording ◽  
High Performance ◽  
Magnetic Hysteresis ◽  
Grain Structure ◽  
Magnetic Media ◽  
Cross Sectional ◽  
Resolution Observation

Structural appraisal of thin film magnetic media is very important because their magnetic characters such as magnetic hysteresis and recording behaviors are drastically altered by the grain structure of the film. However, in general, the surface of thin film magnetic media of magnetic recording disk which is process completed is protected by several-nm thick sputtered carbon. Therefore, high-resolution observation of a cross-sectional plane of a disk is strongly required to see the fine structure of the thin film magnetic media. Additionally, observation of the top protection film is also very important in this field.Recently, several different process-completed magnetic disks were examined with a UHR-SEM, the JEOL JSM 890, which consisted of a field emission gun and a high-performance immerse lens. The disks were cut into approximately 10-mm squares, the bottom of these pieces were carved into more than half of the total thickness of the disks, and they were bent. There were many cracks on the bent disks. When these disks were observed with the UHR-SEM, it was very difficult to observe the fine structure of thin film magnetic media which appeared on the cracks, because of a very heavy contamination on the observing area.

AC Magnetron Sputtering: An Industrial Approach for High‐Voltage and High‐Performance Thin‐Film Cathodes for Li‐Ion Batteries

2021 ◽  
pp. 2002125
Author(s):  
Jokin Rikarte ◽  
Iñaki Madinabeitia ◽  
Giorgio Baraldi ◽  
Francisco José Fernández‐Carretero ◽  
Víctor Bellido‐González ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
High Voltage ◽  
High Performance ◽  
Li Ion Batteries ◽  
Li Ion

High Performance Metal Surface Coating Using Ta2O5 Thin Film Prepared by D.C. Magnetron Sputtering

2014 ◽  
Vol 979 ◽  
pp. 240-243
Author(s):  
Narathon Khemasiri ◽  
Chanunthorn Chananonnawathorn ◽  
Mati Horprathum ◽  
Pitak Eiamchai ◽  
Pongpan Chindaudom ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Film Thickness ◽  
Metal Surface ◽  
High Performance ◽  
Grazing Incidence ◽  
Surface Finishing ◽  
Afm Micrographs ◽  
Protective Performance

Tantalum oxide (Ta2O5) thin films were deposited as the protective layers for the metal surface finishing by the DC reactive magnetron sputtering system. The effect of the Ta2O5 film thickness, ranging from 25 nm to 200 nm, on the physical properties and the anti-corrosive performance were investigated. The grazing-incidence X-ray diffraction (GIXRD) and the atomic force microscopy (AFM) were used to examine the crystal structures and the surface topologies of the prepared films, respectively. The XRD results showed that the Ta2O5 thin films were all amorphous. The AFM micrographs demonstrated the film morphology with quite smooth surface features. The surface roughness tended to be rough when the film thickness was increased. To examine the protective performance of the films, the poteniostat and galvanometer was utilized to examine the electrochemical activities with the 1M NaCl as the corrosive electrolyte. The results from the I-V polarization curves (Tafel slope) indicated that, with the Ta2O5 thin film, the current density was significantly reduced by 3 orders of magnitude when compared with the blank sample. Such results were observed because of fully encapsulated surface of the samples were covered with the sputtered Ta2O5 thin films. The study also showed that the Ta2O5 thin film deposited at 50 nm yielded the most extreme protective performance. The Ta2O5 thin films therefore could be optimized for the smallest film thickness for highly potential role in the protective performance of the metal surface finishing products.

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